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Class Information
Number: 438/424
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Grooved and refilled with deposited dielectric material
Description: Process for making electrically isolated laterally spaced semiconductor regions including a step of forming a recess or trench in the semiconductive substrate and refilling the same with deposited insulative material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618857 |
Method of reducing detrimental STI-induced stress in MOSFET channels |
Nov. 17, 2009 |
| 7612427 |
Apparatus for confining inductively coupled surface currents |
Nov. 3, 2009 |
| 7611980 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures |
Nov. 3, 2009 |
| 7611963 |
Method for forming a multi-layer shallow trench isolation structure in a semiconductor device |
Nov. 3, 2009 |
| 7611962 |
Method for fabricating semiconductor device |
Nov. 3, 2009 |
| 7608534 |
Interconnection of through-wafer vias using bridge structures |
Oct. 27, 2009 |
| 7608519 |
Method of fabricating trench isolation of semiconductor device |
Oct. 27, 2009 |
| 7605025 |
Methods of forming MOSFETS using crystalline sacrificial structures |
Oct. 20, 2009 |
| 7601609 |
Method for manufacturing device isolation film of semiconductor device |
Oct. 13, 2009 |
| 7601608 |
Memory array buried digit line |
Oct. 13, 2009 |
| 7601607 |
Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects |
Oct. 13, 2009 |
| 7601582 |
Method for manufacturing a semiconductor device having a device isolation trench |
Oct. 13, 2009 |
| 7601576 |
Method for fabricating semiconductor device |
Oct. 13, 2009 |
| 7598177 |
Methods of filling trenches using high-density plasma deposition (HDP) |
Oct. 6, 2009 |
| 7598155 |
Method of manufacturing an overlay mark |
Oct. 6, 2009 |
| 7598151 |
Semiconductor device fabrication method |
Oct. 6, 2009 |
| 7595258 |
Overlay vernier of semiconductor device and method of manufacturing the same |
Sep. 29, 2009 |
| 7595254 |
Method of manufacturing a semiconductor device |
Sep. 29, 2009 |
| 7595253 |
Method of forming the semiconductor device |
Sep. 29, 2009 |
| 7595252 |
Method of manufacturing a semiconductor memory device |
Sep. 29, 2009 |
| 7595224 |
Method for manufacturing integrated circuit |
Sep. 29, 2009 |
| 7595010 |
Method for producing a doped nitride film, doped oxide film and other doped films |
Sep. 29, 2009 |
| 7589028 |
Hydroxyl bond removal and film densification method for oxide films using microwave post treatment |
Sep. 15, 2009 |
| 7585746 |
Process integration scheme of SONOS technology |
Sep. 8, 2009 |
| 7585745 |
Semiconductor device and a method of manufacturing the same |
Sep. 8, 2009 |
| 7585744 |
Method of forming a seal for a semiconductor device |
Sep. 8, 2009 |
| 7582523 |
Method of manufacturing semiconductor device including insulated-gate field-effect transistors |
Sep. 1, 2009 |
| 7579256 |
Method for forming shallow trench isolation in semiconductor device using a pore-generating layer |
Aug. 25, 2009 |
| 7579255 |
Semiconductor device and method for isolating the same |
Aug. 25, 2009 |
| 7575992 |
Method of forming micro patterns in semiconductor devices |
Aug. 18, 2009 |
| 7575981 |
Method for fabricating isolation layer in semiconductor device |
Aug. 18, 2009 |
| 7575972 |
Method of manufacturing nonvolatile memory device |
Aug. 18, 2009 |
| 7572713 |
Method of fabricating semiconductor device with STI structure |
Aug. 11, 2009 |
| 7572712 |
Method to form selective strained Si using lateral epitaxy |
Aug. 11, 2009 |
| 7563690 |
Method for forming shallow trench isolation region |
Jul. 21, 2009 |
| 7563689 |
Method for fabricating nonvolatile memory device |
Jul. 21, 2009 |
| 7563679 |
Reduction of field edge thinning in peripheral devices |
Jul. 21, 2009 |
| 7560358 |
Method of preparing active silicon regions for CMOS or other devices |
Jul. 14, 2009 |
| 7560357 |
Method for creating narrow trenches in dielectric materials |
Jul. 14, 2009 |
| 7557415 |
Trench isolation type semiconductor device and related method of manufacture |
Jul. 7, 2009 |
| 7557048 |
Methods of forming semiconductor constructions |
Jul. 7, 2009 |
| 7553741 |
Manufacturing method of semiconductor device |
Jun. 30, 2009 |
| 7553740 |
Structure and method for forming a minimum pitch trench-gate FET with heavy body region |
Jun. 30, 2009 |
| 7550363 |
Method of fabricating a semiconductor device having first and second trenches using non-concurrently formed hard mask patterns |
Jun. 23, 2009 |
| 7547616 |
Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics |
Jun. 16, 2009 |
| 7547610 |
Method of making a semiconductor device comprising isolation trenches inducing different types of strain |
Jun. 16, 2009 |
| 7544592 |
Method for increasing etch rate during deep silicon dry etch |
Jun. 9, 2009 |
| 7541629 |
Embedded insulating band for controlling short-channel effect and leakage reduction for DSB process |
Jun. 2, 2009 |
| 7541260 |
Trench diffusion isolation in semiconductor devices |
Jun. 2, 2009 |
| 7541259 |
Semiconductor device having a compressed device isolation structure |
Jun. 2, 2009 |
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