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Class Information
Number: 438/444
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Recessed oxide by localized oxidation (i.e., locos) > Preliminary etching of groove
Description: Process including a preliminary step of etching a trench into the semiconductive substrate followed by locally oxidizing the trench surfaces to form the recessed oxide therein.

Sub-classes under this class:

Class Number Class Name Patents
438/445 Masking of groove sidewall 171

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8609480 Methods of forming isolation structures on FinFET semiconductor devices Dec. 17, 2013
8409964 Shallow trench isolation with improved structure and method of forming Apr. 2, 2013
8334153 Semiconductor light emitting device and method of fabricating semiconductor light emitting device Dec. 18, 2012
8263502 Forming substrate structure by filling recesses with deposition material Sep. 11, 2012
8241940 Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing Aug. 14, 2012
8133798 Method for producing ink-jet head Mar. 13, 2012
8129254 Semiconductor device and manufacturing method thereof Mar. 6, 2012
8110505 Lead frame manufactured from low-priced material and not requiring strict process control, semiconductor package including the same, and method of manufacturing the lead frame and the semicond Feb. 7, 2012
8043932 Method of fabricating semiconductor device Oct. 25, 2011
7956399 Semiconductor device with low buried resistance and method of manufacturing such a device Jun. 7, 2011
7951679 Method for fabricating semiconductor device May. 31, 2011
7897479 Managing integrated circuit stress using dummy diffusion regions Mar. 1, 2011
7859026 Vertical semiconductor device Dec. 28, 2010
7745248 Fabrication of capacitive micromachined ultrasonic transducers by local oxidation Jun. 29, 2010
7709349 Semiconductor device manufactured using a gate silicidation involving a disposable chemical/mechanical polishing stop layer May. 4, 2010
7700490 Semiconductor manufacturing method for removing residue generated by dry etching Apr. 20, 2010
7588996 Oxide pattern forming method and patterning method of semiconductor device Sep. 15, 2009
7575981 Method for fabricating isolation layer in semiconductor device Aug. 18, 2009
7553741 Manufacturing method of semiconductor device Jun. 30, 2009
7527704 Method for preparing film structure comprising ferroelectric single crystal layer May. 5, 2009
7524729 Method of manufacturing a semiconductor integrated circuit device having a trench Apr. 28, 2009
7456067 Method with high gapfill capability for semiconductor devices Nov. 25, 2008
7371659 Substrate laser marking May. 13, 2008
7320927 In situ hardmask pullback using an in situ plasma resist trim process Jan. 22, 2008
7312132 Field insulator FET device and fabrication method thereof Dec. 25, 2007
7309641 Method for rounding bottom corners of trench and shallow trench isolation process Dec. 18, 2007
7279426 Like integrated circuit devices with different depth Oct. 9, 2007
7256100 Manufacturing method of semiconductor device having trench type element isolation Aug. 14, 2007
7189628 Fabrication of trenches with multiple depths on the same substrate Mar. 13, 2007
7109120 Profiled standoff structure and method for optical display package Sep. 19, 2006
7053007 Method for fabricating semiconductor integrated circuit device May. 30, 2006
7045435 Shallow trench isolation method for a semiconductor wafer May. 16, 2006
7037768 Methods of etching intermediate silicon germanium layers using ion implantation to promote selectivity May. 2, 2006
7015115 Method for forming deep trench isolation and related structure Mar. 21, 2006
6991994 Method of forming rounded corner in trench Jan. 31, 2006
6949448 Local oxidation of silicon (LOCOS) method employing graded oxidation mask Sep. 27, 2005
6943088 Method of manufacturing a trench isolation structure for a semiconductor device with a different degree of corner rounding Sep. 13, 2005
6927138 Method of semiconductor device fabrication Aug. 9, 2005
6875697 Dual depth trench isolation Apr. 5, 2005
6852606 Method for forming isolation layer of semiconductor device and semiconductor device Feb. 8, 2005
6828209 Methods for manufacturing a semiconductor device including a trench isolation region Dec. 7, 2004
6790752 Methods of controlling VSS implants on memory devices, and system for performing same Sep. 14, 2004
6790781 Dual depth trench isolation Sep. 14, 2004
6777297 Disposable spacer and method of forming and using same Aug. 17, 2004
6768130 Integration of semiconductor on implanted insulator Jul. 27, 2004
6746936 Method for forming isolation film for semiconductor devices Jun. 8, 2004
6727161 Isolation technology for submicron semiconductor devices Apr. 27, 2004
6723616 Process of increasing screen dielectric thickness Apr. 20, 2004
6723615 Semiconductor device and method of fabricating the same Apr. 20, 2004
6720233 Method of producing trench insulation in a substrate Apr. 13, 2004

1 2 3 4

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