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Class Information
Number: 438/477
Name: Semiconductor device manufacturing: process > Gettering of substrate > By vapor phase surface reaction
Description: Process in which the substrate is treated with a reactive gas mixture which preferentially forms volatile compounds with the undesired impurities.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8685840 In-situ gettering method for removing metal impurities from the surface and interior of a upgraded metallurgical grade silicon wafer Apr. 1, 2014
8569149 Method of treating a semiconductor device Oct. 29, 2013
8569175 Method for dry chemical treatment of substrates and also use thereof Oct. 29, 2013
8486813 Silicon wafer and fabrication method thereof Jul. 16, 2013
8470692 Method and device for preparing compound semiconductor film Jun. 25, 2013
8436447 Memory cell that includes a carbon-based memory element and methods of forming the same May. 7, 2013
8414790 Bevel plasma treatment to enhance wet edge clean Apr. 9, 2013
8389313 Deposition method of III group nitride compound semiconductor laminated structure Mar. 5, 2013
8309407 Electronic devices including carbon-based films having sidewall liners, and methods of forming such devices Nov. 13, 2012
8309436 Method of producing epitaxial substrate with gettering for solid-state imaging device, and method of producing solid-state imaging device using same substrate Nov. 13, 2012
8207048 Method for producing ordered nanostructures Jun. 26, 2012
8168518 Method for crystallizing thin film, method for manufacturing thin film semiconductor device, method for manufacturing electronic apparatus, and method for manufacturing display device May. 1, 2012
8124502 Semiconductor device manufacturing method, semiconductor device and semiconductor device manufacturing installation Feb. 28, 2012
8120155 Reduced stiction and mechanical memory in MEMS devices Feb. 21, 2012
8048770 Method for manufacturing semiconductor device Nov. 1, 2011
8043936 Method for manufacturing semiconductor device Oct. 25, 2011
7977216 Silicon wafer and fabrication method thereof Jul. 12, 2011
7939432 Method of improving intrinsic gettering ability of wafer May. 10, 2011
7867923 High quality silicon oxide films by remote plasma CVD from disilane precursors Jan. 11, 2011
7776723 Method of manufacturing an epitaxial semiconductor substrate and method of manufacturing a semiconductor device Aug. 17, 2010
7745305 Method of removing an oxide and method of filling a trench using the same Jun. 29, 2010
7737005 Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program Jun. 15, 2010
7670931 Methods for fabricating semiconductor structures with backside stress layers Mar. 2, 2010
7611579 Systems and methods for synthesis of extended length nanostructures Nov. 3, 2009
7611971 Method of removing residual contaminants from an environment Nov. 3, 2009
7582540 Method for manufacturing SOI wafer Sep. 1, 2009
7566631 Low temperature fusion bonding with high surface energy using a wet chemical treatment Jul. 28, 2009
7507642 Vapor-phase growth method, semiconductor manufacturing method and semiconductor device manufacturing method Mar. 24, 2009
7482286 Method for forming dielectric or metallic films Jan. 27, 2009
7456084 Method of using a setter having a recess in manufacturing a net-shape semiconductor wafer Nov. 25, 2008
7303979 Vapor-phase growth method, semiconductor manufacturing method and semiconductor device manufacturing method Dec. 4, 2007
7235427 Method for treating substrates for microelectronics and substrates obtained by said method Jun. 26, 2007
7211513 Process for chemical vapor desposition of a nitrogen-doped titanium oxide coating May. 1, 2007
7199057 Method of eliminating boron contamination in annealed wafer Apr. 3, 2007
7166505 Method for making a semiconductor device having a high-k gate dielectric Jan. 23, 2007
7083680 Sublimation and purification method Aug. 1, 2006
7064072 Method for fabricating trench isolation Jun. 20, 2006
7049209 De-fluorination of wafer surface and related structure May. 23, 2006
7033938 Method of making a long wavelength indium gallium arsenide nitride (InGaAsN) active region Apr. 25, 2006
7015119 Fabrication method of semiconductor integrated circuit device Mar. 21, 2006
6962855 Method of forming a porous material layer in a semiconductor device Nov. 8, 2005
6838395 Method for fabricating a semiconductor crystal Jan. 4, 2005
6830950 Integrated method for release and passivation of MEMS structures Dec. 14, 2004
6828690 Non-uniform minority carrier lifetime distributions in high performance silicon power devices Dec. 7, 2004
6821827 Method of manufacturing a semiconductor device Nov. 23, 2004
6803242 Evaluation method of IG effectivity in semiconductor silicon substrates Oct. 12, 2004
6764926 Method for obtaining high quality InGaAsN semiconductor devices Jul. 20, 2004
6746939 Production method for solid imaging device Jun. 8, 2004
6670259 Inert atom implantation method for SOI gettering Dec. 30, 2003
6642128 Method for high temperature oxidations to prevent oxide edge peeling Nov. 4, 2003

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