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Class Information
Number: 438/535
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > By application of corpuscular or electromagnetic radiation (e.g., electron, laser, etc.)
Description: Process having a step of applying corpuscular or electromagnetic radiation to the semiconductor substrate to affect the incorporation of an electrically active dopant therein.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8703582 |
Laser processing method |
Apr. 22, 2014 |
| 8673755 |
Semiconductor device having metal gate and manufacturing method thereof |
Mar. 18, 2014 |
| 8669155 |
Hybrid channel semiconductor device and method for forming the same |
Mar. 11, 2014 |
| 8652893 |
Semiconductor device and manufacturing method thereof |
Feb. 18, 2014 |
| 8623694 |
Methods of forming fast ion conductors and memory devices comprising diffused metal ions |
Jan. 7, 2014 |
| 8604584 |
Semiconductor device and method of manufacturing semiconductor device |
Dec. 10, 2013 |
| 8603902 |
Engineering flat surfaces on materials doped via pulsed laser irradiation |
Dec. 10, 2013 |
| 8598050 |
Laser annealing method and apparatus |
Dec. 3, 2013 |
| 8586460 |
Controlling laser annealed junction depth by implant modification |
Nov. 19, 2013 |
| 8580646 |
Method of fabricating field effect transistors with low k sidewall spacers |
Nov. 12, 2013 |
| 8530979 |
Semiconductor package and method for manufacturing the same |
Sep. 10, 2013 |
| 8481393 |
Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device |
Jul. 9, 2013 |
| 8435872 |
Method and apparatus for manufacturing semiconductor device |
May. 7, 2013 |
| 8372762 |
Manufacturing method of semiconductor device and laser processing apparatus |
Feb. 12, 2013 |
| 8309444 |
System and method of dosage profile control |
Nov. 13, 2012 |
| 8288292 |
Depositing conformal boron nitride film by CVD without plasma |
Oct. 16, 2012 |
| 8278739 |
Crystalline semiconductor film, semiconductor device, and method for manufacturing thereof |
Oct. 2, 2012 |
| 8173473 |
Laser system for processing solar wafers in a carrier |
May. 8, 2012 |
| 8148636 |
Electric device |
Apr. 3, 2012 |
| 8138071 |
Isotopically-enriched boron-containing compounds, and methods of making and using same |
Mar. 20, 2012 |
| 8114693 |
Method of fabricating solid state gas dissociating device by laser doping |
Feb. 14, 2012 |
| 8108159 |
Method of detecting degradation of semiconductor devices and method of detecting degradation of integrated circuits |
Jan. 31, 2012 |
| 8084331 |
Method of treating semiconductor element |
Dec. 27, 2011 |
| 8080467 |
Silicon-based visible and near-infrared optoelectric devices |
Dec. 20, 2011 |
| 8076226 |
Apparatus for annealing, method for annealing, and method for manufacturing a semiconductor device |
Dec. 13, 2011 |
| 8067303 |
Solid state energy conversion device |
Nov. 29, 2011 |
| 8062965 |
Isotopically-enriched boron-containing compounds, and methods of making and using same |
Nov. 22, 2011 |
| 8040604 |
Imaging system and method for providing extended depth of focus, range extraction and super resolved imaging |
Oct. 18, 2011 |
| 8030192 |
Process for manufacturing a large-scale integration MOS device and corresponding MOS device |
Oct. 4, 2011 |
| 8017528 |
Impurity-activating thermal process method and thermal process apparatus |
Sep. 13, 2011 |
| 7994031 |
Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions |
Aug. 9, 2011 |
| 7989333 |
Methods of forming integrated circuit devices having anisotropically-oxidized nitride layers |
Aug. 2, 2011 |
| 7981816 |
Impurity-activating thermal process method and thermal process apparatus |
Jul. 19, 2011 |
| 7955938 |
Wiring technique |
Jun. 7, 2011 |
| 7947584 |
Suitably short wavelength light for laser annealing of silicon in DSA type systems |
May. 24, 2011 |
| 7935946 |
Ion implantation method and apparatus |
May. 3, 2011 |
| 7935945 |
Ion implantation method and apparatus |
May. 3, 2011 |
| 7915153 |
Passivation film and method of forming the same |
Mar. 29, 2011 |
| 7906405 |
Polysilicon structures resistant to laser anneal lightpipe waveguide effects |
Mar. 15, 2011 |
| 7888251 |
Photo-assisted hydrogenation process |
Feb. 15, 2011 |
| 7867868 |
Absorber layer candidates and techniques for application |
Jan. 11, 2011 |
| 7851318 |
Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device |
Dec. 14, 2010 |
| 7846803 |
Multiple millisecond anneals for semiconductor device fabrication |
Dec. 7, 2010 |
| 7846804 |
Method for fabricating high tensile stress film |
Dec. 7, 2010 |
| 7838402 |
Method of manufacturing electronic apparatus and electronic apparatus |
Nov. 23, 2010 |
| 7829446 |
Method for dividing wafer, method for manufacturing silicon devices, and method for manufacturing liquid ejecting heads |
Nov. 9, 2010 |
| 7811914 |
Apparatus and method for increasing thermal conductivity of a substrate |
Oct. 12, 2010 |
| 7799666 |
Method of spatially selective laser-assisted doping of a semiconductor |
Sep. 21, 2010 |
| 7745297 |
Method of substrate with transparent electrodes and devices incorporating it |
Jun. 29, 2010 |
| 7732311 |
Methods of manufacturing semiconductor devices |
Jun. 8, 2010 |
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