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Class Information
Number: 438/474
Name: Semiconductor device manufacturing: process > Gettering of substrate > By implanting or irradiating > Ionized radiation (e.g., corpuscular or plasma treatment, etc.)
Description: Process wherein ionized radiation is applied to the semiconductor substrate to produce a gettering effect.










Sub-classes under this class:

Class Number Class Name Patents
438/475 Hydrogen plasma (i.e., hydrogenization) 174


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8524591 Maintaining integrity of a high-K gate stack by passivation using an oxygen plasma Sep. 3, 2013
8420512 Method for manufacturing semiconductor device Apr. 16, 2013
8410002 Semiconductor device and manufacturing method thereof Apr. 2, 2013
8389395 Method for manufacturing semiconductor optical device Mar. 5, 2013
8372489 Method for directional deposition using a gas cluster ion beam Feb. 12, 2013
8361845 Method for manufacturing semiconductor device Jan. 29, 2013
8343779 Method for forming a pattern on a substrate and electronic device formed thereby Jan. 1, 2013
8329563 Semiconductor device including a gettering layer and manufacturing method therefor Dec. 11, 2012
8324084 Manufacturing method of semiconductor substrate and manufacturing method of semiconductor device Dec. 4, 2012
8313805 Clamped showerhead electrode assembly Nov. 20, 2012
8309436 Method of producing epitaxial substrate with gettering for solid-state imaging device, and method of producing solid-state imaging device using same substrate Nov. 13, 2012
8304033 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles Nov. 6, 2012
8216919 Method of manufacturing a semiconductor device and substrate carrier structure Jul. 10, 2012
8207048 Method for producing ordered nanostructures Jun. 26, 2012
8192805 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices Jun. 5, 2012
8124502 Semiconductor device manufacturing method, semiconductor device and semiconductor device manufacturing installation Feb. 28, 2012
8101506 Method for producing a buried n-doped semiconductor zone in a semiconductor body and semiconductor component Jan. 24, 2012
8093135 Method of manufacturing semiconductor device Jan. 10, 2012
8088670 Method for manufacturing bonded substrate with sandblast treatment Jan. 3, 2012
8062957 Semiconductor substrate surface preparation method Nov. 22, 2011
8034694 SOI substrate, method for manufacturing the same, and semiconductor device Oct. 11, 2011
8012289 Method of fabricating a release substrate Sep. 6, 2011
8003494 Method for producing a bonded wafer Aug. 23, 2011
7998841 Method for dehydrogenation treatment and method for forming crystalline silicon film Aug. 16, 2011
7981483 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices Jul. 19, 2011
7964857 Plasma source of directed beams and application thereof to microlithography Jun. 21, 2011
7943482 Method for semiconductor device having radiation hardened insulators and design structure thereof May. 17, 2011
7935609 Method for fabricating semiconductor device having radiation hardened insulators May. 3, 2011
7927972 Method for producing bonded wafer Apr. 19, 2011
7923709 Radiation shielding systems using nanotechnology Apr. 12, 2011
7910497 Method of forming dielectric layers on a substrate and apparatus therefor Mar. 22, 2011
7879694 System and method for applying a pre-gate plasma etch in a semiconductor device manufacturing process Feb. 1, 2011
7855127 Method for manufacturing semiconductor substrate Dec. 21, 2010
7833882 Method of producing a semiconductor device by forming an oxide film on a resin layer Nov. 16, 2010
7829433 SOI substrate and manufacturing method of the same, and semiconductor device Nov. 9, 2010
7799661 Electrical sensor for real-time feedback control of plasma nitridation Sep. 21, 2010
7799580 Method for manufacturing ferroelectric memory device Sep. 21, 2010
7763500 Method for manufacturing semiconductor storage device comprising a slow cooling step Jul. 27, 2010
7732304 Method of manufacturing semiconductor device Jun. 8, 2010
7713842 Method for producing bonded wafer May. 11, 2010
7709814 Apparatus and process for treating dielectric materials May. 4, 2010
7682915 Pre-epitaxial disposable spacer integration scheme with very low temperature selective epitaxy for enhanced device performance Mar. 23, 2010
7651955 Method for forming silicon-containing materials during a photoexcitation deposition process Jan. 26, 2010
7645682 Bonding interface quality by cold cleaning and hot bonding Jan. 12, 2010
7629196 Method for manufacturing an integrated circuit having increased radiation hardness and reliability Dec. 8, 2009
7618879 Non-uniform minority carrier lifetime distributions in high performance silicon power devices Nov. 17, 2009
7611970 Wafer processing method Nov. 3, 2009
7572740 Methods for optimizing thin film formation with reactive gases Aug. 11, 2009
7544265 Method of fabricating a release substrate Jun. 9, 2009
7538012 Fluorine-containing carbon film forming method May. 26, 2009

1 2 3 4










 
 
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