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Class Information
Number: 438/651
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Contacting multiple semiconductive regions (i.e., interconnects) > Diverse conductors > Having noble group metal (i.e., silver (ag), gold (au), platinum (pt), palladium (pd), rhodium (rh), ruthenium (ru), iridium (ir), osmium (os), or alloy thereof) > Silicide
Description: Processes for forming a contact using the chemical combination of silicon (Si) with one of the noble group elements (e.g., silver (Ag), gold (Au), platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), iridium (Ir), osmium (Os), or alloy thereof).










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8703591 Method for fabricating black silicon by using plasma immersion ion implantation Apr. 22, 2014
8658485 Semiconductor device and method of fabricating the same Feb. 25, 2014
8647976 Semiconductor package having test pads on top and bottom substrate surfaces and method of testing same Feb. 11, 2014
8575023 Contact formation method, semiconductor device manufacturing method, and semiconductor device Nov. 5, 2013
8569170 Manufacturing method of semiconductor device comprising silicide layer with varied thickness Oct. 29, 2013
8470707 Silicide method Jun. 25, 2013
8466064 Semiconductor integrated circuit device and method of manufacturing a semiconductor integrated circuit device Jun. 18, 2013
8415254 Method for removing dummy poly in a gate last process Apr. 9, 2013
8404589 Silicide contact formation Mar. 26, 2013
8338292 Body contacts for FET in SOI SRAM array Dec. 25, 2012
8304342 Sacrificial CMP etch stop layer Nov. 6, 2012
8236685 Phase change memory device having multiple metal silicide layers and method of manufacturing the same Aug. 7, 2012
8202799 Methods of manufacturing metal-silicide features Jun. 19, 2012
8178438 Manufacturing method of semiconductor device and electronic device May. 15, 2012
8173540 Methods of forming silicide regions and resulting MOS devices May. 8, 2012
8148262 Method for manufacturing semiconductor device Apr. 3, 2012
8105946 Method of forming conductive lines of semiconductor memory device Jan. 31, 2012
8058167 Dynamic Schottky barrier MOSFET device and method of manufacture Nov. 15, 2011
8021944 Method for fabricating semiconductor device Sep. 20, 2011
7994038 Method to reduce MOL damage on NiSi Aug. 9, 2011
7879723 Semiconductor device manufacturing method, wiring and semiconductor device Feb. 1, 2011
7863191 Manufacturing method of semiconductor device Jan. 4, 2011
7858518 Method for forming a selective contact and local interconnect in situ Dec. 28, 2010
7851352 Manufacturing method of semiconductor device and electronic device Dec. 14, 2010
7799682 Transistor having a locally provided metal silicide region in contact areas and a method of forming the transistor Sep. 21, 2010
7754554 Methods for fabricating low contact resistance CMOS circuits Jul. 13, 2010
7750471 Metal and alloy silicides on a single silicon wafer Jul. 6, 2010
7736984 Method of forming a low resistance semiconductor contact and structure therefor Jun. 15, 2010
7719035 Low contact resistance CMOS circuits and methods for their fabrication May. 18, 2010
7662716 Method for forming silicide contacts Feb. 16, 2010
7655557 CMOS silicide metal gate integration Feb. 2, 2010
7638428 Semiconductor structure and method of forming the same Dec. 29, 2009
7638427 MOS transistor with fully silicided gate Dec. 29, 2009
7632744 Semiconductor integrated circuit device and process for manufacturing the same Dec. 15, 2009
7595233 Gate stress engineering for MOSFET Sep. 29, 2009
7569482 Method for the selective removal of an unsilicided metal Aug. 4, 2009
7553762 Method for forming metal silicide layer Jun. 30, 2009
7550372 Method of fabricating conductive lines with silicide layer Jun. 23, 2009
7528067 MOSFET structure with multiple self-aligned silicide contacts May. 5, 2009
7501333 Work function adjustment on fully silicided (FUSI) gate Mar. 10, 2009
7456095 Method and apparatus for forming nickel silicide with low defect density in FET devices Nov. 25, 2008
7446043 Contact structure having silicide layers, semiconductor device employing the same, and methods of fabricating the contact structure and semiconductor device Nov. 4, 2008
7425482 Non-volatile memory device and method for fabricating the same Sep. 16, 2008
7396764 Manufacturing method for forming all regions of the gate electrode silicided Jul. 8, 2008
7375013 Semiconductor integrated circuit device and process for manufacturing the same May. 20, 2008
7371333 Methods of etching nickel silicide and cobalt silicide and methods of forming conductive lines May. 13, 2008
7358188 Method of forming conductive metal silicides by reaction of metal with silicon Apr. 15, 2008
7348265 Semiconductor device having a silicided gate electrode and method of manufacture therefor Mar. 25, 2008
7344985 Nickel alloy silicide including indium and a method of manufacture therefor Mar. 18, 2008
7338888 Method for manufacturing a semiconductor device having a silicided gate electrode and a method for manufacturing an integrated circuit including the same Mar. 4, 2008

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