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Class Information
Number: 438/548
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Diffusing a dopant > Plural dopants simultaneously in plural regions
Description: Processes for permeating multiple electrically active impurities in multiple localized areas.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8703596 Semiconductor device and method of manufacturing semiconductor device Apr. 22, 2014
8502284 Semiconductor device and method of manufacturing semiconductor device Aug. 6, 2013
8492253 Method of forming contacts for a back-contact solar cell Jul. 23, 2013
8471307 In-situ carbon doped e-SiGeCB stack for MOS transistor Jun. 25, 2013
8420517 Methods of forming a multi-doped junction with silicon-containing particles Apr. 16, 2013
8076778 Method for preventing Al-Cu bottom damage using TiN liner Dec. 13, 2011
8053343 Method for forming selective emitter of solar cell and diffusion apparatus for forming the same Nov. 8, 2011
7964485 Method of forming a region of graded doping concentration in a semiconductor device and related apparatus Jun. 21, 2011
7951696 Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processes May. 31, 2011
7943468 Penetrating implant for forming a semiconductor device May. 17, 2011
7910466 Method of manufacturing high-voltage semiconductor device and low-voltage semiconductor device Mar. 22, 2011
7816155 Mounted semiconductor device and a method for making the same Oct. 19, 2010
7790589 Method of providing enhanced breakdown by diluted doping profiles in high-voltage transistors Sep. 7, 2010
7696037 CMOS (complementary metal oxide semiconductor) technology Apr. 13, 2010
7670937 Method for producing doped regions in a substrate, and photovoltaic cell Mar. 2, 2010
7495347 Ion implantation with multiple concentration levels Feb. 24, 2009
7407875 Low resistance contact structure and fabrication thereof Aug. 5, 2008
7384825 Methods of fabricating phase change memory elements having a confined portion of phase change material on a recessed contact Jun. 10, 2008
7371648 Method for manufacturing a transistor device having an improved breakdown voltage and a method for manufacturing an integrated circuit using the same May. 13, 2008
7338876 Method for manufacturing a semiconductor device Mar. 4, 2008
7235436 Method for doping structures in FinFET devices Jun. 26, 2007
7144751 Back-contact solar cells and methods for fabrication Dec. 5, 2006
7115437 Micromachined device having electrically isolated components and a method for making the same Oct. 3, 2006
7109098 Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing Sep. 19, 2006
7045449 Methods of forming semiconductor constructions May. 16, 2006
7005364 Method for manufacturing semiconductor device Feb. 28, 2006
6900113 Method for producing bonded wafer and bonded wafer May. 31, 2005
6897103 MOS integrated circuit with reduced on resistance May. 24, 2005
6887745 Polysilicon thin film transistor and method of forming the same May. 3, 2005
6852563 Process of fabricating electro-optic polymer devices with polymer sustained microelectrodes Feb. 8, 2005
6797597 Process for treating complementary regions of the surface of a substrate and semiconductor product obtained by this process Sep. 28, 2004
6706606 Buried zener diode structure and method of manufacture Mar. 16, 2004
6645820 Polycrystalline silicon diode string for ESD protection of different power supply connections Nov. 11, 2003
6613974 Tandem Si-Ge solar cell with improved conversion efficiency Sep. 2, 2003
6468825 Method for producing semiconductor temperature sensor Oct. 22, 2002
6342418 Semiconductor device and manufacturing method thereof Jan. 29, 2002
6329251 Microelectronic fabrication method employing self-aligned selectively deposited silicon layer Dec. 11, 2001
6303436 Method for fabricating a type of trench mask ROM cell Oct. 16, 2001
6180442 Bipolar transistor with an inhomogeneous emitter in a BICMOS integrated circuit method Jan. 30, 2001
6177298 Electrostatic discharge protection circuit for an integrated circuit and method of manufacturing Jan. 23, 2001
6162711 In-situ boron doped polysilicon with dual layer and dual grain structure for use in integrated circuits manufacturing Dec. 19, 2000
6156594 Fabrication of bipolar/CMOS integrated circuits and of a capacitor Dec. 5, 2000
6117719 Oxide spacers as solid sources for gallium dopant introduction Sep. 12, 2000
6110276 Method for making n-type semiconductor diamond Aug. 29, 2000
6103561 Depletion mode MOS capacitor with patterned V.sub.T implants Aug. 15, 2000
6051488 Methods of forming semiconductor switching devices having trench-gate electrodes Apr. 18, 2000
5933721 Method for fabricating differential threshold voltage transistor pair Aug. 3, 1999
5930616 Methods of forming a field effect transistor and method of forming CMOS circuitry Jul. 27, 1999
5913116 Method of manufacturing an active region of a semiconductor by diffusing a dopant out of a sidewall spacer Jun. 15, 1999
5908305 Electro-optic device Jun. 1, 1999

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