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Class Information
Number: 438/531
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region > Using shadow mask
Description: Process involving the use of a spaced templet positioned with respect to the ion source and the semiconductor substrate in such a manner as to allow the electrically active dopant ions to impinge only a portion of the semiconductor substrate.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618867 |
Method of forming a doped portion of a semiconductor and method of forming a transistor |
Nov. 17, 2009 |
| 7598161 |
Method of forming transistor devices with different threshold voltages using halo implant shadowing |
Oct. 6, 2009 |
| 7579232 |
Method of making a nonvolatile memory device including forming a pillar shaped semiconductor device and a shadow mask |
Aug. 25, 2009 |
| 7573052 |
Exposure apparatus, exposure method, and device manufacturing method |
Aug. 11, 2009 |
| 7550355 |
Low-leakage transistor and manufacturing method thereof |
Jun. 23, 2009 |
| 7541266 |
Covert transformation of transistor properties as a circuit protection method |
Jun. 2, 2009 |
| 7535104 |
Structure and method for bond pads of copper-metallized integrated circuits |
May. 19, 2009 |
| 7491586 |
Semiconductor device with leakage implant and method of fabrication |
Feb. 17, 2009 |
| 7488653 |
Semiconductor device and method for implantation of doping agents in a channel |
Feb. 10, 2009 |
| 7432179 |
Controlling gate formation by removing dummy gate structures |
Oct. 7, 2008 |
| 7381607 |
Method of forming a spiral inductor in a semiconductor substrate |
Jun. 3, 2008 |
| 7375012 |
Method of forming multilayer film |
May. 20, 2008 |
| 7314803 |
Method for producing a semiconductor structure |
Jan. 1, 2008 |
| 7297581 |
SRAM formation using shadow implantation |
Nov. 20, 2007 |
| 7268065 |
Methods of manufacturing metal-silicide features |
Sep. 11, 2007 |
| 7264850 |
Process for treating a substrate with a plasma |
Sep. 4, 2007 |
| 7250331 |
Mask for crystallizing and method of crystallizing amorphous silicon using the same |
Jul. 31, 2007 |
| 7244655 |
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film |
Jul. 17, 2007 |
| 7217656 |
Structure and method for bond pads of copper-metallized integrated circuits |
May. 15, 2007 |
| 7189623 |
Semiconductor processing method and field effect transistor |
Mar. 13, 2007 |
| 7125777 |
Asymmetric hetero-doped high-voltage MOSFET (AH.sup.2MOS) |
Oct. 24, 2006 |
| 7122453 |
Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools |
Oct. 17, 2006 |
| 7101739 |
Method for forming a schottky diode on a silicon carbide substrate |
Sep. 5, 2006 |
| 7064048 |
Method of forming a semi-insulating region |
Jun. 20, 2006 |
| 6998319 |
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film |
Feb. 14, 2006 |
| 6967147 |
Nitrogen implantation using a shadow effect to control gate oxide thickness in DRAM semiconductor |
Nov. 22, 2005 |
| 6955726 |
Mask and mask frame assembly for evaporation |
Oct. 18, 2005 |
| 6949389 |
Encapsulation for organic light emitting diodes devices |
Sep. 27, 2005 |
| 6913979 |
Method of manufacturing a metal oxide semiconductor transistor |
Jul. 5, 2005 |
| 6884703 |
Manufacturing of a low-noise mos device |
Apr. 26, 2005 |
| 6884632 |
Ion beam definition of magnetoresistive field sensors |
Apr. 26, 2005 |
| 6852610 |
Semiconductor device and method for manufacturing the same |
Feb. 8, 2005 |
| 6828202 |
Semiconductor region self-aligned with ion implant shadowing |
Dec. 7, 2004 |
| 6815317 |
Method to perform deep implants without scattering to adjacent areas |
Nov. 9, 2004 |
| 6815318 |
Manufacturing method of semiconductor device |
Nov. 9, 2004 |
| 6797596 |
Sacrificial deposition layer as screening material for implants into a wafer during the manufacture of a semiconductor device |
Sep. 28, 2004 |
| 6787406 |
Systems and methods for forming dense n-channel and p-channel fins using shadow implanting |
Sep. 7, 2004 |
| 6780781 |
Method for manufacturing an electronic device |
Aug. 24, 2004 |
| 6774006 |
Microelectronic device fabricating method, and method of forming a pair of field effect transistor gate lines of different base widths from a common deposited conductive layer |
Aug. 10, 2004 |
| 6716729 |
Stable bisphenolic compositions |
Apr. 6, 2004 |
| 6703266 |
Method for fabricating thin film transistor array and driving circuit |
Mar. 9, 2004 |
| 6699775 |
Manufacturing process for fast recovery diode |
Mar. 2, 2004 |
| 6670681 |
Semiconductor structures |
Dec. 30, 2003 |
| 6624030 |
Method of fabricating power rectifier device having a laterally graded P-N junction for a channel region |
Sep. 23, 2003 |
| 6552259 |
Solar cell with bypass function and multi-junction stacked type solar cell with bypass function, and method for manufacturing these devices |
Apr. 22, 2003 |
| 6548359 |
Asymmetrical devices for short gate length performance with disposable sidewall |
Apr. 15, 2003 |
| 6524936 |
Process for removal of photoresist after post ion implantation |
Feb. 25, 2003 |
| 6458430 |
Pretreatment process for plasma immersion ion implantation |
Oct. 1, 2002 |
| 6458666 |
Spot-implant method for MOS transistor applications |
Oct. 1, 2002 |
| 6440812 |
Angled implant to improve high current operation of bipolar transistors |
Aug. 27, 2002 |
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