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Class Information
Number: 438/424
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material
Description: Process for making electrically isolated laterally spaced semiconductor regions including a step of forming a recess or trench in the semiconductive substrate and refilling the same with deposited insulative material.


Sub-classes under this class:

Class Number Class Name Patents
438/430 And deposition of polysilicon or noninsulative material into groove 353
438/429 And epitaxial semiconductor formation in groove 143
438/425 Combined with formation of recessed oxide by localized oxidation 294
438/433 Dopant addition 252
438/435 Multiple insulative layers in groove 568
438/427 Refilling multiple grooves of different widths or depths 492
438/438 Reflow of insulator 100


Patents under this class:

Patent Number Title Of Patent Date Issued
7618857 Method of reducing detrimental STI-induced stress in MOSFET channels Nov. 17, 2009
7612427 Apparatus for confining inductively coupled surface currents Nov. 3, 2009
7611980 Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Nov. 3, 2009
7611963 Method for forming a multi-layer shallow trench isolation structure in a semiconductor device Nov. 3, 2009
7611962 Method for fabricating semiconductor device Nov. 3, 2009
7608534 Interconnection of through-wafer vias using bridge structures Oct. 27, 2009
7608519 Method of fabricating trench isolation of semiconductor device Oct. 27, 2009
7605025 Methods of forming MOSFETS using crystalline sacrificial structures Oct. 20, 2009
7601609 Method for manufacturing device isolation film of semiconductor device Oct. 13, 2009
7601608 Memory array buried digit line Oct. 13, 2009
7601607 Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects Oct. 13, 2009
7601582 Method for manufacturing a semiconductor device having a device isolation trench Oct. 13, 2009
7601576 Method for fabricating semiconductor device Oct. 13, 2009
7598177 Methods of filling trenches using high-density plasma deposition (HDP) Oct. 6, 2009
7598155 Method of manufacturing an overlay mark Oct. 6, 2009
7598151 Semiconductor device fabrication method Oct. 6, 2009
7595258 Overlay vernier of semiconductor device and method of manufacturing the same Sep. 29, 2009
7595254 Method of manufacturing a semiconductor device Sep. 29, 2009
7595253 Method of forming the semiconductor device Sep. 29, 2009
7595252 Method of manufacturing a semiconductor memory device Sep. 29, 2009
7595224 Method for manufacturing integrated circuit Sep. 29, 2009
7595010 Method for producing a doped nitride film, doped oxide film and other doped films Sep. 29, 2009
7589028 Hydroxyl bond removal and film densification method for oxide films using microwave post treatment Sep. 15, 2009
7585746 Process integration scheme of SONOS technology Sep. 8, 2009
7585745 Semiconductor device and a method of manufacturing the same Sep. 8, 2009
7585744 Method of forming a seal for a semiconductor device Sep. 8, 2009
7582523 Method of manufacturing semiconductor device including insulated-gate field-effect transistors Sep. 1, 2009
7579256 Method for forming shallow trench isolation in semiconductor device using a pore-generating layer Aug. 25, 2009
7579255 Semiconductor device and method for isolating the same Aug. 25, 2009
7575992 Method of forming micro patterns in semiconductor devices Aug. 18, 2009
7575981 Method for fabricating isolation layer in semiconductor device Aug. 18, 2009
7575972 Method of manufacturing nonvolatile memory device Aug. 18, 2009
7572713 Method of fabricating semiconductor device with STI structure Aug. 11, 2009
7572712 Method to form selective strained Si using lateral epitaxy Aug. 11, 2009
7563690 Method for forming shallow trench isolation region Jul. 21, 2009
7563689 Method for fabricating nonvolatile memory device Jul. 21, 2009
7563679 Reduction of field edge thinning in peripheral devices Jul. 21, 2009
7560358 Method of preparing active silicon regions for CMOS or other devices Jul. 14, 2009
7560357 Method for creating narrow trenches in dielectric materials Jul. 14, 2009
7557415 Trench isolation type semiconductor device and related method of manufacture Jul. 7, 2009
7557048 Methods of forming semiconductor constructions Jul. 7, 2009
7553741 Manufacturing method of semiconductor device Jun. 30, 2009
7553740 Structure and method for forming a minimum pitch trench-gate FET with heavy body region Jun. 30, 2009
7550363 Method of fabricating a semiconductor device having first and second trenches using non-concurrently formed hard mask patterns Jun. 23, 2009
7547616 Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics Jun. 16, 2009
7547610 Method of making a semiconductor device comprising isolation trenches inducing different types of strain Jun. 16, 2009
7544592 Method for increasing etch rate during deep silicon dry etch Jun. 9, 2009
7541629 Embedded insulating band for controlling short-channel effect and leakage reduction for DSB process Jun. 2, 2009
7541260 Trench diffusion isolation in semiconductor devices Jun. 2, 2009
7541259 Semiconductor device having a compressed device isolation structure Jun. 2, 2009



 
 
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