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Class Information
Number: 438/519
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region > Of compound semiconductor > Including multiple implantation steps
Description: Process having plural steps of implanting ions, at least one step of which introduces an electrically active dopant ion, into a compound semiconductive substrate.










Sub-classes under this class:

Class Number Class Name Patents
438/520 Providing nondopant ion (e.g., proton, etc.) 156
438/521 Using same conductivity-type dopant 45


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8703522 Methods of forming a stratified photodiode for high resolution CMOS image sensor implemented with STI technology Apr. 22, 2014
8679959 High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation Mar. 25, 2014
8652954 Method for manufacturing silicon carbide semiconductor device Feb. 18, 2014
8633080 Methods of making multi-state non-volatile memory cells Jan. 21, 2014
8530313 Method of manufacturing trench MOSFET structures using three masks process Sep. 10, 2013
8492250 Method for fabricating semiconductor device Jul. 23, 2013
8487280 Modulating implantation for improved workpiece splitting Jul. 16, 2013
8476133 Method of manufacture and structure for a trench transistor having a heavy body region Jul. 2, 2013
8460977 Mesa termination structures for power semiconductor devices and methods of forming power semiconductor devices with mesa termination structures Jun. 11, 2013
8461028 Synthesizing graphene from metal-carbon solutions using ion implantation Jun. 11, 2013
8409975 Method for decreasing polysilicon gate resistance in a carbon co-implantation process Apr. 2, 2013
8377807 Method for minimizing defects in a semiconductor substrate due to ion implantation Feb. 19, 2013
8372709 Semiconductor device and method of manufacturing the same Feb. 12, 2013
8343815 TFET with nanowire source Jan. 1, 2013
8318571 Method for forming P-type lightly doped drain region using germanium pre-amorphous treatment Nov. 27, 2012
8298889 Process of forming an electronic device including a trench and a conductive structure therein Oct. 30, 2012
8293629 High full-well capacity pixel with graded photodetector implant Oct. 23, 2012
8288255 N-type doping of zinc telluride Oct. 16, 2012
8278197 Method to tailor location of peak electric field directly underneath an extension spacer for enhanced programmability of a prompt-shift device Oct. 2, 2012
8278711 Semiconductor device and method of making the same Oct. 2, 2012
8258052 Method of manufacturing silicon carbide semiconductor device Sep. 4, 2012
8247286 Semiconductor device having transistor and method of manufacturing the same Aug. 21, 2012
8242005 Using multiple masks to form independent features on a workpiece Aug. 14, 2012
8232162 Forming implanted plates for high aspect ratio trenches using staged sacrificial layer removal Jul. 31, 2012
8216923 Integrated shadow mask/carrier for patterned ion implantation Jul. 10, 2012
8202789 Implanting a solar cell substrate using a mask Jun. 19, 2012
8198659 Semiconductor device and method for fabricating the same Jun. 12, 2012
8187957 Field-effect transistor and method for fabricating the same May. 29, 2012
8178932 Semiconductor device having transistors May. 15, 2012
8163636 Method of preparing P-type doped ZnO or ZnMgO Apr. 24, 2012
8097518 Semiconductor device and manufacturing method therefor Jan. 17, 2012
8012843 Optimized halo or pocket cold implants Sep. 6, 2011
7994040 Semiconductor device and fabrication thereof Aug. 9, 2011
7972948 Method for forming bit lines for semiconductor devices Jul. 5, 2011
7883999 Method for increasing the penetration depth of material infusion in a substrate using a gas cluster ion beam Feb. 8, 2011
7811915 Method for forming bit lines for semiconductor devices Oct. 12, 2010
7767583 Method to improve uniformity of chemical mechanical polishing planarization Aug. 3, 2010
7759148 Method for manufacturing semiconductor optical device Jul. 20, 2010
7759260 Selective nitridation of gate oxides Jul. 20, 2010
7749798 Optimized photodiode process for improved transfer gate leakage Jul. 6, 2010
7745276 Method for manufacturing SiC semiconductor device Jun. 29, 2010
7700450 Method for forming MOS transistor Apr. 20, 2010
7696073 Method of co-doping group 14 (4B) elements to produce ZnTe system compound semiconductor single crystal Apr. 13, 2010
7682955 Method for forming deep well of power device Mar. 23, 2010
7671425 Semiconductor device and method of manufacturing the same Mar. 2, 2010
7655526 Method for manufacturing semiconductor device Feb. 2, 2010
7585739 Semiconductor device and method of fabricating the same Sep. 8, 2009
7572716 Semiconductor doping with improved activation Aug. 11, 2009
7557021 Highly doped gate electrode made by rapidly melting and resolidifying the gate electrode Jul. 7, 2009
7410860 Method of manufacturing lateral MOSFET structure of an integrated circuit having separated device regions Aug. 12, 2008

1 2 3 4










 
 
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