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Class Information
Number: 438/564
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Diffusing a dopant > From solid dopant source in contact with semiconductor region > Polycrystalline semiconductor source
Description: Processes wherein the solid dopant source material is composed of a multicrystalline semiconductor (i.e., polysilicon).










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8309446 Hybrid heterojunction solar cell fabrication using a doping layer mask Nov. 13, 2012
8236710 Technique to create a buried plate in embedded dynamic random access memory device Aug. 7, 2012
8232187 Doping method for semiconductor device Jul. 31, 2012
8084345 Methods of forming dispersions of nanoparticles, and methods of forming flash memory cells Dec. 27, 2011
8058127 Manufacturing method of semiconductor power devices Nov. 15, 2011
8053344 Methods of forming integrated circuits Nov. 8, 2011
7989329 Removal of surface dopants from a substrate Aug. 2, 2011
7838437 Method for simultaneous recrystallization and doping of semiconductor layers Nov. 23, 2010
7563666 Semiconductor structures including vertical diode structures and methods of making the same Jul. 21, 2009
7553748 Semiconductor device and method of manufacturing the same Jun. 30, 2009
7462537 Fabricating method of an non-volatile memory Dec. 9, 2008
7449384 Method of manufacturing flash memory device Nov. 11, 2008
7419872 Method for preparing a trench capacitor structure Sep. 2, 2008
7045397 JFET and MESFET structures for low voltage high current and high frequency applications May. 16, 2006
6867113 In-situ deposition and doping process for polycrystalline silicon layers and the resulting device Mar. 15, 2005
6852603 Fabrication of abrupt ultra-shallow junctions Feb. 8, 2005
6821870 Heterojunction bipolar transistor and method for fabricating the same Nov. 23, 2004
6808999 Method of making a bipolar transistor having a reduced base transit time Oct. 26, 2004
6797600 Method of forming a local interconnect Sep. 28, 2004
6750091 Diode formation method Jun. 15, 2004
6677207 Vanishingly small integrated circuit diode Jan. 13, 2004
6660571 High voltage power MOSFET having low on-resistance Dec. 9, 2003
6645795 Polysilicon doped transistor using silicon-on-insulator and double silicon-on-insulator Nov. 11, 2003
6642134 Semiconductor processing employing a semiconductor spacer Nov. 4, 2003
6610587 Method of forming a local interconnect Aug. 26, 2003
6607957 Method for fabricating nitride read only memory Aug. 19, 2003
6569715 Large grain single crystal vertical thin film polysilicon mosfets May. 27, 2003
6566212 Method of fabricating an integrated circuit with ultra-shallow source/drain extensions May. 20, 2003
6566208 Method to form elevated source/drain using poly spacer May. 20, 2003
6506655 Bipolar transistor manufacturing method Jan. 14, 2003
6498071 Manufacture of trench-gate semiconductor devices Dec. 24, 2002
6492282 Integrated circuits and manufacturing methods Dec. 10, 2002
6479352 Method of fabricating high voltage power MOSFET having low on-resistance Nov. 12, 2002
6472287 Manufacturing method of semiconductor with a cleansing agent Oct. 29, 2002
6458693 Method of manufacturing a semiconductor device Oct. 1, 2002
6406973 Transistor in a semiconductor device and method of manufacturing the same Jun. 18, 2002
6391752 Method of fabricating a silicon-on-insulator semiconductor device with an implanted ground plane May. 21, 2002
6391689 Method of forming a self-aligned thyristor May. 21, 2002
6372589 Method of forming ultra-shallow source/drain extension by impurity diffusion from doped dielectric spacer Apr. 16, 2002
6372588 Method of making an IGFET using solid phase diffusion to dope the gate, source and drain Apr. 16, 2002
6365493 Method for antimony and boron doping of spherical semiconductors Apr. 2, 2002
6329273 Solid-source doping for source/drain to eliminate implant damage Dec. 11, 2001
6309935 Methods of forming field effect transistors Oct. 30, 2001
6300210 Method of manufacturing a semiconductor device comprising a bipolar transistor Oct. 9, 2001
6294415 Method of fabricating a MOS transistor Sep. 25, 2001
6274445 Method of manufacturing shallow source/drain junctions in a salicide process Aug. 14, 2001
6271068 Method for making improved polysilicon emitters for bipolar transistors on BiCMOS integrated circuits Aug. 7, 2001
6255183 Manufacture of a semiconductor device with a MOS transistor having an LDD structure using SiGe spacers Jul. 3, 2001
6255716 Bipolar junction transistors having base electrode extensions Jul. 3, 2001
6251730 Semiconductor power device manufacture Jun. 26, 2001

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