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Class Information
Number: 438/437
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material > Multiple insulative layers in groove > Conformal insulator formation
Description: Process for making electrically isolated laterally spaced semiconductor regions by grooving and refilling with insulative material including forming an insulative layer which follows the contour of the groove.










Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8709901 Method of forming an isolation structure Apr. 29, 2014
8691659 Method for forming void-free dielectric layer Apr. 8, 2014
8679941 Method to improve wet etch budget in FEOL integration Mar. 25, 2014
8680602 Semiconductor device and method of manufacturing the same Mar. 25, 2014
8652933 Semiconductor structure having wide and narrow deep trenches with different materials Feb. 18, 2014
8614138 Manufacturing method of semiconductor device Dec. 24, 2013
8603895 Methods of forming isolation structures for semiconductor devices by performing a deposition-etch-deposition sequence Dec. 10, 2013
8580653 Method for fabricating an isolation structure Nov. 12, 2013
8501633 Forming substrate structure by filling recesses with deposition material Aug. 6, 2013
8492868 Method, apparatus, and design structure for silicon-on-insulator high-bandwidth circuitry with reduced charge layer Jul. 23, 2013
8470686 Method of increasing deposition rate of silicon dioxide on a catalyst Jun. 25, 2013
8450183 Power semiconductor device and method of manufacturing the same May. 28, 2013
8440580 Method of fabricating silicon nitride gap-filling layer May. 14, 2013
8426274 Method of forming recess and method of manufacturing semiconductor device having the same Apr. 23, 2013
8404561 Method for fabricating an isolation structure Mar. 26, 2013
8384188 Semiconductor device and fabrication method thereof Feb. 26, 2013
8372761 Plasma oxidation processing method, plasma processing apparatus and storage medium Feb. 12, 2013
8343846 Method of forming isolation layer in semiconductor device Jan. 1, 2013
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8313661 Deep trench liner removal process Nov. 20, 2012
8294238 Nonvolatile semiconductor memory device with reduced size of peripheral circuit area Oct. 23, 2012
8258028 Deep trench isolation structures and methods of formation thereof Sep. 4, 2012
8227318 Integration of multiple gate oxides with shallow trench isolation methods to minimize divot formation Jul. 24, 2012
8217472 Semiconductor device with isolation trench liner Jul. 10, 2012
8202784 Semiconductor device having a high aspect ratio isolation trench and method for manufacturing the same Jun. 19, 2012
8198171 Semiconductor device and fabrication method thereof Jun. 12, 2012
8173517 Method for forming a self-aligned isolation structure utilizing sidewall spacers as an etch mask and remaining as a portion of the isolation structure May. 8, 2012
8158488 Method of increasing deposition rate of silicon dioxide on a catalyst Apr. 17, 2012
8153502 Methods for filling trenches in a semiconductor material Apr. 10, 2012
8062955 Substrate processing method and substrate processing apparatus Nov. 22, 2011
8058161 Recessed STI for wide transistors Nov. 15, 2011
8043933 Integration sequences with top surface profile modification Oct. 25, 2011
8043918 Semiconductor device and its manufacturing method Oct. 25, 2011
8030171 Method of forming element isolation film and nonvolatile semiconductor memory Oct. 4, 2011
8017496 Methods of manufacturing a semiconductor device Sep. 13, 2011
8012846 Isolation structures and methods of fabricating isolation structures Sep. 6, 2011
7998832 Semiconductor device with isolation trench liner, and related fabrication methods Aug. 16, 2011
7994019 Silicon-ozone CVD with reduced pattern loading using incubation period deposition Aug. 9, 2011
7994605 Isolation structure for semiconductor integrated circuit substrate Aug. 9, 2011
7989310 Filling of insulation trenches using CMOS standard processes for creating dielectrically insulated areas on a SOI disk Aug. 2, 2011
7989911 Shallow trench isolation (STI) with trench liner of increased thickness Aug. 2, 2011
7985656 Shallow trench isolation (STI) with trench liner of increased thickness Jul. 26, 2011
7968422 Method for forming trench isolation using a gas cluster ion beam growth process Jun. 28, 2011
7968425 Isolation regions Jun. 28, 2011
7939749 Solar cell and method of manufacturing the same May. 10, 2011
7906407 Shallow trench isolation structures and a method for forming shallow trench isolation structures Mar. 15, 2011
7897460 Methods of forming recessed access devices associated with semiconductor constructions Mar. 1, 2011
7883987 Semiconductor devices and methods of manufacture thereof Feb. 8, 2011
7872333 Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method Jan. 18, 2011
7858492 Method of filling a trench and method of forming an isolating layer structure using the same Dec. 28, 2010

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