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Class Information
Number: 438/425
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material > Combined with formation of recessed oxide by localized oxidation
Description: Process for making electrically isolated laterally spaced semiconductor regions by grooving and refilling with insulative material including the step of forming an embedded oxide by localized oxidation (of semiconductor material).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622369 |
Device isolation technology on semiconductor substrate |
Nov. 24, 2009 |
| 7612427 |
Apparatus for confining inductively coupled surface currents |
Nov. 3, 2009 |
| 7608518 |
Semiconductor device and method for fabricating the same |
Oct. 27, 2009 |
| 7598144 |
Method for forming inter-poly dielectric in shielded gate field effect transistor |
Oct. 6, 2009 |
| 7598155 |
Method of manufacturing an overlay mark |
Oct. 6, 2009 |
| 7575981 |
Method for fabricating isolation layer in semiconductor device |
Aug. 18, 2009 |
| 7563689 |
Method for fabricating nonvolatile memory device |
Jul. 21, 2009 |
| 7560391 |
Forming of trenches or wells having different destinations in a semiconductor substrate |
Jul. 14, 2009 |
| 7553741 |
Manufacturing method of semiconductor device |
Jun. 30, 2009 |
| 7547610 |
Method of making a semiconductor device comprising isolation trenches inducing different types of strain |
Jun. 16, 2009 |
| 7524726 |
Method for fabricating a semiconductor device |
Apr. 28, 2009 |
| 7524732 |
Semiconductor device with L-shaped spacer and method of manufacturing the same |
Apr. 28, 2009 |
| 7524751 |
Method for forming contact hole in semiconductor device |
Apr. 28, 2009 |
| 7514337 |
Semiconductor device using EPI-layer and method of forming the same |
Apr. 7, 2009 |
| 7488666 |
Method for manufacturing semiconductor substrate and method for manufacturing semiconductor device |
Feb. 10, 2009 |
| 7482190 |
Micromechanical strained semiconductor by wafer bonding |
Jan. 27, 2009 |
| 7473615 |
Semiconductor processing methods |
Jan. 6, 2009 |
| 7446000 |
Method of fabricating semiconductor device having gate dielectrics with different thicknesses |
Nov. 4, 2008 |
| 7439158 |
Strained semiconductor by full wafer bonding |
Oct. 21, 2008 |
| 7432172 |
Plasma etching method |
Oct. 7, 2008 |
| 7427553 |
Fabricating method of semiconductor device |
Sep. 23, 2008 |
| 7419878 |
Planarized and silicided trench contact |
Sep. 2, 2008 |
| 7416956 |
Self-aligned trench filling for narrow gap isolation regions |
Aug. 26, 2008 |
| 7402473 |
Semiconductor device and process for producing the same |
Jul. 22, 2008 |
| 7381631 |
Use of expanding material oxides for nano-fabrication |
Jun. 3, 2008 |
| 7358588 |
Trench isolation type semiconductor device which prevents a recess from being formed in a field region |
Apr. 15, 2008 |
| 7326621 |
Method of fabricating a recess channel array transistor using a mask layer with a high etch selectivity with respect to a silicon substrate |
Feb. 5, 2008 |
| 7323394 |
Method of producing element separation structure |
Jan. 29, 2008 |
| 7321141 |
Image sensor device and manufacturing method thereof |
Jan. 22, 2008 |
| 7314792 |
Method for fabricating transistor of semiconductor device |
Jan. 1, 2008 |
| 7303961 |
Method for producing a junction region between a trench and a semiconductor zone surrounding the trench |
Dec. 4, 2007 |
| 7297604 |
Semiconductor device having dual isolation structure and method of fabricating the same |
Nov. 20, 2007 |
| 7288425 |
Hybrid cantilever and tip |
Oct. 30, 2007 |
| 7282409 |
Isolation structure for a memory cell using Al.sub.2O.sub.3 dielectric |
Oct. 16, 2007 |
| 7279393 |
Trench isolation structure and method of manufacture therefor |
Oct. 9, 2007 |
| 7259055 |
Method of forming high-luminescence silicon electroluminescence device |
Aug. 21, 2007 |
| 7259074 |
Trench isolation method in flash memory device |
Aug. 21, 2007 |
| 7232697 |
Semiconductor device having enhanced photo sensitivity and method for manufacture thereof |
Jun. 19, 2007 |
| 7226846 |
Method of dry etching semiconductor substrate to reduce crystal defects in a trench |
Jun. 5, 2007 |
| 7208390 |
Semiconductor device structure and method for forming |
Apr. 24, 2007 |
| 7199020 |
Nitridation of STI liner oxide for modulating inverse width effects in semiconductor devices |
Apr. 3, 2007 |
| 7199021 |
Methods and systems to mitigate etch stop clipping for shallow trench isolation fabrication |
Apr. 3, 2007 |
| 7163871 |
Manufacturing method of semiconductor device and oxidization method of semiconductor substrate |
Jan. 16, 2007 |
| 7163869 |
Shallow trench isolation structure with converted liner layer |
Jan. 16, 2007 |
| 7135379 |
Isolation trench perimeter implant for threshold voltage control |
Nov. 14, 2006 |
| 7132347 |
Semiconductor device with trench structure and method for manufacturing the same |
Nov. 7, 2006 |
| 7132349 |
Methods of forming integrated circuits structures including epitaxial silicon layers in active regions |
Nov. 7, 2006 |
| 7132729 |
Semiconductor device and method of manufacturing same |
Nov. 7, 2006 |
| 7115480 |
Micromechanical strained semiconductor by wafer bonding |
Oct. 3, 2006 |
| 7112510 |
Methods for forming a device isolating barrier and methods for forming a gate electrode using the same |
Sep. 26, 2006 |
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