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Class Information
Number: 438/684
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Electrically conductive polysilicon
Description: Processes for forming a contact using electrically conductive polycrystalline silicon.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8492238 Method and apparatus for fabricating piezoresistive polysilicon by low-temperature metal induced crystallization Jul. 23, 2013
8440518 Method for manufacturing a pattern formed body, method for manufacturing a functional element, and method for manufacturing a semiconductor element May. 14, 2013
8395057 Substrate-penetrating electrical connections Mar. 12, 2013
8389403 Semiconductor device and method for manufacturing the same Mar. 5, 2013
8383515 Methodology for wordline short reduction Feb. 26, 2013
8367550 Fabricating low contact resistance conductive layer in semiconductor device Feb. 5, 2013
8318556 Method and system for continuous line-type landing polysilicon contact (LPC) structures Nov. 27, 2012
8222148 Method of manufacturing a semiconductor device Jul. 17, 2012
8216933 Krypton sputtering of low resistivity tungsten Jul. 10, 2012
8187905 Method of forming a microlens and a method for manufacturing an image sensor May. 29, 2012
8163583 Manufacturing method of micro electronic mechanical system structure Apr. 24, 2012
8153523 Method of etching a layer of a semiconductor device using an etchant layer Apr. 10, 2012
8101521 Methods for improving uniformity and resistivity of thin tungsten films Jan. 24, 2012
8034716 Semiconductor structures including vertical diode structures and methods for making the same Oct. 11, 2011
7960231 Method of forming a semiconductor memory device Jun. 14, 2011
7928008 Method for fabricating semiconductor device Apr. 19, 2011
7923322 Method of forming a capacitor Apr. 12, 2011
7910481 Method for fabricating semiconductor device Mar. 22, 2011
7863176 Low-resistance interconnects and methods of making same Jan. 4, 2011
7863621 Thin film transistor Jan. 4, 2011
7790617 Formation of metal silicide layer over copper interconnect for reliability enhancement Sep. 7, 2010
7745937 Semiconductor device and method of manufacturing the same Jun. 29, 2010
7732345 Method for using a modified post-etch clean rinsing agent Jun. 8, 2010
7638432 Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same Dec. 29, 2009
7585770 Method of growing carbon nanotubes and method of manufacturing field emission device having the same Sep. 8, 2009
7569468 Method for forming a floating gate memory with polysilicon local interconnects Aug. 4, 2009
7563708 Method for manufacturing semiconductor device Jul. 21, 2009
7563702 Method for fabricating semiconductor device Jul. 21, 2009
7531398 Methods and devices employing metal layers in gates to introduce channel strain May. 12, 2009
7446044 Carbon nanotube switches for memory, RF communications and sensing applications, and methods of making the same Nov. 4, 2008
7407886 Method for preparing a contact plug structure Aug. 5, 2008
7375005 Method for reclaiming and reusing wafers May. 20, 2008
7354858 Film formation method and apparatus for semiconductor process Apr. 8, 2008
7326653 Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained Feb. 5, 2008
7294573 Method for controlling poly 1 thickness and uniformity in a memory array fabrication process Nov. 13, 2007
7279422 Semiconductor device with silicide film and method of manufacturing the same Oct. 9, 2007
7256123 Method of forming an interface for a semiconductor device Aug. 14, 2007
7220670 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same May. 22, 2007
7220672 Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same May. 22, 2007
7208409 Integrated circuit metal silicide method Apr. 24, 2007
7199043 Method of forming copper wiring in semiconductor device Apr. 3, 2007
7115509 Method for forming polysilicon local interconnects Oct. 3, 2006
7067391 Method to form a metal silicide gate device Jun. 27, 2006
7041550 Device and method for protecting against oxidation of a conductive layer in said device May. 9, 2006
7041605 Semiconductor contact structure and method of forming the same May. 9, 2006
7037796 Method of manufacturing spacers on sidewalls of titanium polycide gate May. 2, 2006
7029937 Semiconductor device and method of manufacturing the same, circuit board, and electronic instrument Apr. 18, 2006
7012021 Method for end point detection polysilicon chemical mechanical polishing in an anti-fuse memory device Mar. 14, 2006
7008873 Integrated circuit with reverse engineering protection Mar. 7, 2006
7005302 Semiconductor on insulator substrate and devices formed therefrom Feb. 28, 2006

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