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Class Information
Number: 438/681
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Utilizing chemical vapor deposition (i.e., cvd) > Of organo-metallic precursor (i.e., mocvd)
Description: Processes where the chemical vapor deposition process utilizes an organo-metallic compound.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608539 |
ALD method and apparatus |
Oct. 27, 2009 |
| 7598170 |
Plasma-enhanced ALD of tantalum nitride films |
Oct. 6, 2009 |
| 7595263 |
Atomic layer deposition of barrier materials |
Sep. 29, 2009 |
| 7592255 |
Fabricating arrays of metallic nanostructures |
Sep. 22, 2009 |
| 7589017 |
Methods for growing low-resistivity tungsten film |
Sep. 15, 2009 |
| 7589020 |
Method for depositing titanium nitride films for semiconductor manufacturing |
Sep. 15, 2009 |
| 7585683 |
Methods of fabricating ferroelectric devices |
Sep. 8, 2009 |
| 7585769 |
Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE |
Sep. 8, 2009 |
| 7579285 |
Atomic layer deposition method for depositing a layer |
Aug. 25, 2009 |
| 7579276 |
Substrate processing apparatus and method of manufacturing semiconductor device |
Aug. 25, 2009 |
| 7572731 |
Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
Aug. 11, 2009 |
| 7566661 |
Electroless treatment of noble metal barrier and adhesion layer |
Jul. 28, 2009 |
| 7560581 |
Vapor deposition of tungsten nitride |
Jul. 14, 2009 |
| 7550385 |
Amine-free deposition of metal-nitride films |
Jun. 23, 2009 |
| 7547631 |
Organometallic compounds |
Jun. 16, 2009 |
| 7547632 |
Methods of forming metal layers in the fabrication of semiconductor devices |
Jun. 16, 2009 |
| 7544535 |
Method for manufacturing semiconductor laser element |
Jun. 9, 2009 |
| 7531458 |
Organometallic compounds |
May. 12, 2009 |
| 7524766 |
Method for manufacturing semiconductor device and substrate processing apparatus |
Apr. 28, 2009 |
| 7524765 |
Direct tailoring of the composition and density of ALD films |
Apr. 28, 2009 |
| 7521348 |
Method of fabricating semiconductor device having fine contact holes |
Apr. 21, 2009 |
| 7517800 |
Semiconductor device and manufacturing method thereof |
Apr. 14, 2009 |
| 7498272 |
Method of depositing rare earth oxide thin films |
Mar. 3, 2009 |
| 7491645 |
Method for manufacturing a semiconductor device |
Feb. 17, 2009 |
| 7488683 |
Chemical vapor deposited film based on a plasma CVD method and method of forming the film |
Feb. 10, 2009 |
| 7482289 |
Methods and apparatus for depositing tantalum metal films to surfaces and substrates |
Jan. 27, 2009 |
| 7462559 |
Systems and methods for forming metal-containing layers using vapor deposition processes |
Dec. 9, 2008 |
| 7459395 |
Method for purifying a metal carbonyl precursor |
Dec. 2, 2008 |
| 7456101 |
Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds |
Nov. 25, 2008 |
| 7452811 |
Method for forming a wiring of a semiconductor device, method for forming a metal layer of a semiconductor device and apparatus for performing the same |
Nov. 18, 2008 |
| 7442643 |
Methods of forming conductive elements using organometallic layers and flowable, curable conductive materials |
Oct. 28, 2008 |
| 7439181 |
Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device |
Oct. 21, 2008 |
| 7439180 |
Dispenser system for atomic beam assisted metal organic chemical vapor deposition (MOCVD) |
Oct. 21, 2008 |
| 7439179 |
Healing detrimental bonds in deposited materials |
Oct. 21, 2008 |
| 7435678 |
Method of depositing noble metal electrode using oxidation-reduction reaction |
Oct. 14, 2008 |
| 7432195 |
Method for integrating a conformal ruthenium layer into copper metallization of high aspect ratio features |
Oct. 7, 2008 |
| 7410918 |
Systems and methods for forming metal oxides using alcohols |
Aug. 12, 2008 |
| 7407875 |
Low resistance contact structure and fabrication thereof |
Aug. 5, 2008 |
| 7393785 |
Methods and apparatus for forming rhodium-containing layers |
Jul. 1, 2008 |
| 7368402 |
Systems and methods for forming tantalum oxide layers and tantalum precursor compounds |
May. 6, 2008 |
| 7354842 |
Methods of forming conductive materials |
Apr. 8, 2008 |
| 7351658 |
Process for producing yttrium oxide thin films |
Apr. 1, 2008 |
| 7348274 |
Method of aligning carbon nanotubes and method of manufacturing field emission device using the same |
Mar. 25, 2008 |
| 7344913 |
Spin on memory cell active layer doped with metal ions |
Mar. 18, 2008 |
| 7341944 |
Methods for synthesis of metal nanowires |
Mar. 11, 2008 |
| 7341948 |
Method of making a semiconductor structure with a plating enhancement layer |
Mar. 11, 2008 |
| 7338900 |
Method for forming tungsten nitride film |
Mar. 4, 2008 |
| 7338902 |
Epitaxial growth method and substrate for epitaxial growth |
Mar. 4, 2008 |
| 7329615 |
Atomic layer deposition method of forming an oxide comprising layer on a substrate |
Feb. 12, 2008 |
| 7329606 |
Semiconductor device having nanowire contact structures and method for its fabrication |
Feb. 12, 2008 |
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