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Class Information
Number: 438/425
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material > Combined with formation of recessed oxide by localized oxidation
Description: Process for making electrically isolated laterally spaced semiconductor regions by grooving and refilling with insulative material including the step of forming an embedded oxide by localized oxidation (of semiconductor material).










Sub-classes under this class:

Class Number Class Name Patents
438/426 Recessed oxide laterally extending from groove 305


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8710479 Semiconductor devices having multi-width isolation layer structures Apr. 29, 2014
8685830 Method of filling shallow trenches Apr. 1, 2014
8673734 Semiconductor device and method for fabricating the same Mar. 18, 2014
8618602 Semiconductor device and method of forming the same Dec. 31, 2013
8587085 Semiconductor device with trench isolation having a diffusion preventing film and manufacturing method thereof Nov. 19, 2013
8569145 Semiconductor device and method of producing the same Oct. 29, 2013
8569146 Isolation structure for strained channel transistors Oct. 29, 2013
8551860 Semiconductor devices having through electrodes and methods of fabricating the same Oct. 8, 2013
8536017 Method of manufacturing semiconductor device Sep. 17, 2013
8470687 Strained semiconductor by full wafer bonding Jun. 25, 2013
8404559 Semiconductor device production method and semiconductor device Mar. 26, 2013
8394705 Method of manufacturing semiconductor device having optical devices Mar. 12, 2013
8383490 Borderless contact for ultra-thin body devices Feb. 26, 2013
8313661 Deep trench liner removal process Nov. 20, 2012
8304845 Method for sealing an opening Nov. 6, 2012
8288185 Semiconductor devices and methods of forming the same Oct. 16, 2012
8241993 Method for shallow trench isolation Aug. 14, 2012
8236638 Shallow trench isolation for SOI structures combining sidewall spacer and bottom liner Aug. 7, 2012
8222101 Method of fabricating a MOS transistor having a gate insulation layer with a lateral portion and a vertical portion Jul. 17, 2012
8217269 Electrical microfilament to circuit interface Jul. 10, 2012
8211778 Forming isolation regions for integrated circuits Jul. 3, 2012
8178418 Method for fabricating intra-device isolation structure May. 15, 2012
8138059 Semiconductor device manufacturing method Mar. 20, 2012
8119475 Method of forming gate of semiconductor device Feb. 21, 2012
8114762 Method for manufacturing trench MOSFET device with low gate charge Feb. 14, 2012
8071460 Method for manufacturing semiconductor device Dec. 6, 2011
8071461 Low loss substrate for integrated passive devices Dec. 6, 2011
8048764 Dual etch method of defining active area in semiconductor device Nov. 1, 2011
8048762 Manufacturing method of semiconductor device Nov. 1, 2011
8039358 Method of manufacturing semiconductor device on which a plurality of types of transistors are mounted Oct. 18, 2011
8030171 Method of forming element isolation film and nonvolatile semiconductor memory Oct. 4, 2011
8022481 Robust shallow trench isolation structures and a method for forming shallow trench isolation structures Sep. 20, 2011
8022560 Overlay mark Sep. 20, 2011
8017494 Termination trench structure for mosgated device and process for its manufacture Sep. 13, 2011
8017496 Methods of manufacturing a semiconductor device Sep. 13, 2011
7998829 Semiconductor structure and method of manufacture Aug. 16, 2011
7989308 Creation of dielectrically insulating soi-technlogical trenches comprising rounded edges for allowing higher voltages Aug. 2, 2011
7968421 Method for manufacturing SOI structure in desired region of a semiconductor device Jun. 28, 2011
7947568 Method of manufacturing semiconductor device May. 24, 2011
7943482 Method for semiconductor device having radiation hardened insulators and design structure thereof May. 17, 2011
7939423 Method for manufacturing nonvolatile semiconductor memory device structure May. 10, 2011
7935609 Method for fabricating semiconductor device having radiation hardened insulators May. 3, 2011
7932182 Creating novel structures using deep trenching of oriented silicon substrates Apr. 26, 2011
7915137 Method of forming isolation structure for semiconductor integrated circuit substrate Mar. 29, 2011
7892929 Shallow trench isolation corner rounding Feb. 22, 2011
7883956 Method of forming coplanar active and isolation regions and structures thereof Feb. 8, 2011
7867834 Manufacturing method of semiconductor device capable of forming the line width of a gate Jan. 11, 2011
7858489 Method for manufacturing semiconductor device capable of increasing current drivability of PMOS transistor Dec. 28, 2010
7855117 Method of forming a thin layer and method of manufacturing a semiconductor device Dec. 21, 2010
7838443 Method for minimizing the corner effect by densifying the insulating layer Nov. 23, 2010

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