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Class Information
Number: 438/452
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Recessed oxide by localized oxidation (i.e., locos) > Plural oxidation steps to form recessed oxide
Description: Process having multiple steps of oxidizing the semiconductor substrate in the region of the recessed oxide.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615461 |
Method for forming shallow trench isolation of semiconductor device |
Nov. 10, 2009 |
| 7534691 |
Isolation structures for preventing photons and carriers from reaching active areas and methods of formation |
May. 19, 2009 |
| 7514337 |
Semiconductor device using EPI-layer and method of forming the same |
Apr. 7, 2009 |
| 7446000 |
Method of fabricating semiconductor device having gate dielectrics with different thicknesses |
Nov. 4, 2008 |
| 7405461 |
Semiconductor device and method for manufacturing semiconductor device |
Jul. 29, 2008 |
| 7358554 |
Semiconductor manufacturing apparatus for modifying-in-film stress of thin films, and product formed thereby |
Apr. 15, 2008 |
| 7303973 |
ALD process for capacitor dielectric |
Dec. 4, 2007 |
| 7259055 |
Method of forming high-luminescence silicon electroluminescence device |
Aug. 21, 2007 |
| 7250351 |
Enhanced silicon-on-insulator (SOI) transistors and methods of making enhanced SOI transistors |
Jul. 31, 2007 |
| 7164195 |
Semiconductor device and semiconductor device manufacturing method |
Jan. 16, 2007 |
| 6943088 |
Method of manufacturing a trench isolation structure for a semiconductor device with a different degree of corner rounding |
Sep. 13, 2005 |
| 6835634 |
Streamlined field isolation process |
Dec. 28, 2004 |
| RE38674 |
Process for forming a thin oxide layer |
Dec. 21, 2004 |
| 6818495 |
Method for forming high purity silicon oxide field oxide isolation region |
Nov. 16, 2004 |
| 6764920 |
Method for reducing shallow trench isolation edge thinning on tunnel oxides using partial nitride strip and small bird's beak formation for high performance flash memory devices |
Jul. 20, 2004 |
| 6746908 |
Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device |
Jun. 8, 2004 |
| 6746925 |
High-k dielectric bird's beak optimizations using in-situ O2 plasma oxidation |
Jun. 8, 2004 |
| 6727161 |
Isolation technology for submicron semiconductor devices |
Apr. 27, 2004 |
| 6723615 |
Semiconductor device and method of fabricating the same |
Apr. 20, 2004 |
| 6706616 |
Method for improving thermal process steps |
Mar. 16, 2004 |
| 6696351 |
Semiconductor device having a selectively deposited conductive layer |
Feb. 24, 2004 |
| 6645827 |
Method for forming isolation regions on semiconductor device |
Nov. 11, 2003 |
| 6639228 |
Method for molecular nitrogen implantation dosage monitoring |
Oct. 28, 2003 |
| 6610581 |
Method of forming isolation film in semiconductor device |
Aug. 26, 2003 |
| 6579769 |
Semiconductor device manufacturing method including forming FOX with dual oxidation |
Jun. 17, 2003 |
| 6534388 |
Method to reduce variation in LDD series resistance |
Mar. 18, 2003 |
| 6528390 |
Process for fabricating a non-volatile memory device |
Mar. 4, 2003 |
| 6503815 |
Method for reducing stress and encroachment of sidewall oxide layer of shallow trench isolation |
Jan. 7, 2003 |
| 6495431 |
Semiconductor device and method for manufacturing the same that includes a dual oxidation |
Dec. 17, 2002 |
| 6482718 |
Method of manufacturing semiconductor device |
Nov. 19, 2002 |
| 6465326 |
Methods of forming field oxide and active area regions on a semiconductor substrate |
Oct. 15, 2002 |
| 6444539 |
Method for producing a shallow trench isolation filled with thermal oxide |
Sep. 3, 2002 |
| 6420241 |
Method for forming an isolation region in a semiconductor device and resulting structure using a two step oxidation process |
Jul. 16, 2002 |
| 6333243 |
Method for growing field oxide to minimize birds' beak length |
Dec. 25, 2001 |
| 6326284 |
Semiconductor device and production thereof |
Dec. 4, 2001 |
| 6265286 |
Planarization of LOCOS through recessed reoxidation techniques |
Jul. 24, 2001 |
| 6261926 |
Method for fabricating field oxide |
Jul. 17, 2001 |
| 6245644 |
Methods of forming field oxide and active area regions on a semiconductive substrate |
Jun. 12, 2001 |
| 6221732 |
Method of producing semiconductor device |
Apr. 24, 2001 |
| 6187640 |
Semiconductor device manufacturing method including various oxidation steps with different concentration of chlorine to form a field oxide |
Feb. 13, 2001 |
| 6133087 |
Method of making a DRAM element and a logic element |
Oct. 17, 2000 |
| 6133115 |
Formation of gate electrode |
Oct. 17, 2000 |
| 6127247 |
Method of eliminating photoresist outgassing in constructing CMOS vertically modulated wells by high energy ion implantation |
Oct. 3, 2000 |
| 6121116 |
Flash memory device isolation method and structure |
Sep. 19, 2000 |
| 6096583 |
Semiconductor device and manufacturing method thereof |
Aug. 1, 2000 |
| 6074933 |
Integrated circuit fabrication |
Jun. 13, 2000 |
| 6054368 |
Method of making an improved field oxide isolation structure for semiconductor integrated circuits having higher field oxide threshold voltages |
Apr. 25, 2000 |
| 6027984 |
Method for growing oxide |
Feb. 22, 2000 |
| 6013561 |
Method for forming field oxide film of semiconductor device |
Jan. 11, 2000 |
| 5989980 |
Semiconductor processing method of forming field isolation oxide relative to a semiconductor substrate |
Nov. 23, 1999 |
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