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Class Information
Number: 438/663
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Including heat treatment of conductive layer > Rapid thermal anneal
Description: Processes wherein the heat treatment is of sufficiently short time span so as to limit the thermal affects primarily to the electrically conductive layer.










Sub-classes under this class:

Class Number Class Name Patents
438/664 Forming silicide 655


Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8592309 Laser spike annealing for GaN LEDs Nov. 26, 2013
8586475 Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same Nov. 19, 2013
8575014 Semiconductor device fabricated using a metal microstructure control process Nov. 5, 2013
8564136 Semiconductor device and method for fabricating the same Oct. 22, 2013
8497205 Semiconductor device manufacturing method, wiring and semiconductor device Jul. 30, 2013
8492264 Method for forming interconnection levels of an integrated circuit Jul. 23, 2013
8470700 Semiconductor device with reduced contact resistance and method of manufacturing thereof Jun. 25, 2013
8455352 Method for removing native oxide and associated residue from a substrate Jun. 4, 2013
8446924 Laser annealing method and apparatus May. 21, 2013
8383513 Asymmetric rapid thermal annealing to reduce pattern effect Feb. 26, 2013
8378272 Heat treatment apparatus, heat treatment method and storage medium Feb. 19, 2013
8372747 Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same Feb. 12, 2013
8354344 Methods for forming metal-germanide layers and devices obtained thereby Jan. 15, 2013
8324530 Method for heating a wafer by means of a light flux Dec. 4, 2012
8242875 Thin film type varistor and a method of manufacturing the same Aug. 14, 2012
8232114 RTP spike annealing for semiconductor substrate dopant activation Jul. 31, 2012
8207043 Method for fabricating a semiconductor device Jun. 26, 2012
8170072 Laser annealing method and apparatus May. 1, 2012
8143134 Method for manufacturing SOI substrate Mar. 27, 2012
8138086 Method for manufacturing flash memory device Mar. 20, 2012
8138070 Methods of using a set of silicon nanoparticle fluids to control in situ a set of dopant diffusion profiles Mar. 20, 2012
8124530 Method of preventing generation of arc during rapid annealing by joule heating Feb. 28, 2012
8124529 Semiconductor device fabricated using a metal microstructure control process Feb. 28, 2012
8101518 Method and process for forming a self-aligned silicide contact Jan. 24, 2012
8084312 Nitrogen based implants for defect reduction in strained silicon Dec. 27, 2011
8080467 Silicon-based visible and near-infrared optoelectric devices Dec. 20, 2011
8048754 Method for manufacturing SOI substrate and method for manufacturing single crystal semiconductor layer Nov. 1, 2011
8030099 Method for determining time to failure of submicron metal interconnects Oct. 4, 2011
8026145 Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering Sep. 27, 2011
8012873 Method for providing temperature uniformity of rapid thermal annealing Sep. 6, 2011
8008171 Method of fabricating polycrystalline semiconductor Aug. 30, 2011
8003494 Method for producing a bonded wafer Aug. 23, 2011
8003531 Method for manufacturing flash memory device Aug. 23, 2011
7960281 Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same Jun. 14, 2011
7928021 System for and method of microwave annealing semiconductor material Apr. 19, 2011
7897414 Method of manufacturing semiconductor device and thermal annealing apparatus Mar. 1, 2011
7892971 Sub-second annealing processes for semiconductor devices Feb. 22, 2011
7879721 Rapid heating with nanoenergetic materials Feb. 1, 2011
7872338 Microelectromechanical device packages with integral heaters Jan. 18, 2011
7851358 Low temperature method for minimizing copper hillock defects Dec. 14, 2010
7851318 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device Dec. 14, 2010
7846828 Semiconductor device and method for fabricating the same Dec. 7, 2010
7829916 Transistor with a germanium-based channel encased by a gate electrode and method for producing one such transistor Nov. 9, 2010
7811892 Multi-step annealing process Oct. 12, 2010
7799628 Advanced metal gate method and device Sep. 21, 2010
7790563 Semiconductor device, electronic device and method for manufacturing semiconductor device Sep. 7, 2010
RE41538 Method for making integrated circuit including interconnects with enhanced electromigration resistance using doped seed layer and integrated circuits produced thereby Aug. 17, 2010
7763523 Method for forming device isolation structure of semiconductor device using annealing steps to anneal flowable insulation layer Jul. 27, 2010
7745328 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) Jun. 29, 2010
7732312 FUSI integration method using SOG as a sacrificial planarization layer Jun. 8, 2010

1 2 3 4 5 6 7










 
 
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