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Class Information
Number: 438/450
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Recessed oxide by localized oxidation (i.e., locos) > Dopant addition > Implanting through recessed oxide
Description: Process wherein the dopant species is implanted through the recessed oxide into the semiconductive regions therebeneath.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8470687 Strained semiconductor by full wafer bonding Jun. 25, 2013
8324047 Method and structure of an integrated CMOS and MEMS device using air dielectric Dec. 4, 2012
8174074 Asymmetric embedded silicon germanium field effect transistor May. 8, 2012
7989311 Strained semiconductor by full wafer bonding Aug. 2, 2011
7968424 Method of implantation Jun. 28, 2011
7867872 Method for manufacturing semiconductor device with uniform concentration ion doping in recess gate channel region Jan. 11, 2011
7863144 Semiconductor device and method for manufacturing the device Jan. 4, 2011
7727856 Selective STI stress relaxation through ion implantation Jun. 1, 2010
7704855 Method for fabricating strained silicon-on-insulator structures and strained silicon-on-insulator structures formed thereby Apr. 27, 2010
7682910 Method of selectively adjusting ion implantation dose on semiconductor devices Mar. 23, 2010
7666756 Methods of fabricating isolation structures in epi-less substrate Feb. 23, 2010
7622191 Titania-based coating for capillary microextraction Nov. 24, 2009
7550355 Low-leakage transistor and manufacturing method thereof Jun. 23, 2009
7494883 Semiconductor device having a trench isolation and method of fabricating the same Feb. 24, 2009
7439158 Strained semiconductor by full wafer bonding Oct. 21, 2008
7425752 Semiconductor device channel termination Sep. 16, 2008
7413963 Method of edge bevel rinse Aug. 19, 2008
7279399 Method of forming isolated pocket in a semiconductor substrate Oct. 9, 2007
7214591 Method of fabricating high-voltage MOS device May. 8, 2007
7183167 Semiconductor device having a trench isolation and method of fabricating the same Feb. 27, 2007
7147740 Method of transferring a laminate and method of manufacturing a semiconductor device Dec. 12, 2006
7067387 Method of manufacturing dielectric isolated silicon structure Jun. 27, 2006
7041575 Localized strained semiconductor on insulator May. 9, 2006
6991983 Method of manufacturing high voltage transistor in flash memory device Jan. 31, 2006
6875663 Semiconductor device having a trench isolation and method of fabricating the same Apr. 5, 2005
6797587 Active region corner implantation method for fabricating a semiconductor integrated circuit microelectronic fabrication Sep. 28, 2004
6790752 Methods of controlling VSS implants on memory devices, and system for performing same Sep. 14, 2004
6713334 Fabricating dual voltage CMOSFETs using additional implant into core at high voltage mask Mar. 30, 2004
6696351 Semiconductor device having a selectively deposited conductive layer Feb. 24, 2004
6660595 Implantation method for simultaneously implanting in one region and blocking the implant in another region Dec. 9, 2003
6613639 Forming a semiconductor on implanted insulator Sep. 2, 2003
6596609 Method of fabricating a feature in an integrated circuit using two edge definition layers and a spacer Jul. 22, 2003
6583018 Method of ion implantation Jun. 24, 2003
6562666 Integrated circuits with reduced substrate capacitance May. 13, 2003
6541822 Method of manufacturing an SOI type semiconductor that can restrain floating body effect Apr. 1, 2003
6528390 Process for fabricating a non-volatile memory device Mar. 4, 2003
6511893 Radiation hardened semiconductor device Jan. 28, 2003
6500723 Method for forming a well under isolation and structure thereof Dec. 31, 2002
6408220 Semiconductor processing techniques Jun. 18, 2002
6350637 Method of fabrication of a no-field MOS transistor Feb. 26, 2002
6333243 Method for growing field oxide to minimize birds' beak length Dec. 25, 2001
6331456 Fipos method of forming SOI CMOS structure Dec. 18, 2001
6268266 Method for forming enhanced FOX region of low voltage device in high voltage process Jul. 31, 2001
6261876 Planar mixed SOI-bulk substrate for microelectronic applications Jul. 17, 2001
6235609 Method for forming isolation areas with improved isolation oxide May. 22, 2001
RE37158 High performance sub-micron P-channel transistor with germanium implant May. 1, 2001
6214700 Semiconductor device and method for producing same Apr. 10, 2001
6194289 SOI device and method of isolation thereof Feb. 27, 2001
6187694 Method of fabricating a feature in an integrated circuit using two edge definition layers and a spacer Feb. 13, 2001
6184050 Method for forming a photodiode Feb. 6, 2001

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