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Class Information
Number: 438/514
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region
Description: Process involving penetration of the surface of the semiconductive regions of the substrate with electrically active dopant species possessing sufficient kinetic energy therefor, usually resulting in the formation of a barrier layer rectifying junction within the semiconductive regions.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618873 |
MOS varactors with large tuning range |
Nov. 17, 2009 |
| 7615473 |
Method of introducing ion and method of manufacturing semiconductor device |
Nov. 10, 2009 |
| 7605052 |
Method of forming an integrated circuit having a device wafer with a diffused doped backside layer |
Oct. 20, 2009 |
| 7601619 |
Method and apparatus for plasma processing |
Oct. 13, 2009 |
| 7598161 |
Method of forming transistor devices with different threshold voltages using halo implant shadowing |
Oct. 6, 2009 |
| 7595261 |
Method and system for manufacturing semiconductor device having less variation in electrical characteristics |
Sep. 29, 2009 |
| 7592242 |
Apparatus and method for controlling diffusion |
Sep. 22, 2009 |
| 7592241 |
Semiconductor device having well with peak impurity concentrations and method for fabricating the same |
Sep. 22, 2009 |
| 7588986 |
Method of manufacturing a semiconductor device |
Sep. 15, 2009 |
| 7589333 |
Methods for rapidly switching off an ion beam |
Sep. 15, 2009 |
| 7588991 |
Method for fabricating embedded static random access memory |
Sep. 15, 2009 |
| 7582492 |
Method of doping impurities, and electronic element using the same |
Sep. 1, 2009 |
| 7579226 |
Thin layer element and associated fabrication process |
Aug. 25, 2009 |
| 7579228 |
Disposable organic spacers |
Aug. 25, 2009 |
| 7572660 |
Electrical through-plating of semiconductor chips |
Aug. 11, 2009 |
| 7572693 |
Methods for transistor formation using selective gate implantation |
Aug. 11, 2009 |
| 7572714 |
Film taking-off method |
Aug. 11, 2009 |
| 7569463 |
Method of thermal processing structures formed on a substrate |
Aug. 4, 2009 |
| 7569464 |
Method for manufacturing a semiconductor device having improved across chip implant uniformity |
Aug. 4, 2009 |
| 7566605 |
Epitaxial silicon germanium for reduced contact resistance in field-effect transistors |
Jul. 28, 2009 |
| 7566951 |
Silicon structures with improved resistance to radiation events |
Jul. 28, 2009 |
| 7557008 |
Method of making a non-volatile memory device |
Jul. 7, 2009 |
| 7557022 |
Implantation of carbon and/or fluorine in NMOS fabrication |
Jul. 7, 2009 |
| 7550336 |
Method for fabricating an NMOS transistor |
Jun. 23, 2009 |
| 7550369 |
Method for fabricating low-defect-density changed orientation Si |
Jun. 23, 2009 |
| 7550371 |
Method of producing SIMOX wafer |
Jun. 23, 2009 |
| 7547618 |
System and method for providing a deep connection to a substrate or buried layer of a semiconductor device |
Jun. 16, 2009 |
| 7538003 |
Method for fabricating MOS transistor |
May. 26, 2009 |
| 7531435 |
Semiconductor device and manufacturing method of the same |
May. 12, 2009 |
| 7524743 |
Conformal doping apparatus and method |
Apr. 28, 2009 |
| 7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same |
Apr. 21, 2009 |
| 7517777 |
Method of manufacturing semiconductor device and semiconductor device formed by the method |
Apr. 14, 2009 |
| 7518124 |
Monatomic dopant ion source and method |
Apr. 14, 2009 |
| 7514343 |
Method for manufacturing SIMOX wafer and SIMOX wafer |
Apr. 7, 2009 |
| 7511288 |
Ion implantation device |
Mar. 31, 2009 |
| 7507646 |
Semiconductor devices and method of manufacturing them |
Mar. 24, 2009 |
| 7504326 |
Use of scanning theme implanters and annealers for selective implantation and annealing |
Mar. 17, 2009 |
| 7498245 |
Embrittled substrate and method for making same |
Mar. 3, 2009 |
| 7494905 |
Method for preparing a source material including forming a paste for ion implantation |
Feb. 24, 2009 |
| 7491631 |
Method of doping a gate electrode of a field effect transistor |
Feb. 17, 2009 |
| 7488672 |
Well photoresist pattern of semiconductor device and method for forming the same |
Feb. 10, 2009 |
| 7488690 |
Silicon nitride film with stress control |
Feb. 10, 2009 |
| 7485551 |
Semiconductor-on-insulator type heterostructure and method of fabrication |
Feb. 3, 2009 |
| 7482267 |
Ion implantation of spin on glass materials |
Jan. 27, 2009 |
| 7476593 |
Semiconductor device and method of forming the same |
Jan. 13, 2009 |
| 7473606 |
Method for fabricating metal-oxide semiconductor transistors |
Jan. 6, 2009 |
| 7456085 |
Method for introducing impurities |
Nov. 25, 2008 |
| 7432121 |
Isolation process and structure for CMOS imagers |
Oct. 7, 2008 |
| 7432141 |
Large-grain p-doped polysilicon films for use in thin film transistors |
Oct. 7, 2008 |
| 7427518 |
Semiconductor device fabrication method and fabrication apparatus |
Sep. 23, 2008 |
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