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Class Information
Number: 438/529
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region > Including multiple implantation steps > Using same conductivity-type dopant
Description: Process wherein the multiple implantation steps introduce electrically active dopant ions of the same conductivity type into one or more regions of the semiconductor substrate.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8461032 |
Use of dopants with different diffusivities for solar cell manufacture |
Jun. 11, 2013 |
| 8431455 |
Method of improving memory cell device by ion implantation |
Apr. 30, 2013 |
| 8399309 |
Semiconductor device manufacturing method |
Mar. 19, 2013 |
| 8343863 |
N-type carrier enhancement in semiconductors |
Jan. 1, 2013 |
| 8328936 |
Producing a diamond semiconductor by implanting dopant using ion implantation |
Dec. 11, 2012 |
| 8329568 |
Semiconductor device and method for making the same |
Dec. 11, 2012 |
| 8309445 |
Bi-directional self-aligned FET capacitor |
Nov. 13, 2012 |
| 8298875 |
Method for fabrication of a semiconductor device and structure |
Oct. 30, 2012 |
| 8227329 |
Semiconductor device and method for manufacturing the same |
Jul. 24, 2012 |
| 8211784 |
Method for manufacturing a semiconductor device with less leakage current induced by carbon implant |
Jul. 3, 2012 |
| 8187959 |
Semiconductor substrate with solid phase epitaxial regrowth with reduced junction leakage and method of producing same |
May. 29, 2012 |
| 8178412 |
Semiconductor memory device and method of manufacturing the same |
May. 15, 2012 |
| 8105926 |
Method for producing a semiconductor device by plasma doping a semiconductor region to form an impurity region |
Jan. 31, 2012 |
| 8084341 |
Semiconductor device and method for manufacturing the same |
Dec. 27, 2011 |
| 8003501 |
Method of doping P-type impurity ions in dual poly gate and method of forming dual poly gate using the same |
Aug. 23, 2011 |
| 7981747 |
Semiconductor device and a method of manufacturing the same |
Jul. 19, 2011 |
| 7972947 |
Method for fabricating a semiconductor element, and semiconductor element |
Jul. 5, 2011 |
| 7968401 |
Reducing photoresist layer degradation in plasma immersion ion implantation |
Jun. 28, 2011 |
| 7943459 |
Semiconductor device and method of manufacturing the semiconductor device |
May. 17, 2011 |
| 7939440 |
Junction leakage suppression in memory devices |
May. 10, 2011 |
| 7927954 |
Method for fabricating strained-silicon metal-oxide semiconductor transistors |
Apr. 19, 2011 |
| 7867884 |
Sample wafer fabrication method |
Jan. 11, 2011 |
| 7868387 |
Low leakage protection device |
Jan. 11, 2011 |
| 7863147 |
Semiconductor device and fabrication method thereof |
Jan. 4, 2011 |
| 7825441 |
Junction field effect transistor with a hyperabrupt junction |
Nov. 2, 2010 |
| 7825016 |
Method of producing a semiconductor element |
Nov. 2, 2010 |
| 7790586 |
Plasma doping method |
Sep. 7, 2010 |
| 7781289 |
Method for fabricating higher quality thicker gate oxide in a non-volatile memory cell and associated circuits |
Aug. 24, 2010 |
| 7776726 |
Semiconductor devices and methods of manufacture thereof |
Aug. 17, 2010 |
| 7759208 |
Low temperature ion implantation for improved silicide contacts |
Jul. 20, 2010 |
| 7749874 |
Deep implant self-aligned to polysilicon gate |
Jul. 6, 2010 |
| 7749798 |
Optimized photodiode process for improved transfer gate leakage |
Jul. 6, 2010 |
| 7704822 |
Semiconductor device |
Apr. 27, 2010 |
| 7700468 |
Semiconductor device and method of fabricating the same |
Apr. 20, 2010 |
| 7696053 |
Implantation method for doping semiconductor substrate |
Apr. 13, 2010 |
| 7678674 |
Memory cell dual pocket implant |
Mar. 16, 2010 |
| 7662690 |
Method of preparing a semiconductor substrate utilizing plural implants under an isolation region to isolate adjacent wells |
Feb. 16, 2010 |
| 7659188 |
Semiconductor device and method for manufacturing the same |
Feb. 9, 2010 |
| 7625774 |
Method of manufacturing CMOS image sensor |
Dec. 1, 2009 |
| 7598162 |
Method of manufacturing semiconductor device |
Oct. 6, 2009 |
| 7589366 |
Solid-state imaging device and method for manufacturing the same |
Sep. 15, 2009 |
| 7585737 |
Method of manufacturing double diffused drains in semiconductor devices |
Sep. 8, 2009 |
| 7550355 |
Low-leakage transistor and manufacturing method thereof |
Jun. 23, 2009 |
| 7541247 |
Guard ring structures for high voltage CMOS/low voltage CMOS technology using LDMOS (lateral double-diffused metal oxide semiconductor) device fabrication |
Jun. 2, 2009 |
| 7521343 |
Method of manufacturing semiconductor device |
Apr. 21, 2009 |
| 7491586 |
Semiconductor device with leakage implant and method of fabrication |
Feb. 17, 2009 |
| 7485536 |
Abrupt junction formation by atomic layer epitaxy of in situ delta doped dopant diffusion barriers |
Feb. 3, 2009 |
| 7473606 |
Method for fabricating metal-oxide semiconductor transistors |
Jan. 6, 2009 |
| 7432121 |
Isolation process and structure for CMOS imagers |
Oct. 7, 2008 |
| 7358167 |
Implantation process in semiconductor fabrication |
Apr. 15, 2008 |
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