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Class Information
Number: 438/524
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region > Into grooved semiconductor substrate region
Description: Process wherein the electrically active dopant is implanted into a trench or recess formed in a semiconductor region of the substrate.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8691640 Methods of forming dielectrically isolated fins for a FinFET semiconductor by performing an etching process wherein the etch rate is modified via inclusion of a dopant material Apr. 8, 2014
8679928 Methods for stressing transistor channels of a semiconductor device structure Mar. 25, 2014
8647945 Method of forming substrate contact for semiconductor on insulator (SOI) substrate Feb. 11, 2014
8642427 Semiconductor device and method for fabricating the same Feb. 4, 2014
8598023 Substrate processing apparatus, substrate processing method, and method of manufacturing semiconductor device Dec. 3, 2013
8563381 Method for manufacturing a power semiconductor device Oct. 22, 2013
8557662 Method for fabricating side contact in semiconductor device using double trench process Oct. 15, 2013
8501602 Method of manufacturing devices having vertical junction edge Aug. 6, 2013
8492221 Method for fabricating power semiconductor device with super junction structure Jul. 23, 2013
8486782 Flash memory devices and methods for fabricating the same Jul. 16, 2013
8470657 Ion implantation method for semiconductor sidewalls Jun. 25, 2013
8466017 Methods of making semiconductor devices having implanted sidewalls and devices made thereby Jun. 18, 2013
8455339 Method for fabricating semiconductor device with side junction Jun. 4, 2013
8450194 Method to modify the shape of a cavity using angled implantation May. 28, 2013
8420495 Manufacturing approach for collector and a buried layer of bipolar transistor Apr. 16, 2013
8404546 Source/drain carbon implant and RTA anneal, pre-SiGe deposition Mar. 26, 2013
8394702 Method for making dual gate oxide trench MOSFET with channel stop using three or four masks process Mar. 12, 2013
8394720 Plasma processing method and resist pattern modifying method Mar. 12, 2013
8394689 Semiconductor memory device with stacked gate including charge storage layer and control gate and method of manufacturing the same Mar. 12, 2013
8329566 Method of manufacturing a high-performance semiconductor device Dec. 11, 2012
8318558 Semiconductor device and method for forming the same Nov. 27, 2012
8304314 Method of forming an MOS transistor Nov. 6, 2012
8293611 Implantation processes for straining transistor channels of semiconductor device structures and semiconductor devices with strained transistor channels Oct. 23, 2012
8258032 Power semiconductor devices and methods for manufacturing the same Sep. 4, 2012
8236648 Trench MOS transistor and method of manufacturing the same Aug. 7, 2012
8216925 Transistor structure having a trench drain Jul. 10, 2012
8202790 Semiconductor device and method of manufacturing the same Jun. 19, 2012
8173517 Method for forming a self-aligned isolation structure utilizing sidewall spacers as an etch mask and remaining as a portion of the isolation structure May. 8, 2012
8168494 Trench MOS transistor and method of manufacturing the same May. 1, 2012
8168501 Source/drain strained layers May. 1, 2012
8133781 Method of forming a buried plate by ion implantation Mar. 13, 2012
8124507 Semiconductor device and method for fabricating the same Feb. 28, 2012
8114743 Integrated circuit device with a semiconductor body and method for the production of an integrated circuit device Feb. 14, 2012
8084340 Method of manufacturing semiconductor device and semiconductor device Dec. 27, 2011
8080472 Metal line having a Mo.sub.xSi.sub.y/Mo diffusion barrier of semiconductor device and method for forming the same Dec. 20, 2011
8017482 Method of manufacturing semiconductor device Sep. 13, 2011
8008153 Methods of fabricating nonvolatile memory devices having gate structures doped by nitrogen Aug. 30, 2011
7999312 Insulated gate-type semiconductor device having a low concentration diffusion region Aug. 16, 2011
7981747 Semiconductor device and a method of manufacturing the same Jul. 19, 2011
7981781 Metal line of semiconductor device having a diffusion barrier and method for forming the same Jul. 19, 2011
7927989 Method for forming a transistor having gate dielectric protection and structure Apr. 19, 2011
7929321 Depletion mode trench MOSFET for improved efficiency of DC/DC converter applications Apr. 19, 2011
7863144 Semiconductor device and method for manufacturing the device Jan. 4, 2011
7851291 Epitaxial silicon germanium for reduced contact resistance in field-effect transistors Dec. 14, 2010
7839693 Method of fabricating CMOS-compatible non-volatile memory cell with lateral inter-poly programming layer Nov. 23, 2010
7829446 Method for dividing wafer, method for manufacturing silicon devices, and method for manufacturing liquid ejecting heads Nov. 9, 2010
7824982 DRAM arrays, vertical transistor structures, and methods of forming transistor structures and DRAM arrays Nov. 2, 2010
7803701 Method for fabricating a semiconductor device Sep. 28, 2010
7759174 Method of manufacturing a semiconductor device Jul. 20, 2010
7749860 Method for forming a self-aligned T-shaped isolation trench Jul. 6, 2010

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