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Class Information
Number: 438/421
Name: Semiconductor device manufacturing: process > Formation of electrically isolated lateral semiconductive structure > Having air-gap dielectric (e.g., groove, etc.)
Description: Process for making an electrically isolated laterally spaced semiconductor structure resulting in laterally spaced semiconductive regions separated at least in part by a recessed air-gap feature relative to the surrounding surface (e.g., groove, trench, notch, etc.).










Sub-classes under this class:

Class Number Class Name Patents
438/422 Enclosed cavity 276


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
6863769 Configuration and method for making contact with the back surface of a semiconductor substrate Mar. 8, 2005
6861332 Air gap interconnect method Mar. 1, 2005
6861333 Method of reducing trench aspect ratio Mar. 1, 2005
6855617 Method of filling intervals and fabricating shallow trench isolation structures Feb. 15, 2005
6849870 Organic gate insulating film and organic thin film transistor using the same Feb. 1, 2005
6846736 Creation of subresolution features via flow characteristics Jan. 25, 2005
6844238 Multiple-gate transistors with improved gate control Jan. 18, 2005
6838355 Damascene interconnect structures including etchback for low-k dielectric materials Jan. 4, 2005
6835631 Method to enhance inductor Q factor by forming air gaps below inductors Dec. 28, 2004
6830987 Semiconductor device with a silicon-on-void structure and method of making the same Dec. 14, 2004
6818525 Semiconductor device and method of providing regions of low substrate capacitance Nov. 16, 2004
6815310 Technique to obtain high mobility channels in MOS transistors by forming a strain layer on an underside of a channel Nov. 9, 2004
6812113 Process for achieving intermetallic and/or intrametallic air isolation in an integrated circuit, and integrated circuit obtained Nov. 2, 2004
6812544 Integrated circuit having oversized components Nov. 2, 2004
6791155 Stress-relieved shallow trench isolation (STI) structure and method for forming the same Sep. 14, 2004
6780755 Gas dome dielectric system for ULSI interconnects Aug. 24, 2004
6780721 Low dielectric constant shallow trench isolation Aug. 24, 2004
6770537 Low dielectric constant shallow trench isolation Aug. 3, 2004
6764919 Method for providing a dummy feature and structure thereof Jul. 20, 2004
6756653 Low dielectric constant shallow trench isolation Jun. 29, 2004
6750520 Two-bit semiconductor memory with enhanced carrier trapping Jun. 15, 2004
6746880 Method for making electrical contact with a rear side of a semiconductor substrate during its processing Jun. 8, 2004
6737723 Low dielectric constant shallow trench isolation May. 18, 2004
6734094 Method of forming an air gap within a structure by exposing an ultraviolet sensitive material to ultraviolet radiation May. 11, 2004
6730571 Method to form a cross network of air gaps within IMD layer May. 4, 2004
6727157 Method for forming a shallow trench isolation using air gap Apr. 27, 2004
6724027 Magnetic shielding for MRAM devices Apr. 20, 2004
6696315 Semiconductor device configuration with cavities of submicrometer dimensions and method of fabricating structured cavities Feb. 24, 2004
6690081 Compliant wafer-level packaging devices and methods of fabrication Feb. 10, 2004
6677209 Low dielectric constant STI with SOI devices Jan. 13, 2004
6661068 Semiconductor device and method of providing regions of low substrate capacitance Dec. 9, 2003
6656782 Process for manufacturing an isolated-gate transistor with an architecture of the substrate-on-insulator type, and corresponding transistor Dec. 2, 2003
6632723 Semiconductor device Oct. 14, 2003
6627529 Capacitance reduction by tunnel formation for use with semiconductor device Sep. 30, 2003
6624031 Test structure and methodology for semiconductor stress-induced defects and antifuse based on same test structure Sep. 23, 2003
6596606 Semiconductor raised source-drain structure Jul. 22, 2003
6589861 Method for fabricating a semiconductor device Jul. 8, 2003
6570217 Semiconductor device and method of manufacturing the same May. 27, 2003
6566241 Method of forming metal contact in semiconductor device May. 20, 2003
6558983 Semiconductor apparatus and method for manufacturing the same May. 6, 2003
6558989 Method for crystallizing silicon film and thin film transistor and fabricating method using the same May. 6, 2003
6544858 Method for treating silicon-containing polymer layers with plasma or electromagnetic radiation Apr. 8, 2003
6524944 Low k ILD process by removable ILD Feb. 25, 2003
6500731 Process for producing semiconductor device module Dec. 31, 2002
6498070 Air gap semiconductor structure and method of manufacture Dec. 24, 2002
6492245 Method of forming air gap isolation between a bit line contact structure and a capacitor under bit line structure Dec. 10, 2002
6489215 Method of making insulator for electrical structures Dec. 3, 2002
6482657 Methods of manufacturing tunnel magnetoresistive element, thin-film magnetic head and memory element Nov. 19, 2002
6479378 Process for forming electrical interconnects in integrated circuits Nov. 12, 2002
6479366 Method of manufacturing a semiconductor device with air gaps formed between metal leads Nov. 12, 2002

1 2 3 4 5 6 7 8










 
 
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