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Class Information
Number: 438/585
Name: Semiconductor device manufacturing: process > Coating with electrically or thermally conductive material > Insulated gate formation
Description: Processes for forming an electrode which is electrically insulated from the adjoining semiconductor regions and which upon application of a voltage thereto exerts a change in electrical behavior in the adjoining semiconductor region.










Sub-classes under this class:

Class Number Class Name Patents
438/586 Combined with formation of ohmic contact to semiconductor region 1,194
438/590 Compound semiconductor 169
438/587 Forming array of gate electrodes 647
438/591 Gate insulator structure constructed of plural layers or nonsilicon containing compound 1,002
438/595 Having sidewall structure 1,087
438/592 Possessing plural conductive layers (e.g., polycide) 1,470
438/589 Recessed into semiconductor substrate 800


Patents under this class:

Patent Number Title Of Patent Date Issued
8703594 Semiconductor device having a treated gate structure and fabrication method thereof Apr. 22, 2014
8674452 Semiconductor device with lower metal layer thickness in PMOS region Mar. 18, 2014
8673758 Structure of metal gate and fabrication method thereof Mar. 18, 2014
8673757 Structure and method for using high-k material as an etch stop layer in dual stress layer process Mar. 18, 2014
8664103 Metal gate stack formation for replacement gate technology Mar. 4, 2014
8664057 High-K metal gate electrode structures formed by early cap layer adaptation Mar. 4, 2014
8658539 Fin profile structure and method of making same Feb. 25, 2014
8658489 Method for dual work function metal gate CMOS with selective capping Feb. 25, 2014
8652957 High-K gate dielectric oxide Feb. 18, 2014
8652956 High-k metal gate electrode structures formed by separate removal of placeholder materials using a masking regime prior to gate patterning Feb. 18, 2014
8652955 Manufacturing method of semiconductor integrated circuit device Feb. 18, 2014
8647949 Structure and method of fabricating a transistor having a trench gate Feb. 11, 2014
8637385 High voltage durability transistor and method for fabricating same Jan. 28, 2014
8637384 FinFET parasitic capacitance reduction using air gap Jan. 28, 2014
8637361 Semiconductor nanostructures, semiconductor devices, and methods of making same Jan. 28, 2014
8629046 Semiconductor device with a dislocation structure and method of forming the same Jan. 14, 2014
8624224 Nanotube array bipolar transistors Jan. 7, 2014
8618602 Semiconductor device and method of forming the same Dec. 31, 2013
8614142 Laminated structure, multilayer wiring board, active matrix substrate, image display apparatus, and method for manufacturing laminated structure Dec. 24, 2013
8609523 Method of making a memory array with surrounding gate access transistors and capacitors with global staggered local bit lines Dec. 17, 2013
8609474 Method of manufacturing semiconductor device Dec. 17, 2013
8603904 Semiconductor device and manufacturing method therefor Dec. 10, 2013
8598028 Gate height loss improvement for a transistor Dec. 3, 2013
8587039 Method of forming a semiconductor device featuring a gate stressor and semiconductor device Nov. 19, 2013
8581413 Semiconductor device and method for manufacturing the same Nov. 12, 2013
8580625 Metal oxide semiconductor transistor and method of manufacturing the same Nov. 12, 2013
8575014 Semiconductor device fabricated using a metal microstructure control process Nov. 5, 2013
8575013 Replacement gate fabrication methods Nov. 5, 2013
8569185 Method of fabricating gate electrode using a treated hard mask Oct. 29, 2013
8569159 CMOS structure including non-planar hybrid orientation substrate with planar gate electrodes and method for fabrication Oct. 29, 2013
8569125 FinFET with improved gate planarity Oct. 29, 2013
8563415 Semiconductor device and method of manufacturing the same Oct. 22, 2013
8563412 Method of fabricating semiconductor device Oct. 22, 2013
8563411 Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same Oct. 22, 2013
8563410 End-cut first approach for critical dimension control Oct. 22, 2013
8557702 Plasma-enhanced atomic layers deposition of conductive material over dielectric layers Oct. 15, 2013
8557694 Method for forming gate of semiconductor device Oct. 15, 2013
8552478 Corner transistor and method of fabricating the same Oct. 8, 2013
8551873 Method for manufacturing semiconductor device Oct. 8, 2013
8546854 Semiconductor device and method for manufacturing the same Oct. 1, 2013
8541270 Finlike structures and methods of making same Sep. 24, 2013
8537608 Data cells with drivers and methods of making and operating the same Sep. 17, 2013
8525275 Methods of forming non-volatile memory devices Sep. 3, 2013
8524617 Methods for manufacturing dielectric films Sep. 3, 2013
8518811 Schottky diodes having metal gate electrodes and methods of formation thereof Aug. 27, 2013
8518766 Method of forming switching device having a molybdenum oxynitride metal gate Aug. 27, 2013
8518757 Method of fabricating strained semiconductor structures from silicon-on-insulator (SOI) Aug. 27, 2013
8518723 Method of fabricating semiconductor integrated circuit device Aug. 27, 2013
8513725 Nonvolatile semiconductor memory device and method of manufacturing the same Aug. 20, 2013
8513105 Flexible integration of logic blocks with transistors of different threshold voltages Aug. 20, 2013











 
 
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