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Class Information
Number: 438/491
Name: Semiconductor device manufacturing: process > Formation of semiconductive active region on any substrate (e.g., fluid growth, deposition) > Polycrystalline semiconductor > And subsequent doping of polycrystalline semiconductor
Description: Process having a subsequent step of incorporating an electrically active dopant species into the polycrystalline semiconductive material.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7569462 |
Directional crystallization of silicon sheets using rapid thermal processing |
Aug. 4, 2009 |
| 7521303 |
Method of crystallizing amorphous semiconductor thin film and method of fabricating poly crystalline thin film transistor using the same |
Apr. 21, 2009 |
| 7488612 |
Liquid crystal display device and fabricating method thereof |
Feb. 10, 2009 |
| 7368368 |
Multi-chamber MOCVD growth apparatus for high performance/high throughput |
May. 6, 2008 |
| 7341787 |
Process for producing highly doped semiconductor wafers, and dislocation-free highly doped semiconductor wafers |
Mar. 11, 2008 |
| 7294535 |
Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same |
Nov. 13, 2007 |
| 7232742 |
Method of manufacturing a semiconductor device that includes forming a material with a high tensile stress in contact with a semiconductor film to getter impurities from the semiconductor film |
Jun. 19, 2007 |
| 7223649 |
Method of fabricating transistor of DRAM semiconductor device |
May. 29, 2007 |
| 7115488 |
Method of manufacturing semiconductor device |
Oct. 3, 2006 |
| 7015122 |
Method of forming polysilicon thin film transistor |
Mar. 21, 2006 |
| 6949452 |
Method for fabricating image display device |
Sep. 27, 2005 |
| 6890827 |
Method of fabricating a silicon on insulator transistor structure for imbedded DRAM |
May. 10, 2005 |
| 6881986 |
Design and fabrication method for finger n-type doped photodiodes with high sensitivity for CIS products |
Apr. 19, 2005 |
| 6881653 |
Method of manufacturing CMOS semiconductor device |
Apr. 19, 2005 |
| 6878577 |
Method of forming LDD of semiconductor devices |
Apr. 12, 2005 |
| 6867113 |
In-situ deposition and doping process for polycrystalline silicon layers and the resulting device |
Mar. 15, 2005 |
| 6855991 |
Semiconductor device having a doped lattice matching layer and a method of manufacture therefor |
Feb. 15, 2005 |
| 6852611 |
ROM embedded DRAM with dielectric removal/short |
Feb. 8, 2005 |
| 6750122 |
Semiconductor device formed with an oxygen implant step |
Jun. 15, 2004 |
| 6743701 |
Method for the formation of active area utilizing reverse trench isolation |
Jun. 1, 2004 |
| 6737339 |
Semiconductor device having a doped lattice matching layer and a method of manufacture therefor |
May. 18, 2004 |
| 6730584 |
Methods for forming wordlines, transistor gates, and conductive interconnects, and wordline, transistor gate, and conductive interconnect structures |
May. 4, 2004 |
| 6727122 |
Method of fabricating polysilicon thin film transistor |
Apr. 27, 2004 |
| 6713371 |
Large grain size polysilicon films formed by nuclei-induced solid phase crystallization |
Mar. 30, 2004 |
| 6703300 |
Method for making multilayer electronic devices |
Mar. 9, 2004 |
| 6696345 |
Metal-gate electrode for CMOS transistor applications |
Feb. 24, 2004 |
| 6693022 |
CVD method of producing in situ-doped polysilicon layers and polysilicon layered structures |
Feb. 17, 2004 |
| 6660574 |
Method of forming a semiconductor device including recombination center neutralizer |
Dec. 9, 2003 |
| 6645826 |
Semiconductor device and method of fabricating the same |
Nov. 11, 2003 |
| 6635554 |
Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures |
Oct. 21, 2003 |
| 6613653 |
Method of doping silicon, metal doped silicon, method of making solar cells, and solar cells |
Sep. 2, 2003 |
| 6602800 |
Apparatus for forming thin film on semiconductor substrate by plasma reaction |
Aug. 5, 2003 |
| 6576831 |
Multicrystalline silicon having a low proportion of active grain borders |
Jun. 10, 2003 |
| 6534350 |
Method for fabricating a low temperature polysilicon thin film transistor incorporating channel passivation step |
Mar. 18, 2003 |
| 6506655 |
Bipolar transistor manufacturing method |
Jan. 14, 2003 |
| 6486046 |
Method of forming polycrystalline semiconductor film |
Nov. 26, 2002 |
| 6429101 |
Method of forming thermally stable polycrystal to single crystal electrical contact structure |
Aug. 6, 2002 |
| 6376348 |
Reliable polycide gate stack with reduced sheet resistance and thickness |
Apr. 23, 2002 |
| 6339013 |
Method of doping silicon, metal doped silicon, method of making solar cells, and solar cells |
Jan. 15, 2002 |
| 6331475 |
Method and manufacturing semiconductor device |
Dec. 18, 2001 |
| 6316339 |
Semiconductor device and production method thereof |
Nov. 13, 2001 |
| 6313505 |
Method for forming shallow source/drain extension for MOS transistor |
Nov. 6, 2001 |
| 6258664 |
Methods of forming silicon-comprising materials having roughened outer surfaces, and methods of forming capacitor constructions |
Jul. 10, 2001 |
| 6187630 |
Method for forming hemispherical silicon grains on designated areas of silicon layer |
Feb. 13, 2001 |
| 6180442 |
Bipolar transistor with an inhomogeneous emitter in a BICMOS integrated circuit method |
Jan. 30, 2001 |
| 6180451 |
Method of forming capacitor with a HSG layer |
Jan. 30, 2001 |
| 6156594 |
Fabrication of bipolar/CMOS integrated circuits and of a capacitor |
Dec. 5, 2000 |
| 6129950 |
Method of forming a thick polysilicon layer |
Oct. 10, 2000 |
| 6127230 |
Vertical semiconductor device and method of manufacturing the same |
Oct. 3, 2000 |
| 6068928 |
Method for producing a polycrystalline silicon structure and polycrystalline silicon layer to be produced by the method |
May. 30, 2000 |
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