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Class Information
Number: 438/475
Name: Semiconductor device manufacturing: process > Gettering of substrate > By implanting or irradiating > Ionized radiation (e.g., corpuscular or plasma treatment, etc.) > Hydrogen plasma (i.e., hydrogenization)
Description: Process wherein the radiation is a plasma containing ionized hydrogen (i.e., proton irradiation).










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
6890838 Gettering technique for wafers made using a controlled cleaving process May. 10, 2005
6855619 Method and device for making substrates Feb. 15, 2005
6849494 Dielectric cure for reducing oxygen vacancies Feb. 1, 2005
6846745 High-density plasma process for filling high aspect ratio structures Jan. 25, 2005
6833195 Low temperature germanium transfer Dec. 21, 2004
6828690 Non-uniform minority carrier lifetime distributions in high performance silicon power devices Dec. 7, 2004
6825124 Method of forming metal line in semiconductor device Nov. 30, 2004
6812043 Method for forming a carbon doped oxide low-k insulating layer Nov. 2, 2004
6808967 Method for producing a buried layer of material in another material Oct. 26, 2004
6806169 Semiconductor device manufacturing method Oct. 19, 2004
6693020 Method of preparing copper metallization die for wirebonding Feb. 17, 2004
6664171 Method of alloying a semiconductor device Dec. 16, 2003
6660624 Method for reducing fluorine induced defects on a bonding pad surface Dec. 9, 2003
6649499 Method of varying the resistance along a conductive layer Nov. 18, 2003
6633072 Fabrication method for semiconductor integrated circuit devices and semiconductor integrated circuit device Oct. 14, 2003
6624052 Process for annealing semiconductors and/or integrated circuits Sep. 23, 2003
6589865 Low pressure, low temperature, semiconductor gap filling process Jul. 8, 2003
6555451 Method for making shallow diffusion junctions in semiconductors using elemental doping Apr. 29, 2003
6541373 Manufacture method for semiconductor with small variation in MOS threshold voltage Apr. 1, 2003
6537896 Process for treating porous low k dielectric material in damascene structure to form a non-porous dielectric diffusion barrier on etched via and trench surfaces in the porous low k dielectric Mar. 25, 2003
6489219 Method of alloying a semiconductor device Dec. 3, 2002
6468883 Semiconductor processing methods of forming contact openings, methods of forming electrical connections and interconnections Oct. 22, 2002
6451668 Method of producing calibration structures in semiconductor substrates Sep. 17, 2002
6436799 Process for annealing semiconductors and/or integrated circuits Aug. 20, 2002
6383573 Process for manufacturing coated plastic body May. 7, 2002
6368938 Process for manufacturing a silicon-on-insulator substrate and semiconductor devices on said substrate Apr. 9, 2002
6335266 Hydrogen-doped polycrystalline group IV-based TFT having a larger number of monohydride-IV bonds than higher order-IV bonds Jan. 1, 2002
6313014 Semiconductor substrate and manufacturing method of semiconductor substrate Nov. 6, 2001
6309938 Deuterated bipolar transistor and method of manufacture thereof Oct. 30, 2001
6274459 Method for non mass selected ion implant profile control Aug. 14, 2001
6255197 Hydrogen annealing method and apparatus Jul. 3, 2001
6218245 Method for fabricating a high-density and high-reliability EEPROM device Apr. 17, 2001
6211030 Method for fabricating resistors in integrated circuits Apr. 3, 2001
6194311 Method for manufacturing semiconductor device capable of effectively carrying out hydrogen passivation Feb. 27, 2001
6180439 Method for fabricating a semiconductor device Jan. 30, 2001
6114734 Transistor structure incorporating a solid deuterium source for gate interface passivation Sep. 5, 2000
6087206 Method of fabricating a top-gate type thin film transistor with dangling bonds of silicon partly combined with hydrogen Jul. 11, 2000
6057182 Hydrogenation of polysilicon thin film transistors May. 2, 2000
6028015 Process for treating damaged surfaces of low dielectric constant organo silicon oxide insulation material to inhibit moisture absorption Feb. 22, 2000
6017806 Method to enhance deuterium anneal/implant to reduce channel-hot carrier degradation Jan. 25, 2000
5956581 Method of manufacturing a semiconductor device Sep. 21, 1999
5946585 Method of fabricating semiconductor device Aug. 31, 1999
5933706 Method for surface treatment of a cadmium zinc telluride crystal Aug. 3, 1999
5930655 Fluorine barrier layer between conductor and insulator for degradation prevention Jul. 27, 1999
5888856 Method of fabricating a top-gate type thin film transistor with dangling bonds of silicon partly combined with hydrogen Mar. 30, 1999
5776804 Process of fabricating semiconductor device having non-single crystal thin film transistor free from residual hydrogen left therein during hydrogen treatment stage Jul. 7, 1998
5744202 Enhancement of hydrogenation of materials encapsulated by an oxide Apr. 28, 1998
5723383 Semiconductor substrate treatment method Mar. 3, 1998
5711998 Method of polycrystalline silicon hydrogenation Jan. 27, 1998
5635408 Method of producing a semiconductor device Jun. 3, 1997

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