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Class Information
Number: 438/659
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Altering composition of conductor > Implantation of ion into conductor
Description: Processes wherein an ion is implanted into the electrical conductor (e.g., to alter the composition thereof, etc.).










Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8709944 Method to alter silicide properties using GCIB treatment Apr. 29, 2014
8703607 Method to alter silicide properties using GCIB treatment Apr. 22, 2014
8669155 Hybrid channel semiconductor device and method for forming the same Mar. 11, 2014
8598024 Fabricating method of metal silicide layer, fabricating method of semiconductor device using the same and semiconductor device fabricated using the method Dec. 3, 2013
8587039 Method of forming a semiconductor device featuring a gate stressor and semiconductor device Nov. 19, 2013
8524588 Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process Sep. 3, 2013
8487280 Modulating implantation for improved workpiece splitting Jul. 16, 2013
8470700 Semiconductor device with reduced contact resistance and method of manufacturing thereof Jun. 25, 2013
8435890 Method to alter silicide properties using GCIB treatment May. 7, 2013
8334206 Method for producing metallic interconnect lines Dec. 18, 2012
8329577 Method of forming an alloy in an interconnect structure to increase electromigration resistance Dec. 11, 2012
8313996 Reactive metal implated oxide based memory Nov. 20, 2012
8309448 Method for forming buried word line in semiconductor device Nov. 13, 2012
8187971 Method to alter silicide properties using GCIB treatment May. 29, 2012
8137995 Double-sided semiconductor device and method of forming top-side and bottom-side interconnect structures Mar. 20, 2012
8039395 Technique for forming embedded metal lines having increased resistance against stress-induced material transport Oct. 18, 2011
8008186 Semiconductor device and method of fabricating the same Aug. 30, 2011
8003511 Memory cell formation using ion implant isolated conductive metal oxide Aug. 23, 2011
7939397 Method of manufacturing semiconductor device May. 10, 2011
7928021 System for and method of microwave annealing semiconductor material Apr. 19, 2011
7833855 Methods of producing integrated circuit devices utilizing tantalum amine derivatives Nov. 16, 2010
7807522 Lanthanide series metal implant to control work function of metal gate electrodes Oct. 5, 2010
7799683 Copper interconnect wiring and method and apparatus for forming thereof Sep. 21, 2010
7767583 Method to improve uniformity of chemical mechanical polishing planarization Aug. 3, 2010
7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned May. 4, 2010
7696517 NMOS transistors that mitigate fermi-level pinning by employing a hafnium-silicon gate electrode and high-k gate dieletric Apr. 13, 2010
7659198 In-situ deposition for Cu hillock suppression Feb. 9, 2010
7648884 Semiconductor device with integrated resistive element and method of making Jan. 19, 2010
7645699 Method of forming a diffusion barrier layer using a TaSiN layer and method of forming a metal interconnection line using the same Jan. 12, 2010
7638432 Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same Dec. 29, 2009
7628896 Coated article with transparent conductive oxide film doped to adjust Fermi level, and method of making same Dec. 8, 2009
7592257 Semiconductor contact structure containing an oxidation-resistant diffusion barrier and method of forming Sep. 22, 2009
7572660 Electrical through-plating of semiconductor chips Aug. 11, 2009
7553763 Salicide process utilizing a cluster ion implantation process Jun. 30, 2009
7550387 Semiconductor wafer processing method Jun. 23, 2009
7538030 Semiconductor device and method of manufacturing same May. 26, 2009
7528024 Dual work function metal gate integration in semiconductor devices May. 5, 2009
7479446 Semiconductor device and method of manufacturing same Jan. 20, 2009
7465977 Method for producing a packaged integrated circuit Dec. 16, 2008
7452744 Method of manufacturing solid image pickup apparatus Nov. 18, 2008
7442640 Semiconductor device manufacturing methods Oct. 28, 2008
7413992 Tungsten silicide etch process with reduced etch rate micro-loading Aug. 19, 2008
7407884 Method for forming an aluminum contact Aug. 5, 2008
7396745 Formation of ultra-shallow junctions by gas-cluster ion irradiation Jul. 8, 2008
7393781 Capping of metal interconnects in integrated circuit electronic devices Jul. 1, 2008
7378737 Structures and methods to enhance copper metallization May. 27, 2008
7371681 Method of manufacturing a semiconductor device May. 13, 2008
7300871 Method of doping a conductive layer near a via Nov. 27, 2007
7297588 Electronic device comprising a gate electrode including a metal-containing layer having one or more impurities and a process for forming the same Nov. 20, 2007
7285482 Method for producing solid-state imaging device Oct. 23, 2007

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