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Class Information
Number: 438/428
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material > Refilling multiple grooves of different widths or depths > Reflow of insulator
Description: Process for making electrically isolated laterally spaced semiconductor regions by grooving and refilling with insulative material including a step of redistributing insulative material by the viscous flow of the insulative material when exposed to high temperature.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8524569 Methods of forming an isolation layer and methods of manufacturing semiconductor devices having an isolation layer Sep. 3, 2013
8481403 Flowable film dielectric gap fill process Jul. 9, 2013
8372513 Transparent substrate comprising an antireflection coating Feb. 12, 2013
8318581 Micro-electromechanical system devices Nov. 27, 2012
8232176 Dielectric deposition and etch back processes for bottom up gapfill Jul. 31, 2012
8222101 Method of fabricating a MOS transistor having a gate insulation layer with a lateral portion and a vertical portion Jul. 17, 2012
8114779 Silicon dioxide cantilever support and method for silicon etched structures Feb. 14, 2012
8115272 Silicon dioxide cantilever support and method for silicon etched structures Feb. 14, 2012
8026177 Silicon dioxide cantilever support and method for silicon etched structures Sep. 27, 2011
7989308 Creation of dielectrically insulating soi-technlogical trenches comprising rounded edges for allowing higher voltages Aug. 2, 2011
7904281 Mounting process simulation system and method thereof Mar. 8, 2011
7820527 Cleave initiation using varying ion implant dose Oct. 26, 2010
7799706 Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same Sep. 21, 2010
7700467 Methodology of implementing ultra high temperature (UHT) anneal in fabricating devices that contain sige Apr. 20, 2010
7648921 Method of forming dielectric layer Jan. 19, 2010
7642171 Multi-step anneal of thin films for film densification and improved gap-fill Jan. 5, 2010
7625805 Passivation of deep isolating separating trenches with sunk covering layers Dec. 1, 2009
7622369 Device isolation technology on semiconductor substrate Nov. 24, 2009
7611983 Semiconductor device and a manufacturing method of the same Nov. 3, 2009
7611963 Method for forming a multi-layer shallow trench isolation structure in a semiconductor device Nov. 3, 2009
7611950 Method for forming shallow trench isolation in semiconductor device Nov. 3, 2009
7510946 Method for filling of nanoscale holes and trenches and for planarizing of a wafer surface Mar. 31, 2009
7371645 Method of manufacturing a field effect transistor device with recessed channel and corner gate device May. 13, 2008
7323394 Method of producing element separation structure Jan. 29, 2008
7247584 System and method for selectively increasing surface temperature of an object Jul. 24, 2007
7205208 Method of manufacturing a semiconductor device Apr. 17, 2007
7160787 Structure of trench isolation and a method of forming the same Jan. 9, 2007
7074690 Selective gap-fill process Jul. 11, 2006
6943088 Method of manufacturing a trench isolation structure for a semiconductor device with a different degree of corner rounding Sep. 13, 2005
6919612 Biasable isolation regions using epitaxially grown silicon between the isolation regions Jul. 19, 2005
6888212 Method for trench isolation by selective deposition of low temperature oxide films May. 3, 2005
6872631 Method of forming a trench isolation Mar. 29, 2005
6838356 Method of forming a trench isolation Jan. 4, 2005
6838355 Damascene interconnect structures including etchback for low-k dielectric materials Jan. 4, 2005
6828162 System and method for active control of BPSG deposition Dec. 7, 2004
6794270 Method for shallow trench isolation fabrication and partial oxide layer removal Sep. 21, 2004
6746934 Atomic layer doping apparatus and method Jun. 8, 2004
6720233 Method of producing trench insulation in a substrate Apr. 13, 2004
6719012 Method of forming trench isolation regions Apr. 13, 2004
6682820 Recession resistant coated ceramic part Jan. 27, 2004
6635550 Semiconductor on insulator device architecture and method of construction Oct. 21, 2003
6620703 Method of forming an integrated circuit using an isolation trench having a cavity formed by reflowing a doped glass mask layer Sep. 16, 2003
6583028 Methods of forming trench isolation regions Jun. 24, 2003
6495430 Process for fabricating sharp corner-free shallow trench isolation structure Dec. 17, 2002
6465325 Process for depositing and planarizing BPSG for dense trench MOSFET application Oct. 15, 2002
6455394 Method for trench isolation by selective deposition of low temperature oxide films Sep. 24, 2002
6426015 Method of reducing undesired etching of insulation due to elevated boron concentrations Jul. 30, 2002
6417071 Sub-atmospheric pressure thermal chemical vapor deposition (SACVD) trench isolation method with attenuated surface sensitivity Jul. 9, 2002
6277706 Method of manufacturing isolation trenches using silicon nitride liner Aug. 21, 2001
6271147 Methods of forming trench isolation regions using spin-on material Aug. 7, 2001

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