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Class Information
Number: 438/542
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Diffusing a dopant
Description: Processes for permeating an electrically active impurity in a semiconductive region of the substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625812 |
Silicon nano wires, semiconductor device including the same, and method of manufacturing the silicon nano wires |
Dec. 1, 2009 |
| 7615393 |
Methods of forming multi-doped junctions on a substrate |
Nov. 10, 2009 |
| 7611977 |
Process of phosphorus diffusion for manufacturing solar cell |
Nov. 3, 2009 |
| 7608524 |
Method of and system for forming SiC crystals having spatially uniform doping impurities |
Oct. 27, 2009 |
| 7605064 |
Selective laser annealing of semiconductor material |
Oct. 20, 2009 |
| 7605052 |
Method of forming an integrated circuit having a device wafer with a diffused doped backside layer |
Oct. 20, 2009 |
| 7564078 |
Tunable semiconductor component provided with a current barrier |
Jul. 21, 2009 |
| 7557023 |
Implantation of gate regions in semiconductor device fabrication |
Jul. 7, 2009 |
| 7550358 |
MEMS device including a laterally movable portion with piezo-resistive sensing elements and electrostatic actuating elements on trench side walls, and methods for producing the same |
Jun. 23, 2009 |
| 7547618 |
System and method for providing a deep connection to a substrate or buried layer of a semiconductor device |
Jun. 16, 2009 |
| 7524745 |
Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
Apr. 28, 2009 |
| 7514345 |
Electroactive polymers for lithography |
Apr. 7, 2009 |
| 7485555 |
Methods for forming a P-type polysilicon layer in a semiconductor device |
Feb. 3, 2009 |
| 7452785 |
Method of fabrication of highly heat dissipative substrates |
Nov. 18, 2008 |
| 7439159 |
Fusion bonding process and structure for fabricating silicon-on-insulator (SOI) semiconductor devices |
Oct. 21, 2008 |
| 7435514 |
Active mask lithography |
Oct. 14, 2008 |
| 7368356 |
Transistor with doped gate dielectric |
May. 6, 2008 |
| 7338829 |
Semiconductor structures having through-holes sealed with feed through metalization |
Mar. 4, 2008 |
| 7338876 |
Method for manufacturing a semiconductor device |
Mar. 4, 2008 |
| 7262111 |
Method for providing a deep connection to a substrate or buried layer in a semiconductor device |
Aug. 28, 2007 |
| 7247548 |
Doping method and semiconductor device using the same |
Jul. 24, 2007 |
| 7235468 |
FinFET device with reduced DIBL |
Jun. 26, 2007 |
| 7220674 |
Copper alloys for interconnections having improved electromigration characteristics and methods of making same |
May. 22, 2007 |
| 7202164 |
Method of forming ultra thin silicon oxynitride for gate dielectric applications |
Apr. 10, 2007 |
| 7166232 |
Method for producing a solid body including a microstructure |
Jan. 23, 2007 |
| 7122454 |
Method for improving nitrogen profile in plasma nitrided gate dielectric layers |
Oct. 17, 2006 |
| 7118997 |
Implantation of gate regions in semiconductor device fabrication |
Oct. 10, 2006 |
| 7118998 |
Method of forming a conductive structure |
Oct. 10, 2006 |
| 7115437 |
Micromachined device having electrically isolated components and a method for making the same |
Oct. 3, 2006 |
| 7112500 |
Thin film transistor, liquid crystal display and manufacturing method thereof |
Sep. 26, 2006 |
| 7112484 |
Thin film diode integrated with chalcogenide memory cell |
Sep. 26, 2006 |
| 7109087 |
Absorber layer for DSA processing |
Sep. 19, 2006 |
| 7109100 |
Semiconductor device and method for manufacturing semiconductor device |
Sep. 19, 2006 |
| 7078315 |
Method for eliminating inverse narrow width effects in the fabrication of DRAM device |
Jul. 18, 2006 |
| 7078325 |
Process for producing a doped semiconductor substrate |
Jul. 18, 2006 |
| 7037815 |
Method for forming an ultra-shallow junction in a semiconductor substrate using a nuclear stopping layer |
May. 2, 2006 |
| 7037814 |
Single mask control of doping levels |
May. 2, 2006 |
| 7029939 |
P-type semiconductor manufacturing method and semiconductor device |
Apr. 18, 2006 |
| 7026172 |
Reduced thickness variation in a material layer deposited in narrow and wide integrated circuit trenches |
Apr. 11, 2006 |
| 7026230 |
Method for fabricating a memory device |
Apr. 11, 2006 |
| 7008859 |
Wafer and method of producing a substrate by transfer of a layer that includes foreign species |
Mar. 7, 2006 |
| 7005364 |
Method for manufacturing semiconductor device |
Feb. 28, 2006 |
| 6995079 |
Ion implantation method and method for manufacturing semiconductor device |
Feb. 7, 2006 |
| 6987054 |
Method of fabricating a semiconductor device having a groove formed in a resin layer |
Jan. 17, 2006 |
| 6974750 |
Process for forming a trench power MOS device suitable for large diameter wafers |
Dec. 13, 2005 |
| 6946364 |
Integrated circuit having a device wafer with a diffused doped backside layer |
Sep. 20, 2005 |
| 6939604 |
Doped semiconductor nanocrystals |
Sep. 6, 2005 |
| 6936527 |
Low voltage non-volatile memory cell |
Aug. 30, 2005 |
| 6921691 |
Transistor with dopant-bearing metal in source and drain |
Jul. 26, 2005 |
| 6908803 |
Methods for forming wordlines, transistor gates, and conductive interconnects, and wordline, transistor gate, and conductive interconnect structures |
Jun. 21, 2005 |
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