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Class Information
Number: 438/623
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > To form ohmic contact to semiconductive material > Contacting multiple semiconductive regions (i.e., interconnects) > Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) > Including organic insulating material between metal levels
Description: Processes wherein the intervening dielectric is at least partly composed of organic insulating material.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7611986 Dual damascene patterning method Nov. 3, 2009
7601631 Very low dielectric constant plasma-enhanced CVD films Oct. 13, 2009
7598166 Dielectric layers for metal lines in semiconductor chips Oct. 6, 2009
7598173 Electro-optic displays, and components for use therein Oct. 6, 2009
7592249 Method for manufacturing a semiconductor device Sep. 22, 2009
7582555 CVD flowable gap fill Sep. 1, 2009
7579647 Non-volatile semiconductor memory device having memory cell array suitable for high density and high integration Aug. 25, 2009
7575999 Method for creating conductive elements for semiconductor device structures using laser ablation processes and methods of fabricating semiconductor device assemblies Aug. 18, 2009
7575981 Method for fabricating isolation layer in semiconductor device Aug. 18, 2009
7572723 Micropad for bonding and a method therefor Aug. 11, 2009
7572710 Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects Aug. 11, 2009
7563706 Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device Jul. 21, 2009
7563707 Laser process for reliable and low-resistance electrical contacts Jul. 21, 2009
7563728 Methods of modifying interlayer adhesion Jul. 21, 2009
7560307 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same Jul. 14, 2009
7560377 Plasma processes for depositing low dielectric constant films Jul. 14, 2009
7554176 Integrated circuits having a multi-layer structure with a seal ring Jun. 30, 2009
7553707 Method for manufacturing a Liquid crystal display device Jun. 30, 2009
7541277 Stress relaxation, selective nitride phase removal Jun. 2, 2009
7537964 Method of fabricating a miniature silicon condenser microphone May. 26, 2009
7534717 Method of manufacturing semiconductor device May. 19, 2009
7534721 Semiconductor device manufacturing device May. 19, 2009
7534718 Post passivation interconnection schemes on top of IC chips May. 19, 2009
7531432 Block-molded semiconductor device singulation methods and systems May. 12, 2009
7531444 Method to create air gaps using non-plasma processes to damage ILD materials May. 12, 2009
7524759 Post passivation interconnection schemes on top of IC chip Apr. 28, 2009
7521354 Low k interlevel dielectric layer fabrication methods Apr. 21, 2009
7521353 Method for reducing dielectric overetch when making contact to conductive features Apr. 21, 2009
7514371 Semiconductor substrate surface protection method Apr. 7, 2009
7510959 Method of manufacturing a semiconductor device having damascene structures with air gaps Mar. 31, 2009
7504719 Printed wiring board having a roughened surface formed on a metal layer, and method for producing the same Mar. 17, 2009
7504699 Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections Mar. 17, 2009
7501339 Methods for making dual-damascene dielectric structures Mar. 10, 2009
7491658 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Feb. 17, 2009
7485569 Printed circuit board including embedded chips and method of fabricating the same Feb. 3, 2009
7482259 Chip structure and process for forming the same Jan. 27, 2009
7482263 Semiconductor device and method for manufacturing the same Jan. 27, 2009
7482286 Method for forming dielectric or metallic films Jan. 27, 2009
7482687 Etch stop in a damascene interconnect structure Jan. 27, 2009
7479450 Post passivation interconnection schemes on top of the IC chips Jan. 20, 2009
7476609 Forming of a cavity in an insulating layer Jan. 13, 2009
7473652 Organic polymers, electronic devices, and methods Jan. 6, 2009
7470610 Method of fabricating organic electroluminescent devices Dec. 30, 2008
7456067 Method with high gapfill capability for semiconductor devices Nov. 25, 2008
7452795 Semiconductor device and method for fabricating the same Nov. 18, 2008
7452802 Method of forming metal wiring for high voltage element Nov. 18, 2008
7449408 Method for manufacturing semiconductor device Nov. 11, 2008
7446030 Methods for fabricating current-carrying structures using voltage switchable dielectric materials Nov. 4, 2008
7446031 Post passivation interconnection schemes on top of IC chips Nov. 4, 2008
7446035 Post passivation interconnection schemes on top of IC chips Nov. 4, 2008

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