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Class Information
Number: 438/592
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > Insulated gate formation > Possessing plural conductive layers (e.g., polycide)
Description: Processes wherein the electrode is a laminate of multiple conductive layers.










Sub-classes under this class:

Class Number Class Name Patents
438/593 Separated by insulator (i.e., floating gate) 766


Patents under this class:

Patent Number Title Of Patent Date Issued
8703595 N/P boundary effect reduction for metal gate transistors Apr. 22, 2014
8691682 Semiconductor device and method for forming the same Apr. 8, 2014
8691681 Semiconductor device having a metal gate and fabricating method thereof Apr. 8, 2014
8685850 System and method of plating conductive gate contacts on metal gates for self-aligned contact interconnections Apr. 1, 2014
8679926 Local charge and work function engineering on MOSFET Mar. 25, 2014
8669618 Manufacturing method for semiconductor device having metal gate Mar. 11, 2014
8664103 Metal gate stack formation for replacement gate technology Mar. 4, 2014
8664065 Method of forming an insulated gate field effect transistor device having a shield electrode structure Mar. 4, 2014
8658526 Methods for increased array feature density Feb. 25, 2014
8658499 Three dimensional NAND device and method of charge trap layer separation and floating gate formation in the NAND device Feb. 25, 2014
8653602 Transistor having replacement metal gate and process for fabricating the same Feb. 18, 2014
8652914 Two-step silicide formation Feb. 18, 2014
8652909 Methods of forming a nonvolatile memory cell and methods of forming an array of nonvolatile memory cells array of nonvolatile memory cells Feb. 18, 2014
8647972 Multi-layer work function metal replacement gate Feb. 11, 2014
8647954 Two-step silicide formation Feb. 11, 2014
8642377 Method of producing conductive thin film Feb. 4, 2014
8637390 Metal gate structures and methods for forming thereof Jan. 28, 2014
8633068 Vertical transistor actuation Jan. 21, 2014
8609524 Method for making semiconductor device comprising replacement gate electrode structures with an enhanced diffusion barrier Dec. 17, 2013
8598002 Method for manufacturing metal gate stack structure in gate-first process Dec. 3, 2013
8586464 Chemical mechanical polishing slurry composition for polishing phase-change memory device and method for polishing phase-change memory device using the same Nov. 19, 2013
8569171 Mask-based silicidation for FEOL defectivity reduction and yield boost Oct. 29, 2013
8569140 Method of fabricating semiconductor device Oct. 29, 2013
8564072 Semiconductor device having a blocking structure and method of manufacturing the same Oct. 22, 2013
8564066 Interface-free metal gate stack Oct. 22, 2013
8563415 Semiconductor device and method of manufacturing the same Oct. 22, 2013
8546892 Semiconductor device and method for manufacturing semiconductor device Oct. 1, 2013
8546252 Metal gate FET having reduced threshold voltage roll-off Oct. 1, 2013
8546251 Compact read only memory cell Oct. 1, 2013
8541297 Manufacturing method of semiconductor device Sep. 24, 2013
8536041 Method for fabricating transistor with high-K dielectric sidewall spacer Sep. 17, 2013
8536040 Techniques for using material substitution processes to form replacement metal gate electrodes of semiconductor devices with self-aligned contacts Sep. 17, 2013
8536005 Semiconductor integrated circuit device and manufacturing method thereof Sep. 17, 2013
8524588 Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process Sep. 3, 2013
8524564 Full silicidation prevention via dual nickel deposition approach Sep. 3, 2013
8497212 Filling narrow openings using ion beam etch Jul. 30, 2013
8492817 Highly scalable trench capacitor Jul. 23, 2013
8492259 Method of forming metal gate structure Jul. 23, 2013
8486775 Thin film transistor array panel and method for manufacturing the same Jul. 16, 2013
8477006 Resistor and manufacturing method thereof Jul. 2, 2013
8470703 Semiconductor device and method of fabricating the same Jun. 25, 2013
8455345 Methods of forming gate structure and methods of manufacturing semiconductor device including the same Jun. 4, 2013
8445372 Selective silicide formation using resist etch back May. 21, 2013
8440560 Method for fabricating tungsten line and method for fabricating gate of semiconductor device using the same May. 14, 2013
8431458 Methods of forming a nonvolatile memory cell and methods of forming an array of nonvolatile memory cells Apr. 30, 2013
8420519 Methods for fabricating integrated circuits with controlled P-channel threshold voltage Apr. 16, 2013
8409937 Producing transistor including multi-layer reentrant profile Apr. 2, 2013
8404575 Semiconductor device and method for manufacturing same Mar. 26, 2013
8404534 End-to-end gap fill using dielectric film Mar. 26, 2013
8399345 Semiconductor device having nickel silicide layer Mar. 19, 2013











 
 
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