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Class Information
Number: 438/452
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Recessed oxide by localized oxidation (i.e., locos) > Plural oxidation steps to form recessed oxide
Description: Process having multiple steps of oxidizing the semiconductor substrate in the region of the recessed oxide.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
6133087 Method of making a DRAM element and a logic element Oct. 17, 2000
6133115 Formation of gate electrode Oct. 17, 2000
6127247 Method of eliminating photoresist outgassing in constructing CMOS vertically modulated wells by high energy ion implantation Oct. 3, 2000
6121116 Flash memory device isolation method and structure Sep. 19, 2000
6096583 Semiconductor device and manufacturing method thereof Aug. 1, 2000
6074933 Integrated circuit fabrication Jun. 13, 2000
6054368 Method of making an improved field oxide isolation structure for semiconductor integrated circuits having higher field oxide threshold voltages Apr. 25, 2000
6027984 Method for growing oxide Feb. 22, 2000
6013561 Method for forming field oxide film of semiconductor device Jan. 11, 2000
5989980 Semiconductor processing method of forming field isolation oxide relative to a semiconductor substrate Nov. 23, 1999
5985738 Method for forming field oxide of semiconductor device using wet and dry oxidation Nov. 16, 1999
5972779 Method for forming field oxide film of semiconductor device with silicon and nitrogen containing etching residue Oct. 26, 1999
5970364 Method of nitride-sealed oxide-buffered local oxidation of silicon Oct. 19, 1999
5966618 Method of forming dual field isolation structures Oct. 12, 1999
5966621 Semiconductor processing method of forming field isolation oxide relative to a semiconductor substrate Oct. 12, 1999
5930647 Methods of forming field oxide and active area regions on a semiconductive substrate Jul. 27, 1999
5923994 Selective oxidation process Jul. 13, 1999
5909630 Dual-masked isolation Jun. 1, 1999
5909629 Semiconductor processing method of forming field oxide regions on a semiconductor substrate Jun. 1, 1999
5888871 Methods of forming EEPROM memory cells having uniformly thick tunnelling oxide layers Mar. 30, 1999
5880009 Method for forming oxides on buried N.sup.+ -type regions Mar. 9, 1999
5877068 Method for forming isolating layer in semiconductor device Mar. 2, 1999
5861339 Recessed isolation with double oxidation Jan. 19, 1999
5851901 Method of manufacturing an isolation region of a semiconductor device with advanced planarization Dec. 22, 1998
5846596 Methods of forming field oxide isolation regions having sloped edges Dec. 8, 1998
5811322 Method of making a broadband backside illuminated MESFET with collecting microlens Sep. 22, 1998
5789306 Dual-masked field isolation Aug. 4, 1998
5789305 Locos with bird's beak suppression by a nitrogen implantation Aug. 4, 1998
5786264 Method of forming isolation layer of semiconductor elements Jul. 28, 1998
5747376 Method for fabricating isolation layer of semiconductor device May. 5, 1998
5739063 High temperature local oxidation of silicon for fine line patterns Apr. 14, 1998
5728622 Process for forming field oxide layers in semiconductor devices Mar. 17, 1998
5726093 Two-step planer field oxidation method Mar. 10, 1998
5721174 Narrow deep trench isolation process with trench filling by oxidation Feb. 24, 1998
5719086 Method for isolating elements of semiconductor device Feb. 17, 1998
5714414 Semiconductor processing method of forming field isolation oxide relative to a semiconductor substrate Feb. 3, 1998
5712186 Method for growing field oxide to minimize birds' beak length Jan. 27, 1998
5707888 Oxide formed in semiconductor substrate by implantation of substrate with a noble gas prior to oxidation Jan. 13, 1998
5700733 Semiconductor processing methods of forming field oxide regions on a semiconductor substrate Dec. 23, 1997
5683933 Method of fabricating a semiconductor device Nov. 4, 1997
5679600 Double locos for submicron isolation Oct. 21, 1997
5641705 Device isolation method of semiconductor device Jun. 24, 1997
5637528 Semiconductor device manufacturing method including dry oxidation Jun. 10, 1997
5627099 Method of manufacturing semiconductor device May. 6, 1997
5580816 Local oxidation process for high field threshold applications Dec. 3, 1996
5573974 Method for isolating semiconductor elements Nov. 12, 1996
5563091 Method for isolating semiconductor elements Oct. 8, 1996
5538917 Fabrication method of semiconductor integrated circuit device Jul. 23, 1996
5538917 Fabrication method of semiconductor integrated circuit device Jul. 23, 1996
5468675 Method for manufacturing a device separation region for semiconductor device Nov. 21, 1995

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