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Class Information
Number: 438/528
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region > Including multiple implantation steps > Providing nondopant ion (e.g., proton, etc.)
Description: Process wherein a nonelectrically active impurity species is implanted into a semiconductor region of the substrate in conjunction with the prior, simultaneous, or subsequent implantation of an electrically active dopant species.










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
7157357 Methods of forming halo regions in NMOS transistors Jan. 2, 2007
7151007 Doped organic semiconductor materials and process for their preparation Dec. 19, 2006
7144825 Multi-layer dielectric containing diffusion barrier material Dec. 5, 2006
7129138 Methods of implementing and enhanced silicon-on-insulator (SOI) box structures Oct. 31, 2006
7122452 Method of manufacturing a semiconductor on a silicon on insulator (SOI) substrate using solid epitaxial regrowth (SPER) and semiconductor device made thereby Oct. 17, 2006
7118997 Implantation of gate regions in semiconductor device fabrication Oct. 10, 2006
7118996 Apparatus and method for doping Oct. 10, 2006
7118979 Method of manufacturing transistor having germanium implant region on the sidewalls of the polysilicon gate electrode Oct. 10, 2006
7115463 Patterning SOI with silicon mask to create box at different depths Oct. 3, 2006
7112482 Method of forming a field effect transistor Sep. 26, 2006
7105412 Silicide process utilizing pre-amorphization implant and second spacer Sep. 12, 2006
7105426 Method of forming a semi-insulating region Sep. 12, 2006
7101764 High-voltage transistor and fabrication process Sep. 5, 2006
7094663 Semiconductor device and method of manufacturing the same Aug. 22, 2006
7091115 Method for doping a semiconductor body Aug. 15, 2006
7087507 Implantation of deuterium in MOS and DRAM devices Aug. 8, 2006
7084051 Manufacturing method for semiconductor substrate and manufacturing method for semiconductor device Aug. 1, 2006
7071067 Fabrication of integrated devices using nitrogen implantation Jul. 4, 2006
7067410 Method of forming a metal silicide Jun. 27, 2006
7060558 Method for fabricating a field-effect transistor having a floating gate Jun. 13, 2006
7041575 Localized strained semiconductor on insulator May. 9, 2006
7041581 Method and structure for improving latch-up immunity using non-dopant implants May. 9, 2006
7037806 Method of fabricating silicon-on-insulator semiconductor substrate using rare earth oxide or rare earth nitride May. 2, 2006
7012005 Self-aligned differential oxidation in trenches by ion implantation Mar. 14, 2006
7005334 Zero threshold voltage pFET and method of making same Feb. 28, 2006
7005362 Method of fabricating a thin film transistor Feb. 28, 2006
7005363 Method of forming a semi-insulating region Feb. 28, 2006
6989319 Methods for forming nitrogen-rich regions in non-volatile semiconductor memory devices Jan. 24, 2006
6949399 Method of reducing contamination-induced process variations during ion implantation Sep. 27, 2005
6946354 Substrate and manufacturing method therefor Sep. 20, 2005
6943098 Method of forming semiconductor device with non-conformal liner layer that is thinner on sidewall surfaces Sep. 13, 2005
6936526 Method of disordering quantum well heterostructures Aug. 30, 2005
6927148 Ion implantation method and method for manufacturing SOI wafer Aug. 9, 2005
6927137 Forming a retrograde well in a transistor to enhance performance of the transistor Aug. 9, 2005
6924217 Method of forming trench in semiconductor device Aug. 2, 2005
6916693 Semiconductor device and manufacturing method thereof Jul. 12, 2005
6900099 Flash memory cell and method for fabricating the same May. 31, 2005
6900091 Isolated complementary MOS devices in epi-less substrate May. 31, 2005
6893931 Reducing extrinsic base resistance in an NPN transistor May. 17, 2005
6891232 Semiconductor device having an injection substance to knock against oxygen and manufacturing method of the same May. 10, 2005
6884632 Ion beam definition of magnetoresistive field sensors Apr. 26, 2005
6872642 Manufacturing method of semiconductor device Mar. 29, 2005
6861320 Method of making starting material for chip fabrication comprising a buried silicon nitride layer Mar. 1, 2005
6849883 Strained SOI MOSFET device and method of fabricating same Feb. 1, 2005
6849527 Strained silicon MOSFET having improved carrier mobility, strained silicon CMOS device, and methods of their formation Feb. 1, 2005
6846718 Method for producing SOI wafer and SOI wafer Jan. 25, 2005
6838363 Circuit element having a metal silicide region thermally stabilized by a barrier diffusion material Jan. 4, 2005
6818529 Apparatus and method for forming a silicon film across the surface of a glass substrate Nov. 16, 2004
6815295 Method of manufacturing field effect transistors Nov. 9, 2004
6812114 Patterned SOI by formation and annihilation of buried oxide regions during processing Nov. 2, 2004

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