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Class Information
Number: 438/381
Name: Semiconductor device manufacturing: process > Making passive device (e.g., resistor, capacitor, etc.)
Description: Process for making an electrical device or component utilizing a semiconductor substrate in which charge carriers do not change their energy levels and that does not provide rectification, amplification, or switching, but which does react to voltage and current input.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6232175 |
Method of manufacturing double-recess crown-shaped DRAM capacitor |
May. 15, 2001 |
| 6232194 |
Silicon nitride capped poly resistor with SAC process |
May. 15, 2001 |
| 6221727 |
Method to trap air at the silicon substrate for improving the quality factor of RF inductors in CMOS technology |
Apr. 24, 2001 |
| 6211008 |
Method for forming high-density high-capacity capacitor |
Apr. 3, 2001 |
| 6211030 |
Method for fabricating resistors in integrated circuits |
Apr. 3, 2001 |
| 6211077 |
Method for forming polycrystal silicon film for semiconductor elements |
Apr. 3, 2001 |
| 6207521 |
Thin-film resistor employed in a semiconductor wafer and its method formation |
Mar. 27, 2001 |
| 6204105 |
Method for fabricating a polycide semiconductor device |
Mar. 20, 2001 |
| 6204110 |
Methods of forming an SRAM |
Mar. 20, 2001 |
| 6201287 |
Monolithic inductance-enhancing integrated circuits, complementary metal oxide semiconductor (CMOS) inductance-enhancing integrated circuits, inductor assemblies, and inductance-multiplying me |
Mar. 13, 2001 |
| 6194248 |
Chip electronic part |
Feb. 27, 2001 |
| 6190956 |
Forming a capacitor structure of a semiconductor |
Feb. 20, 2001 |
| 6190986 |
Method of producing sulithographic fuses using a phase shift mask |
Feb. 20, 2001 |
| 6190987 |
MOS semiconductor device and method of manufacturing the same |
Feb. 20, 2001 |
| 6187647 |
Method of manufacturing lateral high-Q inductor for semiconductor devices |
Feb. 13, 2001 |
| 6184044 |
Thin film capacitor including perovskite-type oxide layers having columnar structure and granular structure |
Feb. 6, 2001 |
| 6180445 |
Method to fabricate high Q inductor by redistribution layer when flip-chip package is employed |
Jan. 30, 2001 |
| 6180481 |
Barrier layer fabrication methods |
Jan. 30, 2001 |
| 6180482 |
Method for manufacturing high dielectric capacitor |
Jan. 30, 2001 |
| 6177127 |
Method of monitoring emissivity |
Jan. 23, 2001 |
| 6177715 |
Integrated circuit having a level of metallization of variable thickness |
Jan. 23, 2001 |
| 6174802 |
Method for fabricating a self aligned contact which eliminates the key hole problem using a two step contact deposition |
Jan. 16, 2001 |
| 6171905 |
Semiconductor device and method of manufacturing the same |
Jan. 9, 2001 |
| 6171922 |
SiCr thin film resistors having improved temperature coefficients of resistance and sheet resistance |
Jan. 9, 2001 |
| 6169008 |
High Q inductor and its forming method |
Jan. 2, 2001 |
| 6169010 |
Method for making integrated circuit capacitor including anchored plug |
Jan. 2, 2001 |
| 6169305 |
Semiconductor device and method for fabricating the same |
Jan. 2, 2001 |
| 6165834 |
Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell |
Dec. 26, 2000 |
| 6165862 |
Method of producing a thin film resistor |
Dec. 26, 2000 |
| 6162671 |
Method of forming capacitors having high dielectric constant material |
Dec. 19, 2000 |
| 6162697 |
High Q inductor realization for use in MMIC circuits |
Dec. 19, 2000 |
| 6159817 |
Multi-tap thin film inductor |
Dec. 12, 2000 |
| 6156618 |
Method for fabricating thin film resistor |
Dec. 5, 2000 |
| 6153461 |
Manufacturing method of a dielectric layer for DRAM capacitors |
Nov. 28, 2000 |
| 6153489 |
Fabrication method of inductor devices using a substrate conversion technique |
Nov. 28, 2000 |
| 6150206 |
Methods of forming integrated circuit capacitors using trench isolation and planarization techniques |
Nov. 21, 2000 |
| 6150208 |
DRAM capacitors made from silicon-germanium and electrode-limited conduction dielectric films |
Nov. 21, 2000 |
| 6150226 |
Semiconductor processing methods, methods of forming capacitors, methods of forming silicon nitride, and methods of densifying silicon nitride layers |
Nov. 21, 2000 |
| 6146938 |
Method of fabricating semiconductor device |
Nov. 14, 2000 |
| 6146958 |
Methods for making VLSI capacitors and high Q VLSI inductors using metal-filled via plugs |
Nov. 14, 2000 |
| 6143614 |
Monolithic inductor |
Nov. 7, 2000 |
| 6140197 |
Method of making spiral-type RF inductors having a high quality factor (Q) |
Oct. 31, 2000 |
| 6136641 |
Method for manufacturing capacitor of semiconductor device including thermal treatment to dielectric film under hydrogen atmosphere |
Oct. 24, 2000 |
| 6133079 |
Method for reducing substrate capacitive coupling of a thin film inductor by reverse P/N junctions |
Oct. 17, 2000 |
| 6127237 |
Etching end point detecting method based on junction current measurement and etching apparatus |
Oct. 3, 2000 |
| 6121103 |
Optically transparent, electrically conductive semiconductor windows |
Sep. 19, 2000 |
| 6121105 |
Inverted thin film resistor and method of manufacture |
Sep. 19, 2000 |
| 6121135 |
Modified buried contact process for IC device fabrication |
Sep. 19, 2000 |
| 6117720 |
Method of making an integrated circuit electrode having a reduced contact area |
Sep. 12, 2000 |
| 6117721 |
Semiconductor processing method of forming a static random access memory cell and static random access memory cell |
Sep. 12, 2000 |
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