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Class Information
Number: 438/540
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Fusing dopant with substrate (i.e., alloy junction) > Including plural controlled heating or cooling steps or nonuniform heating
Description: Processes including regulated multiple cooling or heating operations, or nonuniform application of thermal energy to the semiconductor substrate during the alloying operation.

Sub-classes under this class:

Class Number Class Name Patents
438/541 Including diffusion after fusing step 26

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8490029 Method of fabricating a device using low temperature anneal processes, a device and design structure Jul. 16, 2013
8470626 Method of fabricating light emitting diode Jun. 25, 2013
8283241 Dopant implanting method and doping apparatus Oct. 9, 2012
8263997 Method for forming ohmic electrode and semiconductor light emitting element Sep. 11, 2012
8236709 Method of fabricating a device using low temperature anneal processes, a device and design structure Aug. 7, 2012
8222132 Fabricating high-K/metal gate devices in a gate last process Jul. 17, 2012
8138105 Rapid thermal processing using energy transfer layers Mar. 20, 2012
8129284 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation Mar. 6, 2012
8080485 Localized temperature control during rapid thermal anneal Dec. 20, 2011
8034700 Method of fabricating a diode Oct. 11, 2011
8014895 Temperature setting method of heat processing plate, temperature setting apparatus of heat processing plate, program, and computer-readable recording medium recording program thereon Sep. 6, 2011
7943468 Penetrating implant for forming a semiconductor device May. 17, 2011
7884017 Thermal methods for cleaning post-CMP wafers Feb. 8, 2011
7754522 Phase change memory structures and methods Jul. 13, 2010
7709400 Thermal methods for cleaning post-CMP wafers May. 4, 2010
7659187 Method of forming PN junctions including a post-ion implant dynamic surface anneal process with minimum interface trap density at the gate insulator-silicon interface Feb. 9, 2010
7582962 Heat dissipation device Sep. 1, 2009
7566643 Liquid phase deposition of contacts in programmable resistance and switching devices Jul. 28, 2009
7521326 Semiconductor device and manufacturing method thereof Apr. 21, 2009
7476605 Method of manufacturing semiconductor device Jan. 13, 2009
7268065 Methods of manufacturing metal-silicide features Sep. 11, 2007
7241672 Method and apparatus for rapid cooldown of annealed wafer Jul. 10, 2007
7235430 Substrates having increased thermal conductivity for semiconductor structures Jun. 26, 2007
7135387 Method of manufacturing semiconductor element Nov. 14, 2006
7022553 Compact system module with built-in thermoelectric cooling Apr. 4, 2006
6946379 Insulative cap for laser fusing Sep. 20, 2005
6900130 Method for locally heating a region in a semiconductor substrate May. 31, 2005
6858887 BJT device configuration and fabrication method with reduced emitter width Feb. 22, 2005
6858508 SOI annealing method Feb. 22, 2005
6809015 Method for heat treatment of silicon wafers and silicon wafer Oct. 26, 2004
6767809 Method of forming ultra shallow junctions Jul. 27, 2004
6734081 Shallow trench isolation structure for laser thermal processing May. 11, 2004
6695903 Dopant pastes for the production of p, p+, and n, n+ regions in semiconductors Feb. 24, 2004
6673704 Semiconductor device and method of manufacturing the same Jan. 6, 2004
6656749 In-situ monitoring during laser thermal annealing Dec. 2, 2003
6582998 Method for fabricating nonvolatile semiconductor memory device Jun. 24, 2003
6573159 Method for thermally annealing silicon wafer and silicon wafer Jun. 3, 2003
6500741 Method for making high voltage device Dec. 31, 2002
6479885 High voltage device and method Nov. 12, 2002
6376346 High voltage device and method for making the same Apr. 23, 2002
6268270 Lot-to-lot rapid thermal processing (RTP) chamber preheat optimization Jul. 31, 2001
6159812 Reduced boron diffusion by use of a pre-anneal Dec. 12, 2000
5976921 Method for manufacturing electrostatic discharge protection (ESD) and BiCMOS Nov. 2, 1999
5834343 Method of manufacturing thin film transistor Nov. 10, 1998
5773337 Method for forming ultra-shallow junction of semiconductor device Jun. 30, 1998
5760453 Moisture barrier layers for integrated circuit applications Jun. 2, 1998
5733801 Method of making a semiconductor device with alignment marks Mar. 31, 1998
5525541 Method of making an electronic and/or photonic component Jun. 11, 1996
5447871 Electrically conductive interconnection through a body of semiconductor material Sep. 5, 1995
5223453 Controlled metal-semiconductor sintering/alloying by one-directional reverse illumination Jun. 29, 1993

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