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Class Information
Number: 438/649
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Contacting multiple semiconductive regions (i.e., interconnects) > Diverse conductors > Having refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof) > Silicide
Description: Processes for forming a conductive layer using the chemical combination of silicon (Si) with one of the refractory group elements (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof).










Patents under this class:
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Patent Number Title Of Patent Date Issued
8673778 Tungsten film forming method Mar. 18, 2014
8658485 Semiconductor device and method of fabricating the same Feb. 25, 2014
8658530 Method of fabricating an epitaxial Ni silicide film Feb. 25, 2014
8603881 Raised trench metal semiconductor alloy formation Dec. 10, 2013
8598033 Method for forming a salicide layer Dec. 3, 2013
8592305 Doping aluminum in tantalum silicide Nov. 26, 2013
8569170 Manufacturing method of semiconductor device comprising silicide layer with varied thickness Oct. 29, 2013
8536010 Method for making a disilicide Sep. 17, 2013
8466064 Semiconductor integrated circuit device and method of manufacturing a semiconductor integrated circuit device Jun. 18, 2013
8455352 Method for removing native oxide and associated residue from a substrate Jun. 4, 2013
8409989 Structure and method to fabricate a body contact Apr. 2, 2013
8357611 Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof Jan. 22, 2013
8358144 Method for manufacturing semiconductor device, semiconductor inspection device, and program including color imaging of metal silicide Jan. 22, 2013
8349718 Self-aligned silicide formation on source/drain through contact via Jan. 8, 2013
8338292 Body contacts for FET in SOI SRAM array Dec. 25, 2012
8304319 Method for making a disilicide Nov. 6, 2012
8293643 Method and structure of forming silicide and diffusion barrier layer with direct deposited film on silicon Oct. 23, 2012
8258035 Method to improve source/drain parasitics in vertical devices Sep. 4, 2012
8236685 Phase change memory device having multiple metal silicide layers and method of manufacturing the same Aug. 7, 2012
8202799 Methods of manufacturing metal-silicide features Jun. 19, 2012
8173540 Methods of forming silicide regions and resulting MOS devices May. 8, 2012
8158473 Method for manufacturing a semiconductor device having a silicide region comprised of a silicide of a nickel alloy Apr. 17, 2012
8148248 Semiconductor device and manufacturing method thereof Apr. 3, 2012
8084359 Semiconductor package and methods of manufacturing the same Dec. 27, 2011
8076239 Semiconductor device and method of manufacturing the same Dec. 13, 2011
8030210 Contact barrier structure and manufacturing methods Oct. 4, 2011
8021944 Method for fabricating semiconductor device Sep. 20, 2011
8003526 Low resistance metal silicide local interconnects and a method of making Aug. 23, 2011
7985668 Method for forming a metal silicide having a lower potential for containing material defects Jul. 26, 2011
7985678 Method of manufacturing a semiconductor integrated circuit device Jul. 26, 2011
7911004 Semiconductor device and manufacturing method of the same Mar. 22, 2011
7906429 Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof Mar. 15, 2011
7879723 Semiconductor device manufacturing method, wiring and semiconductor device Feb. 1, 2011
7863192 Methods for full gate silicidation of metal gate structures Jan. 4, 2011
7858518 Method for forming a selective contact and local interconnect in situ Dec. 28, 2010
7842520 Method for manufacturing semiconductor device, semiconductor inspection device, and program including color imaging of metal silicide and calculations thereof Nov. 30, 2010
7816258 Method for manufacturing electro-optic device substrate with titanium silicide regions formed within Oct. 19, 2010
7816218 Selective deposition of amorphous silicon films on metal gates Oct. 19, 2010
7811928 Semiconductor devices and fabrication methods thereof Oct. 12, 2010
7803706 Semiconductor device manufacturing method and semiconductor device Sep. 28, 2010
7799650 Method for making a transistor with a stressor Sep. 21, 2010
7799682 Transistor having a locally provided metal silicide region in contact areas and a method of forming the transistor Sep. 21, 2010
7781316 Methods of manufacturing metal-silicide features Aug. 24, 2010
7781296 Integrated circuit comprising a capacitor with metal electrodes and process for fabricating such a capacitor Aug. 24, 2010
7763540 Method of forming a silicided gate utilizing a CMP stack Jul. 27, 2010
7754554 Methods for fabricating low contact resistance CMOS circuits Jul. 13, 2010
7750471 Metal and alloy silicides on a single silicon wafer Jul. 6, 2010
7737032 MOSFET structure with multiple self-aligned silicide contacts Jun. 15, 2010
7736984 Method of forming a low resistance semiconductor contact and structure therefor Jun. 15, 2010
7732327 Vapor deposition of tungsten materials Jun. 8, 2010

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