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Class Information
Number: 438/514
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Ion implantation of dopant into semiconductor region
Description: Process involving penetration of the surface of the semiconductive regions of the substrate with electrically active dopant species possessing sufficient kinetic energy therefor, usually resulting in the formation of a barrier layer rectifying junction within the semiconductive regions.










Sub-classes under this class:

Class Number Class Name Patents
438/533 And contact formation (i.e., metallization) 258
438/526 Forming buried region 415
438/516 Including charge neutralization 76
438/530 Including heat treatment 538
438/527 Including multiple implantation steps 568
438/524 Into grooved semiconductor substrate region 285
438/532 Into polycrystalline region 246
438/515 Ionized molecules 135
438/518 Of compound semiconductor 123
438/517 Of semiconductor layer on insulating substrate or layer 324
438/525 Using oblique beam 380
438/531 Using shadow mask 115


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17

Patent Number Title Of Patent Date Issued
8709928 Semiconductor fin device and method for forming the same using high tilt angle implant Apr. 29, 2014
8709929 Methods of forming semiconductor devices having diffusion regions of reduced width Apr. 29, 2014
8709927 Methods of implanting dopant ions Apr. 29, 2014
8704229 Partial poly amorphization for channeling prevention Apr. 22, 2014
8691675 Vapor phase deposition processes for doping silicon Apr. 8, 2014
8691673 Semiconductor structure with suppressed STI dishing effect at resistor region Apr. 8, 2014
8685846 Technique for processing a substrate Apr. 1, 2014
8679960 Technique for processing a substrate having a non-planar surface Mar. 25, 2014
8679929 On current in one-time-programmable memory cells Mar. 25, 2014
8679959 High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation Mar. 25, 2014
8679957 Method of manufacturing semiconductor device Mar. 25, 2014
8679906 Asymmetric multi-gated transistor and method for forming Mar. 25, 2014
8673450 Graphite member for beam-line internal member of ion implantation apparatus Mar. 18, 2014
8673753 Multi-energy ion implantation Mar. 18, 2014
8658508 Method for manufacturing SOI substrate Feb. 25, 2014
8658994 Apparatus and method for controlled particle beam manufacturing Feb. 25, 2014
8652954 Method for manufacturing silicon carbide semiconductor device Feb. 18, 2014
8647946 Control gate Feb. 11, 2014
8644598 Complex pattern deciphering using architecture parallel to swarm intelligence Feb. 4, 2014
8642427 Semiconductor device and method for fabricating the same Feb. 4, 2014
8642135 Systems and methods for plasma doping microfeature workpieces Feb. 4, 2014
8637386 Diffused junction termination structures for silicon carbide devices and methods of fabricating silicon carbide devices incorporating same Jan. 28, 2014
8629016 Multiple transistor types formed in a common epitaxial layer by differential out-diffusion from a doped underlayer Jan. 14, 2014
8629030 Method for manufacturing SOI substrate Jan. 14, 2014
8623683 Method of fabricating a nitride semiconductor light emitting device Jan. 7, 2014
8609521 Method of manufacturing semiconductor device Dec. 17, 2013
8603900 Reducing surface recombination and enhancing light trapping in solar cells Dec. 10, 2013
8598000 Two step poly etch LDMOS gate formation Dec. 3, 2013
8598021 Method for junction avoidance on edge of workpieces Dec. 3, 2013
8598023 Substrate processing apparatus, substrate processing method, and method of manufacturing semiconductor device Dec. 3, 2013
8586460 Controlling laser annealed junction depth by implant modification Nov. 19, 2013
8580662 Manufacture method of a split gate nonvolatile memory cell Nov. 12, 2013
8574363 Process for production of silicon single crystal, and highly doped N-type semiconductor substrate Nov. 5, 2013
8569150 Method for producing a semiconductor device with a semiconductor body Oct. 29, 2013
8563399 Detachable substrate and processes for fabricating and detaching such a substrate Oct. 22, 2013
8563408 Spin-on formulation and method for stripping an ion implanted photoresist Oct. 22, 2013
8557652 Application of cluster beam implantation for fabricating threshold voltage adjusted FETs Oct. 15, 2013
8551861 Semiconductor device and method for manufacturing the same Oct. 8, 2013
8536031 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme Sep. 17, 2013
8536038 Manufacturing method for metal gate using ion implantation Sep. 17, 2013
8530286 Low power semiconductor transistor structure and method of fabrication thereof Sep. 10, 2013
8530313 Method of manufacturing trench MOSFET structures using three masks process Sep. 10, 2013
8524584 Carbon implantation process and carbon ion precursor composition Sep. 3, 2013
8524585 Method of manufacturing semiconductor device Sep. 3, 2013
8518784 Adjusting of strain caused in a transistor channel by semiconductor material provided for threshold adjustment Aug. 27, 2013
8518835 Methods of utilizing block copolymers to form patterns Aug. 27, 2013
8513102 Reduction of random telegraph signal (RTS) and 1/f noise in silicon MOS devices, circuits, and sensors Aug. 20, 2013
8507974 Fin-like field effect transistor (FinFET) non-volatile random access memory (NVRAM) device with bottom erase gate Aug. 13, 2013
8501601 Drive current increase in field effect transistors by asymmetric concentration profile of alloy species of a channel semiconductor alloy Aug. 6, 2013
8501580 Process of fabricating semiconductor device with low capacitance for high-frequency circuit protection Aug. 6, 2013

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