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Class Information
Number: 438/567
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Diffusing a dopant > From vapor phase > Solid source in operative relation with semiconductor region
Description: Processes wherein the dopant source material originates from a solid source in close proximity to the semiconductor region to be doped.

Sub-classes under this class:

Class Number Class Name Patents
438/568 In capsule-type enclosure 31

Patents under this class:
1 2

Patent Number Title Of Patent Date Issued
8450130 Method of manufacturing a semiconductor laser May. 28, 2013
8372721 Work function engineering for eDRAM MOSFETs Feb. 12, 2013
8030188 Methods of forming a compound semiconductor device including a diffusion region Oct. 4, 2011
7883998 Vapor phase growth method Feb. 8, 2011
7507649 Method for electrical doping a semiconductor material with Cesium Mar. 24, 2009
6825104 Semiconductor device with selectively diffused regions Nov. 30, 2004
6774012 Furnace system and method for selectively oxidizing a sidewall surface of a gate conductor by oxidizing a silicon sidewall in lieu of a refractory metal sidewall Aug. 10, 2004
6562705 Method and apparatus for manufacturing semiconductor element May. 13, 2003
6461948 Method of doping silicon with phosphorus and growing oxide on silicon in the presence of steam Oct. 8, 2002
6461947 Photovoltaic device and making of the same Oct. 8, 2002
6426280 Method for doping spherical semiconductors Jul. 30, 2002
6426291 Method of co-deposition to form ultra-shallow junctions in MOS devices using electroless or electrodeposition Jul. 30, 2002
6143633 In-situ diffusion of dopant impurities during dendritic web growth of crystal ribbon Nov. 7, 2000
6110276 Method for making n-type semiconductor diamond Aug. 29, 2000
5972784 Arrangement, dopant source, and method for making solar cells Oct. 26, 1999
5926727 Phosphorous doping a semiconductor particle Jul. 20, 1999
5866472 Direct gas-phase doping of semiconductor wafers using an organic dopant source Feb. 2, 1999
5851909 Method of producing semiconductor device using an adsorption layer Dec. 22, 1998
5851906 Impurity doping method Dec. 22, 1998
5763320 Boron doping a semiconductor particle Jun. 9, 1998
5656541 Low temperature P.sub.2 O.sub.5 oxide diffusion source Aug. 12, 1997
5635422 Diffusing dopants into a semiconductor wafer Jun. 3, 1997
5629234 High temperature phosphorous oxide diffusion source May. 13, 1997
5550082 Method and apparatus for doping silicon wafers using a solid dopant source and rapid thermal processing Aug. 27, 1996
5223452 Method and apparatus for doping silicon spheres Jun. 29, 1993
5208185 Process for diffusing boron into semiconductor wafers May. 4, 1993
4929572 Dopant of arsenic, method for the preparation thereof and method for doping of semiconductor therewith May. 29, 1990
4857480 Method for diffusing P-type material using boron disks Aug. 15, 1989
4820656 Method for producing a p-doped semiconductor region in an n-conductive semiconductor body Apr. 11, 1989
4800175 Phosphorous planar dopant source for low temperature applications Jan. 24, 1989
4798764 Arsenate dopant sources and method of making the sources Jan. 17, 1989
4749615 Semiconductor dopant source Jun. 7, 1988
4742022 Method of diffusing zinc into III-V compound semiconductor material May. 3, 1988
4734386 Boron nitride dopant source for diffusion doping Mar. 29, 1988
4725565 Method of diffusing conductivity type imparting material into III-V compound semiconductor material Feb. 16, 1988
4661177 Method for doping semiconductor wafers by rapid thermal processing of solid planar diffusion sources Apr. 28, 1987
4592793 Process for diffusing impurities into a semiconductor body vapor phase diffusion of III-V semiconductor substrates Jun. 3, 1986
4588455 Planar diffusion source May. 13, 1986
4526826 Foam semiconductor dopant carriers Jul. 2, 1985
4525429 Porous semiconductor dopant carriers Jun. 25, 1985
4415385 Diffusion of impurities into semiconductor using semi-closed inner diffusion vessel Nov. 15, 1983
4379006 B.sub.2 O.sub.3 Diffusion processes Apr. 5, 1983
4373975 Method of diffusing an impurity Feb. 15, 1983
4282282 Barium aluminosilicate glasses, glass-ceramics and dopant Aug. 4, 1981
4239560 Open tube aluminum oxide disc diffusion Dec. 16, 1980
4235650 Open tube aluminum diffusion Nov. 25, 1980
4175988 Melt-formed polycrystalline ceramics and dopant hosts containing phosphorus Nov. 27, 1979
4160672 Glass-ceramics for semiconductor doping Jul. 10, 1979
4141738 Melt-formed polycrystalline ceramics and dopant hosts containing phosphorus Feb. 27, 1979
4124417 Method of diffusing impurities in semiconductor bodies Nov. 7, 1978

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