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Class Information
Number: 438/494
Name: Semiconductor device manufacturing: process > Formation of semiconductive active region on any substrate (e.g., fluid growth, deposition) > Plural fluid growth steps with intervening diverse operation > Differential etching
Description: Process where the differential etching of the substrate intermediate to the steps of fluid growth of semiconductive material is the diverse step.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8679952 Method of manufacturing silicon carbide epitaxial wafer Mar. 25, 2014
8637373 Transistors and methods of manufacturing the same Jan. 28, 2014
8637362 Memory array with ultra-thin etched pillar surround gate access transistors and buried data/bit lines Jan. 28, 2014
8501597 Method for fabricating group III-nitride semiconductor Aug. 6, 2013
8460977 Mesa termination structures for power semiconductor devices and methods of forming power semiconductor devices with mesa termination structures Jun. 11, 2013
8426295 Manufacturing method of microcrystalline silicon film and manufacturing method of semiconductor device Apr. 23, 2013
8241940 Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing Aug. 14, 2012
8227305 Memory array with ultra-thin etched pillar surround gate access transistors and buried data/bit lines Jul. 24, 2012
8128981 Biosensor manufacturing method Mar. 6, 2012
8043898 Method of manufacturing semiconductor package with etch removal of carrier frame and base plating layer Oct. 25, 2011
8019458 Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structures Sep. 13, 2011
7960255 Process for forming a wire portion in an integrated electronic circuit Jun. 14, 2011
7955959 Method for manufacturing GaN-based film LED Jun. 7, 2011
7923372 Method for fabricating semiconductor device Apr. 12, 2011
7902053 Method of processing semiconductor wafer Mar. 8, 2011
7897416 Composition control for photovoltaic thin film manufacturing Mar. 1, 2011
7807538 Method of forming a silicide layer while applying a compressive or tensile strain to impurity layers Oct. 5, 2010
7799591 Semiconductor device and method for manufacturing the same Sep. 21, 2010
7767560 Three dimensional strained quantum wells and three dimensional strained surface channels by Ge confinement method Aug. 3, 2010
7759213 Pattern independent Si:C selective epitaxy Jul. 20, 2010
7737007 Methods to fabricate MOSFET devices using a selective deposition process Jun. 15, 2010
7635670 Chromium-free etching solution for si-substrates and uses therefor Dec. 22, 2009
7579309 Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor Aug. 25, 2009
7563711 Method of forming a carbon nanotube-based contact to semiconductor Jul. 21, 2009
7560328 Strained Si on multiple materials for bulk or SOI substrates Jul. 14, 2009
7550370 Method of forming thin SGOI wafers with high relaxation and low stacking fault defect density Jun. 23, 2009
7439142 Methods to fabricate MOSFET devices using a selective deposition process Oct. 21, 2008
7371627 Memory array with ultra-thin etched pillar surround gate access transistors and buried data/bit lines May. 13, 2008
7344997 Semiconductor substrate, semiconductor device, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device Mar. 18, 2008
7268079 Method for fabricating a semiconductor having a field zone Sep. 11, 2007
7250359 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization Jul. 31, 2007
7189592 Manufacturable single-chip hydrogen sensor Mar. 13, 2007
7084041 Bipolar device and method of manufacturing the same including pre-treatment using germane gas Aug. 1, 2006
7060516 Method for integrating optical devices in a single epitaxial growth step Jun. 13, 2006
7056789 Production method for semiconductor substrate and production method for field effect transistor and semiconductor substrate and field effect transistor Jun. 6, 2006
7022593 SiGe rectification process Apr. 4, 2006
7022592 Ammonia-treated polysilicon semiconductor device Apr. 4, 2006
6858907 Method of fabricating semiconductor device having notched gate Feb. 22, 2005
6740583 Semiconductor processing methods of forming integrated circuitry and semiconductor processing methods of forming dynamic random access memory (DRAM) circuitry May. 25, 2004
6699795 Gate etch process Mar. 2, 2004
6555482 Process for fabricating a MOS transistor having two gates, one of which is buried and corresponding transistor Apr. 29, 2003
6388253 Integrated critical dimension control for semiconductor device manufacturing May. 14, 2002
6369396 Calibration target for electron beams Apr. 9, 2002
6362474 Semiconductor sample for transmission electron microscope and method of manufacturing the same Mar. 26, 2002
6291321 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization Sep. 18, 2001
6171935 Process for producing an epitaxial layer with laterally varying doping Jan. 9, 2001
6100172 Method for forming a horizontal surface spacer and devices formed thereby Aug. 8, 2000
6033995 Inverted layer epitaxial liftoff process Mar. 7, 2000
5967795 SiC semiconductor device comprising a pn junction with a voltage absorbing edge Oct. 19, 1999
5918128 Reduced channel length for a high performance CMOS transistor Jun. 29, 1999

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