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Class Information
Number: 438/681
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Utilizing chemical vapor deposition (i.e., cvd) > Of organo-metallic precursor (i.e., mocvd)
Description: Processes where the chemical vapor deposition process utilizes an organo-metallic compound.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
7799681 Method for forming a ruthenium metal cap layer Sep. 21, 2010
7786010 Method for forming a thin layer on semiconductor substrates Aug. 31, 2010
7749828 Method of manufacturing group III Nitride Transistor Jul. 6, 2010
7737458 Light emitting device having a straight-line shape Jun. 15, 2010
7732325 Plasma-enhanced cyclic layer deposition process for barrier layers Jun. 8, 2010
7723245 Method for manufacturing semiconductor device, and substrate processing apparatus May. 25, 2010
7713876 Method for integrating a ruthenium layer with bulk copper in copper metallization May. 11, 2010
7713874 Periodic plasma annealing in an ALD-type process May. 11, 2010
7709383 Film forming method, and substrate-processing apparatus May. 4, 2010
7709386 Atomic layer deposition method and semiconductor device formed by the same May. 4, 2010
7704858 Methods of forming nickel silicide layers with low carbon content Apr. 27, 2010
7682857 Method for manufacturing semiconductor optical device Mar. 23, 2010
7678710 Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Mar. 16, 2010
7674713 Atmospheric pressure chemical vapor deposition Mar. 9, 2010
7674710 Method of integrating metal-containing films into semiconductor devices Mar. 9, 2010
7666787 Grain growth promotion layer for semiconductor interconnect structures Feb. 23, 2010
7667065 High nucleation density organometallic compounds Feb. 23, 2010
7658860 Metal pattern and process for producing the same Feb. 9, 2010
7655564 Method for forming Ta-Ru liner layer for Cu wiring Feb. 2, 2010
7635647 Atmospheric pressure chemical vapor deposition Dec. 22, 2009
7632351 Atomic layer deposition processes for the formation of ruthenium films, and ruthenium precursors useful in such processes Dec. 15, 2009
7632753 Wafer level package utilizing laser-activated dielectric material Dec. 15, 2009
7629183 Method for manufacturing semiconductor device and computer storage medium Dec. 8, 2009
7625820 Method of selective coverage of high aspect ratio structures with a conformal film Dec. 1, 2009
7608539 ALD method and apparatus Oct. 27, 2009
7598170 Plasma-enhanced ALD of tantalum nitride films Oct. 6, 2009
7595263 Atomic layer deposition of barrier materials Sep. 29, 2009
7592255 Fabricating arrays of metallic nanostructures Sep. 22, 2009
7589017 Methods for growing low-resistivity tungsten film Sep. 15, 2009
7589020 Method for depositing titanium nitride films for semiconductor manufacturing Sep. 15, 2009
7585769 Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE Sep. 8, 2009
7585683 Methods of fabricating ferroelectric devices Sep. 8, 2009
7579276 Substrate processing apparatus and method of manufacturing semiconductor device Aug. 25, 2009
7579285 Atomic layer deposition method for depositing a layer Aug. 25, 2009
7572731 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same Aug. 11, 2009
7566661 Electroless treatment of noble metal barrier and adhesion layer Jul. 28, 2009
7560581 Vapor deposition of tungsten nitride Jul. 14, 2009
7550385 Amine-free deposition of metal-nitride films Jun. 23, 2009
7547632 Methods of forming metal layers in the fabrication of semiconductor devices Jun. 16, 2009
7547631 Organometallic compounds Jun. 16, 2009
7544535 Method for manufacturing semiconductor laser element Jun. 9, 2009
7531458 Organometallic compounds May. 12, 2009
7524765 Direct tailoring of the composition and density of ALD films Apr. 28, 2009
7524766 Method for manufacturing semiconductor device and substrate processing apparatus Apr. 28, 2009
7521348 Method of fabricating semiconductor device having fine contact holes Apr. 21, 2009
7517800 Semiconductor device and manufacturing method thereof Apr. 14, 2009
7498272 Method of depositing rare earth oxide thin films Mar. 3, 2009
7491645 Method for manufacturing a semiconductor device Feb. 17, 2009
7488683 Chemical vapor deposited film based on a plasma CVD method and method of forming the film Feb. 10, 2009
7482289 Methods and apparatus for depositing tantalum metal films to surfaces and substrates Jan. 27, 2009

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