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Class Information
Number: 438/475
Name: Semiconductor device manufacturing: process > Gettering of substrate > By implanting or irradiating > Ionized radiation (e.g., corpuscular or plasma treatment, etc.) > Hydrogen plasma (i.e., hydrogenization)
Description: Process wherein the radiation is a plasma containing ionized hydrogen (i.e., proton irradiation).

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7618879 Non-uniform minority carrier lifetime distributions in high performance silicon power devices Nov. 17, 2009
7615456 Method for manufacturing SOI substrate Nov. 10, 2009
7601601 Method for manufacturing semiconductor device Oct. 13, 2009
7585765 Formation of oxidation-resistant seed layer for interconnect applications Sep. 8, 2009
7572740 Methods for optimizing thin film formation with reactive gases Aug. 11, 2009
7563697 Method for producing SOI wafer Jul. 21, 2009
7563693 Method for manufacturing semiconductor substrate and semiconductor substrate Jul. 21, 2009
7544265 Method of fabricating a release substrate Jun. 9, 2009
7531430 Method for producing a semiconductor-on-insulator structure May. 12, 2009
7507641 Method of producing bonded wafer Mar. 24, 2009
7504332 Water-barrier performance of an encapsulating film Mar. 17, 2009
7485551 Semiconductor-on-insulator type heterostructure and method of fabrication Feb. 3, 2009
7462568 Method for forming interlayer dielectric film in semiconductor device Dec. 9, 2008
7459375 Transfer method for forming a silicon-on-plastic wafer Dec. 2, 2008
7446023 High-density plasma hydrogenation Nov. 4, 2008
7442628 Semiconductor laser manufacturing method Oct. 28, 2008
7407867 Method for concurrently producing at least a pair of semiconductor structures that each include at least one useful layer on a substrate Aug. 5, 2008
7405139 Prevention of backside cracks in semiconductor chips or wafers using backside film or backside wet etch Jul. 29, 2008
7368369 Method for activating P-type semiconductor layer May. 6, 2008
7332426 Substrate processing method and fabrication process of a semiconductor device Feb. 19, 2008
7256087 Techniques for improving negative bias temperature instability (NBTI) lifetime of field effect transistors Aug. 14, 2007
7256111 Pretreatment for electroless deposition Aug. 14, 2007
7253069 Method for manufacturing silicon-on-insulator wafer Aug. 7, 2007
7241670 Method to form relaxed SiGe layer with high Ge content using co-implantation of silicon with boron or helium and hydrogen Jul. 10, 2007
7235427 Method for treating substrates for microelectronics and substrates obtained by said method Jun. 26, 2007
7229891 Fabrication method for silicon-on defect layer in field-effect and bipolar transistor devices Jun. 12, 2007
7226848 Substrate treating method and production method for semiconductor device Jun. 5, 2007
7220671 Organometallic precursors for the chemical phase deposition of metal films in interconnect applications May. 22, 2007
7220677 WAT process to avoid wiring defects May. 22, 2007
7199057 Method of eliminating boron contamination in annealed wafer Apr. 3, 2007
7192851 Semiconductor laser manufacturing method Mar. 20, 2007
7186647 Method for fabricating semiconductor device having landing plug contact structure Mar. 6, 2007
7183197 Water-barrier performance of an encapsulating film Feb. 27, 2007
7166505 Method for making a semiconductor device having a high-k gate dielectric Jan. 23, 2007
7153761 Method of transferring a thin crystalline semiconductor layer Dec. 26, 2006
7151033 Method for manufacturing a semiconductor device having a low junction leakage current Dec. 19, 2006
7074698 Method of fabricating semiconductor device using plasma-enhanced CVD Jul. 11, 2006
7067409 Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance Jun. 27, 2006
7060594 Memory device and method of manufacturing including deuterated oxynitride charge trapping structure Jun. 13, 2006
7052974 Bonded wafer and method of producing bonded wafer May. 30, 2006
7041543 Strained transistor architecture and method May. 9, 2006
7029992 Low oxygen content photoresist stripping process for low dielectric constant materials Apr. 18, 2006
7029993 Method for treating substrates for microelectronics and substrates obtained according to said method Apr. 18, 2006
7008886 Process for treatment of the surface of a semiconducting material, particularly using hydrogen, and surface obtained using this process Mar. 7, 2006
7005362 Method of fabricating a thin film transistor Feb. 28, 2006
6949450 Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber Sep. 27, 2005
6946368 Reduction of native oxide at germanium interface using hydrogen-based plasma Sep. 20, 2005
6927150 Method of manufacturing a semiconductor device Aug. 9, 2005
6911378 Stabilization of fluorine-containing dielectric materials in a metal insulator wiring structure Jun. 28, 2005
6902988 Method for treating substrates for microelectronics and substrates obtained by said method Jun. 7, 2005

1 2 3 4

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