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Class Information
Number: 438/683
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Silicide > Of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof)
Description: Processes for forming a contact using the chemical combination of silicon (Si) with one of the refractory group elements (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof).










Patents under this class:
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Patent Number Title Of Patent Date Issued
8642434 Structure and method for mobility enhanced MOSFETS with unalloyed silicide Feb. 4, 2014
8642468 NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors Feb. 4, 2014
8642471 Semiconductor structure and method for manufacturing the same Feb. 4, 2014
8617992 Method of forming metal silicide contact and metal interconnect Dec. 31, 2013
8603882 Method for making dual silicide and germanide semiconductors Dec. 10, 2013
8592305 Doping aluminum in tantalum silicide Nov. 26, 2013
8580666 Methods of forming conductive contacts Nov. 12, 2013
8580686 Silicidation and/or germanidation on SiGe or Ge by cosputtering Ni and Ge and using an intralayer for thermal stability Nov. 12, 2013
8563355 Method of making a phase change memory cell having a silicide heater in conjunction with a FinFET Oct. 22, 2013
8536010 Method for making a disilicide Sep. 17, 2013
8492261 Damascene contacts on III-V CMOS devices Jul. 23, 2013
8476164 Method of manufacturing semiconductor device with silicide Jul. 2, 2013
8470700 Semiconductor device with reduced contact resistance and method of manufacturing thereof Jun. 25, 2013
8435862 Method of manufacturing semiconductor device May. 7, 2013
8435886 Method and system for binding halide-based contaminants May. 7, 2013
8395266 Semiconductor memory device Mar. 12, 2013
8377812 SiC MOSFETs and self-aligned fabrication methods thereof Feb. 19, 2013
8377556 Material for growth of carbon nanotubes Feb. 19, 2013
8372750 Method and system for improved nickel silicide Feb. 12, 2013
8357611 Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof Jan. 22, 2013
8349732 Implanted metal silicide for semiconductor device Jan. 8, 2013
8330234 Semiconductor device and manufacturing process therefor Dec. 11, 2012
8304021 Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device Nov. 6, 2012
8278217 Semiconductor device and method of producing the same Oct. 2, 2012
8268180 Methods of fabricating large-area, semiconducting nanoperforated graphene materials Sep. 18, 2012
8247257 Method and material for processing iron disilicide for photovoltaic application Aug. 21, 2012
8216377 Method and system for binding halide-based contaminants Jul. 10, 2012
8211795 Method of forming a dielectric cap layer for a copper metallization by using a hydrogen based thermal-chemical treatment Jul. 3, 2012
8207064 3D polysilicon diode with low contact resistance and method for forming same Jun. 26, 2012
8173093 Iron silicide sputtering target and method for production thereof May. 8, 2012
8168539 Method for forming tungsten film at a surface of a processing target material, film-forming apparatus, storage medium and semiconductor device with a tungsten film May. 1, 2012
8158092 Iron silicide powder and method for production thereof Apr. 17, 2012
8158518 Methods of making metal silicide contacts, interconnects, and/or seed layers Apr. 17, 2012
8133811 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium Mar. 13, 2012
8101521 Methods for improving uniformity and resistivity of thin tungsten films Jan. 24, 2012
8058092 Method and material for processing iron disilicide for photovoltaic application Nov. 15, 2011
8039394 Methods of forming layers of alpha-tantalum Oct. 18, 2011
8017464 Semiconductor integrated circuit device and a method for manufacturing a semiconductor integrated circuit device Sep. 13, 2011
8017519 Semiconductor device and manufacturing method thereof Sep. 13, 2011
8008194 Method of manufacturing semiconductor device Aug. 30, 2011
8003526 Low resistance metal silicide local interconnects and a method of making Aug. 23, 2011
7998842 Atomic layer deposition metallic contacts, gates and diffusion barriers Aug. 16, 2011
7994053 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode Aug. 9, 2011
7993987 Surface cleaning using sacrificial getter layer Aug. 9, 2011
7989281 Method for manufacturing dual gate in semiconductor device Aug. 2, 2011
7972583 Iron silicide sputtering target and method for production thereof Jul. 5, 2011
7960231 Method of forming a semiconductor memory device Jun. 14, 2011
7955925 Method of manufacturing semiconductor device Jun. 7, 2011
7951713 Method of forming metal wiring in semiconductor device May. 31, 2011
7947597 Methods of titanium deposition May. 24, 2011

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