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Class Information
Number: 438/655
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Plural layered electrode or conductor > Silicide
Description: Processes wherein at least one of the diverse conductive layers is formed by the chemical combination of silicon (Si) with a metal atom.










Patents under this class:

Patent Number Title Of Patent Date Issued
8658483 Method of fabricating an integrated circuit device having backside bevel protection Feb. 25, 2014
8652963 MOSFET integrated circuit with uniformly thin silicide layer and methods for its manufacture Feb. 18, 2014
8643182 Semiconductor film, method for manufacturing the same, and power storage device Feb. 4, 2014
8642434 Structure and method for mobility enhanced MOSFETS with unalloyed silicide Feb. 4, 2014
8642433 Method for manufacturing semiconductor device Feb. 4, 2014
8580680 Metal silicide formation Nov. 12, 2013
8580666 Methods of forming conductive contacts Nov. 12, 2013
8563429 Methods of forming a metal silicide layer for semiconductor devices Oct. 22, 2013
8563424 Process for forming cobalt and cobalt silicide materials in tungsten contact applications Oct. 22, 2013
8541303 Method for fabricating MOS transistor Sep. 24, 2013
8541297 Manufacturing method of semiconductor device Sep. 24, 2013
8541280 Semiconductor structure and method for manufacturing the same Sep. 24, 2013
8536052 Semiconductor device comprising contact elements with silicided sidewall regions Sep. 17, 2013
8513807 Semiconductor devices including a ruthenium film Aug. 20, 2013
8513117 Process to remove Ni and Pt residues for NiPtSi applications Aug. 20, 2013
8497205 Semiconductor device manufacturing method, wiring and semiconductor device Jul. 30, 2013
8492899 Method to electrodeposit nickel on silicon for forming controllable nickel silicide Jul. 23, 2013
8470707 Silicide method Jun. 25, 2013
8466058 Process to remove Ni and Pt residues for NiPtSi applications using chlorine gas Jun. 18, 2013
8455360 Method for fabricating storage node of semiconductor device Jun. 4, 2013
8455044 Semiconductor film, method for manufacturing the same, and power storage device Jun. 4, 2013
8450216 Contact etch stop layers of a field effect transistor May. 28, 2013
8445372 Selective silicide formation using resist etch back May. 21, 2013
8435889 Methods of forming CoSi.sub.2, methods of forming field effect transistors, and methods of forming conductive contacts May. 7, 2013
8431453 Plasma doping to reduce dielectric loss during removal of dummy layers in a gate structure Apr. 30, 2013
8415254 Method for removing dummy poly in a gate last process Apr. 9, 2013
8404589 Silicide contact formation Mar. 26, 2013
8394194 Single crystal reo buffer on amorphous SiO.sub.x Mar. 12, 2013
8377812 SiC MOSFETs and self-aligned fabrication methods thereof Feb. 19, 2013
8372750 Method and system for improved nickel silicide Feb. 12, 2013
8361851 Method for manufacturing an NMOS with improved carrier mobility Jan. 29, 2013
8354334 Power semiconductor chip with a formed patterned thick metallization atop Jan. 15, 2013
8350344 Semiconductor device and method of fabricating the same Jan. 8, 2013
8349730 Transitional interface between metal and dielectric in interconnect structures Jan. 8, 2013
8349718 Self-aligned silicide formation on source/drain through contact via Jan. 8, 2013
8338292 Body contacts for FET in SOI SRAM array Dec. 25, 2012
8338242 Backside bevel protection Dec. 25, 2012
8330234 Semiconductor device and manufacturing process therefor Dec. 11, 2012
8324058 Contacts for FET devices Dec. 4, 2012
8324043 Methods of manufacturing semiconductor devices with Si and SiGe epitaxial layers Dec. 4, 2012
8304342 Sacrificial CMP etch stop layer Nov. 6, 2012
8304319 Method for making a disilicide Nov. 6, 2012
8278215 Noble metal activation layer Oct. 2, 2012
8268180 Methods of fabricating large-area, semiconducting nanoperforated graphene materials Sep. 18, 2012
8236693 Methods of forming silicides of different thicknesses on different structures Aug. 7, 2012
8236691 Method of high aspect ratio plug fill Aug. 7, 2012
8227342 Method of fabricating a transistor with semiconductor gate combined locally with a metal Jul. 24, 2012
8202799 Methods of manufacturing metal-silicide features Jun. 19, 2012
8187970 Process for forming cobalt and cobalt silicide materials in tungsten contact applications May. 29, 2012
8178433 Methods for the formation of fully silicided metal gates May. 15, 2012











 
 
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