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Class Information
Number: 438/513
Name: Semiconductor device manufacturing: process > Introduction of conductivity modifying dopant into semiconductive material > Plasma (e.g., glow discharge, etc.)
Description: Process involving the use of a gaseous vapor of ions in equilibrium or a vapor of ions in vacuum in nonequilibrium state (i.e., a "cold plasma") to introduce a dopant into the semiconductive material.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8709957 Spalling utilizing stressor layer portions Apr. 29, 2014
8709926 Plasma doping method and plasma doping apparatus Apr. 29, 2014
8703591 Method for fabricating black silicon by using plasma immersion ion implantation Apr. 22, 2014
8679958 Methods for forming doped silicon oxide thin films Mar. 25, 2014
8664098 Plasma processing apparatus Mar. 4, 2014
8658522 Methods and apparatus for incorporating nitrogen in oxide films Feb. 25, 2014
8652953 Plasma doping method with gate shutter Feb. 18, 2014
8652952 Semiconductor structure made using improved multiple ion implantation process Feb. 18, 2014
8652893 Semiconductor device and manufacturing method thereof Feb. 18, 2014
8647968 Method for producing a semiconductor layer Feb. 11, 2014
8642135 Systems and methods for plasma doping microfeature workpieces Feb. 4, 2014
8642380 Manufacturing method of semiconductor device Feb. 4, 2014
8603591 Enhanced etch and deposition profile control using plasma sheath engineering Dec. 10, 2013
8586459 Ion implantation with molecular ions containing phosphorus and arsenic Nov. 19, 2013
8586460 Controlling laser annealed junction depth by implant modification Nov. 19, 2013
8563374 Strained semiconductor devices having asymmetrical heterojunction structures and methods for the fabrication thereof Oct. 22, 2013
8558195 Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process Oct. 15, 2013
8536031 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme Sep. 17, 2013
8536658 Mechanisms for forming ultra shallow junction Sep. 17, 2013
8524584 Carbon implantation process and carbon ion precursor composition Sep. 3, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8501525 Method of fabrication of programmable memory microelectric device Aug. 6, 2013
8497208 Semiconductor device and method for manufacturing the same Jul. 30, 2013
8497196 Semiconductor device, method for fabricating the same and apparatus for fabricating the same Jul. 30, 2013
8497194 Methods of forming doped regions in semiconductor substrates Jul. 30, 2013
8461030 Apparatus and method for controllably implanting workpieces Jun. 11, 2013
8440551 Plasma doping method and manufacturing method of semiconductor device May. 14, 2013
8431468 Noise reduction in semiconductor devices Apr. 30, 2013
8414790 Bevel plasma treatment to enhance wet edge clean Apr. 9, 2013
8410704 Ionization device Apr. 2, 2013
8409988 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 2, 2013
8409961 Alteration method and alteration apparatus for titanium nitride Apr. 2, 2013
8409939 Semiconductor device and method for fabricating the same Apr. 2, 2013
8408797 Method of manufacturing bearing device component coated with photoluminescence material, bearing device component and processing device with an indicator displaying information for a signal in Apr. 2, 2013
8399342 Method for fabricating semiconductor device with buried bit lines Mar. 19, 2013
8389390 Method of impurity introduction and controlled surface removal Mar. 5, 2013
8389417 Semiconductor device and manufacturing method thereof Mar. 5, 2013
8383522 Micro pattern forming method Feb. 26, 2013
8383496 Plasma doping method and manufacturing method of semiconductor device Feb. 26, 2013
8377804 Manufacturing method of semiconductor substrate and semiconductor device Feb. 19, 2013
8372735 USJ techniques with helium-treated substrates Feb. 12, 2013
8367531 Aluminum implant using new compounds Feb. 5, 2013
8367530 Substrate processing apparatus and manufacturing method of semiconductor device Feb. 5, 2013
8343842 Method for reducing plasma discharge damage during processing Jan. 1, 2013
8343857 Manufacturing method of microcrystalline semiconductor film and manufacturing method of semiconductor device Jan. 1, 2013
8343860 High C content molecules for C implant Jan. 1, 2013
8338317 Method for processing a semiconductor wafer or die, and particle deposition device Dec. 25, 2012
8338211 Systems and methods for charging solar cell layers Dec. 25, 2012
8329567 Methods of forming doped regions in semiconductor substrates Dec. 11, 2012
8324085 Method of manufacturing crystalline silicon Dec. 4, 2012

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