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Class Information
Number: 438/489
Name: Semiconductor device manufacturing: process > Formation of semiconductive active region on any substrate (e.g., fluid growth, deposition) > Polycrystalline semiconductor > Simultaneous single crystal formation
Description: Process wherein both single and polycrystalline regions are simultaneously formed on the same substrate.

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8673751 Laser crystallization system and method of manufacturing display apparatus using the same Mar. 18, 2014
8633483 Recrystallization of semiconductor wafers in a thin film capsule and related processes Jan. 21, 2014
8603896 Method for transferring a monocrystalline semiconductor layer onto a support substrate Dec. 10, 2013
8546250 Method of fabricating vertical integrated semiconductor device with multiple continuous single crystal silicon layers vertically separated from one another Oct. 1, 2013
8507304 Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) Aug. 13, 2013
8466015 Thin film transistors in pixel and driving portions characterized by surface roughness Jun. 18, 2013
8445358 Method for manufacturing semiconductor substrate and method for manufacturing semiconductor device May. 21, 2013
8367527 Method of fabricating polycrystalline silicon thin film Feb. 5, 2013
8293545 Critical dimension for trench and vias Oct. 23, 2012
8257999 Method of zinc oxide film grown on the epitaxial lateral overgrowth gallium nitride template Sep. 4, 2012
8258049 Method of manufacturing nanowire Sep. 4, 2012
8236603 Polycrystalline semiconductor layers and methods for forming the same Aug. 7, 2012
8236665 Method for manufacturing semiconductor device with SEG film active region Aug. 7, 2012
8138035 Method for forming integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels Mar. 20, 2012
8017426 Color filter array alignment mark formation in backside illuminated image sensors Sep. 13, 2011
7998846 3-D integrated circuit system and method Aug. 16, 2011
7989306 Method of forming alternating regions of Si and SiGe or SiGeC on a buried oxide layer on a substrate Aug. 2, 2011
7951639 Method of zinc oxide film grown on the epitaxial lateral overgrowth gallium nitride template May. 31, 2011
7951659 Method for simultaneously tensile and compressive straining the channels of NMOS and PMOS transistors respectively May. 31, 2011
7906413 Abrupt "delta-like" doping in Si and SiGe films by UHV-CVD Mar. 15, 2011
7879697 Growth of low dislocation density Group-III nitrides and related thin-film structures Feb. 1, 2011
7875884 Hetero-crystalline structure and method of making same Jan. 25, 2011
7863621 Thin film transistor Jan. 4, 2011
7842595 Fabricating electronic-photonic devices having an active layer with spherical quantum dots Nov. 30, 2010
7820501 Decoder for a stationary switch machine Oct. 26, 2010
7807523 Sequential selective epitaxial growth Oct. 5, 2010
7790581 Semiconductor substrate with multiple crystallographic orientations Sep. 7, 2010
7791103 Group III nitride semiconductor substrate Sep. 7, 2010
7754587 Silicon deposition over dual surface orientation substrates to promote uniform polishing Jul. 13, 2010
7696032 Semiconductor device including a crystal semiconductor layer, its fabrication and its operation Apr. 13, 2010
7662704 Electro-optical device, method of manufacturing the same, electronic apparatus, and semiconductor device Feb. 16, 2010
7648889 Production method for device Jan. 19, 2010
7648853 Dual channel heterostructure Jan. 19, 2010
7642177 Method of manufacturing nanowire Jan. 5, 2010
7642179 Semiconductor substrate and manufacturing method for the same Jan. 5, 2010
7608530 Hetero-crystalline structure and method of making same Oct. 27, 2009
7589002 Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method Sep. 15, 2009
7572715 Selective epitaxy process with alternating gas supply Aug. 11, 2009
7560352 Selective deposition Jul. 14, 2009
7413939 Method of growing a germanium epitaxial film on insulator for use in fabrication of CMOS integrated circuit Aug. 19, 2008
7413967 Yield improvement in silicon-germanium epitaxial growth Aug. 19, 2008
7407873 Method of manufacturing semiconductor device Aug. 5, 2008
7396744 Method of forming a semiconductor thin film Jul. 8, 2008
7390705 Method for crystallizing amorphous semiconductor thin film by epitaxial growth using non-metal seed and method for fabricating poly-crystalline thin film transistor using the same Jun. 24, 2008
7364990 Epitaxial crystal growth process in the manufacturing of a semiconductor device Apr. 29, 2008
7364976 Selective etch for patterning a semiconductor film deposited non-selectively Apr. 29, 2008
7303968 Semiconductor device and method having multiple subcollectors formed on a common wafer Dec. 4, 2007
7300854 Method for producing a semiconductor component having a movable mass in particular, and semiconductor component produced according to this method Nov. 27, 2007
7259081 Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity, and a structure of such film regions Aug. 21, 2007
7247528 Methods of fabricating semiconductor integrated circuits using selective epitaxial growth and partial planarization techniques Jul. 24, 2007

1 2 3 4

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