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Class Information
Number: 438/509
Name: Semiconductor device manufacturing: process > Formation of semiconductive active region on any substrate (e.g., fluid growth, deposition) > Fluid growth from gaseous state combined with subsequent diverse operation > Heat treatment
Description: Process wherein the substrate having the deposited semiconductor active region thereon is heat treated following a step of fluid growth of semiconductive material from the gaseous state.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8685826 Method for manufacturing nano-crystalline silicon material from chloride chemistries for the semiconductor integrated circuits Apr. 1, 2014
8673747 Method of fabricating semiconductor device Mar. 18, 2014
8652946 Graphene layer formation on a carbon based substrate Feb. 18, 2014
8652951 Selective epitaxial germanium growth on silicon-trench fill and in situ doping Feb. 18, 2014
8642449 Silicon wafer Feb. 4, 2014
8609456 Method for fabricating semiconductor layer having textured surface and method for fabricating solar cell Dec. 17, 2013
8603886 Intermediate epitaxial structure and method for fabricating an epitaxial structure Dec. 10, 2013
8598023 Substrate processing apparatus, substrate processing method, and method of manufacturing semiconductor device Dec. 3, 2013
8586457 Method of fabricating high efficiency CIGS solar cells Nov. 19, 2013
8558304 Methods and devices for forming nanostructure monolayers and devices including such monolayers Oct. 15, 2013
8530360 Method for low stress flip-chip assembly of fine-pitch semiconductor devices Sep. 10, 2013
8525303 Photovoltaic device including semiconductor nanocrystals Sep. 3, 2013
8518808 Defects annealing and impurities activation in III-nitride compound Aug. 27, 2013
8501599 Substrate processing apparatus and substrate processing method Aug. 6, 2013
8492251 Method of forming a thin layer structure Jul. 23, 2013
8486813 Silicon wafer and fabrication method thereof Jul. 16, 2013
8481393 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device Jul. 9, 2013
8461031 Method for making a thin-film structure and resulting thin-film structure Jun. 11, 2013
8445364 Methods of treating semiconducting materials including melting and cooling May. 21, 2013
8399341 Method for heat treating a silicon wafer Mar. 19, 2013
8377729 Forming II-VI core-shell semiconductor nanowires Feb. 19, 2013
8372687 System, method and apparatus for forming multiple layers in a single process chamber Feb. 12, 2013
8343782 Semiconductor device having an InGaN layer Jan. 1, 2013
8334154 Method for the production of quantum dots embedded in a matrix, and quantum dots embedded in a matrix produced using the method Dec. 18, 2012
8324087 Scalable light-induced metallic to semiconducting conversion of carbon nanotubes and applications to field-effect transistor devices Dec. 4, 2012
8293646 Semiconductor device manufacturing method and substrate processing apparatus Oct. 23, 2012
8278135 Highly pure film formation method for light emitting device using gas from evaporated electroluminescent source Oct. 2, 2012
8280531 Method and computer program for controlling the heat treatment of metal workpieces Oct. 2, 2012
8216921 Method for production of silicon wafer for epitaxial substrate and method for production of epitaxial substrate Jul. 10, 2012
8187982 Manufacture method for photovoltaic module May. 29, 2012
8183879 Measuring arrangement, semiconductor arrangement and method for operating a semiconductor component as a reference source May. 22, 2012
8178443 Hardmask materials May. 15, 2012
8163634 Devices with graphene layers Apr. 24, 2012
8138064 Method for producing silicon film-transferred insulator wafer Mar. 20, 2012
8138086 Method for manufacturing flash memory device Mar. 20, 2012
8129284 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation Mar. 6, 2012
8115137 Laser annealing method and laser annealing apparatus Feb. 14, 2012
8110486 Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI wafer Feb. 7, 2012
8105916 Relaxation and transfer of strained layers Jan. 31, 2012
8093144 Patterning of nanostructures Jan. 10, 2012
8084312 Nitrogen based implants for defect reduction in strained silicon Dec. 27, 2011
8076226 Apparatus for annealing, method for annealing, and method for manufacturing a semiconductor device Dec. 13, 2011
8067298 Relaxation of a strained material layer with application of a stiffener Nov. 29, 2011
8048783 Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same Nov. 1, 2011
8039374 Method for low temperature ion implantation Oct. 18, 2011
8034208 Deformation moderation method Oct. 11, 2011
8030190 Method of manufacturing crystalline semiconductor thin film Oct. 4, 2011
8026145 Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering Sep. 27, 2011
8017509 Growth of monocrystalline GeN on a substrate Sep. 13, 2011
8014895 Temperature setting method of heat processing plate, temperature setting apparatus of heat processing plate, program, and computer-readable recording medium recording program thereon Sep. 6, 2011

1 2 3 4 5

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