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Class Information
Number: 438/487
Name: Semiconductor device manufacturing: process > Formation of semiconductive active region on any substrate (e.g., fluid growth, deposition) > Amorphous semiconductor > And subsequent crystallization > Utilizing wave energy (e.g., laser, electron beam, etc.)
Description: Process whereby the crystallization is affected by the application of a source of wave energy to the amorphous semiconductor.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17

Patent Number Title Of Patent Date Issued
5767003 Thin film semiconductor device manufacturing method Jun. 16, 1998
5766989 Method for forming polycrystalline thin film and method for fabricating thin-film transistor Jun. 16, 1998
5756364 Laser processing method of semiconductor device using a catalyst May. 26, 1998
5753542 Method for crystallizing semiconductor material without exposing it to air May. 19, 1998
5753541 Method of fabricating polycrystalline silicon-germanium thin film transistor May. 19, 1998
5736439 Method for forming a semiconductor device in which the insulating layer is heated to contract after crystallization of the semiconductor layer Apr. 7, 1998
5733641 Buffered substrate for semiconductor devices Mar. 31, 1998
5721150 Use of silicon for integrated circuit device interconnection by direct writing of patterns therein Feb. 24, 1998
5714404 Fabrication of polycrystalline thin films by pulsed laser processing Feb. 3, 1998
5712191 Method for producing semiconductor device Jan. 27, 1998
5683935 Method of growing semiconductor crystal Nov. 4, 1997
5681759 Method of fabricating semiconductor device Oct. 28, 1997
5639698 Semiconductor, semiconductor device, and method for fabricating the same Jun. 17, 1997
5624851 Process of fabricating a semiconductor device in which one portion of an amorphous silicon film is thermally crystallized and another portion is laser crystallized Apr. 29, 1997
5624873 Enhanced crystallization of amorphous films Apr. 29, 1997
5612251 Manufacturing method and device for a polycrystalline silicon Mar. 18, 1997
5612250 Method for manufacturing a semiconductor device using a catalyst Mar. 18, 1997
5605846 Method for manufacturing semiconductor device Feb. 25, 1997
5591668 Laser annealing method for a semiconductor thin film Jan. 7, 1997
5591653 Method of manufacturing Si-Ge thin film transistor Jan. 7, 1997
5589406 Method of making TFT display Dec. 31, 1996
5580801 Method for processing a thin film using an energy beam Dec. 3, 1996
5580820 Method of forming a semiconductor material having a substantially I-type crystalline layer Dec. 3, 1996
5578520 Method for annealing a semiconductor Nov. 26, 1996
5569610 Method of manufacturing multiple polysilicon TFTs with varying degrees of crystallinity Oct. 29, 1996
5561081 Method of forming a semiconductor device by activating regions with a laser light Oct. 1, 1996
5550070 Method for producing crystalline semiconductor film having reduced concentration of catalyst elements for crystallization and semiconductor device having the same Aug. 27, 1996
5543352 Method for manufacturing a semiconductor device using a catalyst Aug. 6, 1996
5529630 Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals Jun. 25, 1996
5530265 Insulated gate semiconductor device and process for fabricating the same Jun. 25, 1996
5529951 Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation Jun. 25, 1996
5529937 Process for fabricating thin film transistor Jun. 25, 1996
5518960 Method of manufacturing a wiring layer including amorphous silicon and refractory metal silicide May. 21, 1996
5518951 Method for making thin film piezoresistive sensor May. 21, 1996
5496768 Method of manufacturing polycrystalline silicon thin film Mar. 5, 1996
5478777 Method of making a semiconductor photoelectric conversion device having a crystalline I-type layer Dec. 26, 1995
5466617 Manufacturing electronic devices comprising TFTs and MIMs Nov. 14, 1995
5466638 Method of manufacturing a metal interconnect with high resistance to electromigration Nov. 14, 1995
5466638 Method of manufacturing a metal interconnect with high resistance to electromigration Nov. 14, 1995
5466617 Manufacturing electronic devices comprising TFTs and MIMs Nov. 14, 1995
5457058 Crystal growth method Oct. 10, 1995
5456763 Solar cells utilizing pulsed-energy crystallized microcrystalline/polycrystalline silicon Oct. 10, 1995
5432122 Method of making a thin film transistor by overlapping annealing using lasers Jul. 11, 1995
5424230 Method of manufacturing a polysilicon thin film transistor Jun. 13, 1995
5413958 Method for manufacturing a liquid crystal display substrate May. 9, 1995
5409867 Method of producing polycrystalline semiconductor thin film Apr. 25, 1995
5409857 Process for production of an integrated circuit Apr. 25, 1995
5387542 Polycrystalline silicon thin film and low temperature fabrication method thereof Feb. 7, 1995
5382548 Method for making polystalline silicon thin film Jan. 17, 1995
5373803 Method of epitaxial growth of semiconductor Dec. 20, 1994

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