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Class Information
Number: 438/369
Name: Semiconductor device manufacturing: process > Forming bipolar transistor by formation or alteration of semiconductive active regions > Self-aligned > Dopant implantation or diffusion
Description: Process having a step of implanting or diffusing an electrically active dopant species into a semiconductive region of the substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615458 |
Activation of CMOS source/drain extensions by ultra-high temperature anneals |
Nov. 10, 2009 |
| 7572708 |
Utilization of doped glass on the sidewall of the emitter window in a bipolar transistor structure |
Aug. 11, 2009 |
| 7563685 |
Bipolar-transistor and method for the production of a bipolar-transistor |
Jul. 21, 2009 |
| 7556994 |
Normally-off integrated JFET power switches in wide bandgap semiconductors and methods of making |
Jul. 7, 2009 |
| 7550355 |
Low-leakage transistor and manufacturing method thereof |
Jun. 23, 2009 |
| 7550358 |
MEMS device including a laterally movable portion with piezo-resistive sensing elements and electrostatic actuating elements on trench side walls, and methods for producing the same |
Jun. 23, 2009 |
| 7445979 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Nov. 4, 2008 |
| 7442616 |
Method of manufacturing a bipolar transistor and bipolar transistor thereof |
Oct. 28, 2008 |
| 7439591 |
Gate layer diode method and apparatus |
Oct. 21, 2008 |
| 7435659 |
Method for manufacturing a semiconductor device having an alignment feature formed using an N-type dopant and a wet oxidation process |
Oct. 14, 2008 |
| 7429525 |
Fabrication process of a semiconductor device |
Sep. 30, 2008 |
| 7413996 |
High k gate insulator removal |
Aug. 19, 2008 |
| 7364978 |
Method of fabricating semiconductor device |
Apr. 29, 2008 |
| 7361548 |
Methods of forming a capacitor using an atomic layer deposition process |
Apr. 22, 2008 |
| 7361567 |
Non-volatile nanocrystal memory and method therefor |
Apr. 22, 2008 |
| 7338894 |
Semiconductor device having nitridated oxide layer and method therefor |
Mar. 4, 2008 |
| 7338876 |
Method for manufacturing a semiconductor device |
Mar. 4, 2008 |
| 7338875 |
Method of fabricating a semiconductor device having a toroidal-like junction |
Mar. 4, 2008 |
| 7314794 |
Low-cost high-performance planar back-gate CMOS |
Jan. 1, 2008 |
| 7314804 |
Plasma implantation of impurities in junction region recesses |
Jan. 1, 2008 |
| 7253072 |
Implant optimization scheme |
Aug. 7, 2007 |
| 7253071 |
Methods for enhancing the formation of nickel mono-silicide by reducing the formation of nickel di-silicide |
Aug. 7, 2007 |
| 7195986 |
Microfluidic device with controlled substrate conductivity |
Mar. 27, 2007 |
| 7169677 |
Method for producing a spacer structure |
Jan. 30, 2007 |
| 7151035 |
Semiconductor device and manufacturing method thereof |
Dec. 19, 2006 |
| 7141480 |
Tri-gate low power device and method for manufacturing the same |
Nov. 28, 2006 |
| 7111386 |
Lead plating method for GMR head manufacture |
Sep. 26, 2006 |
| 7067425 |
Method of manufacturing flash memory device |
Jun. 27, 2006 |
| 7033902 |
Method for making thin film transistors with lightly doped regions |
Apr. 25, 2006 |
| 7029967 |
Silicide method for CMOS integrated circuits |
Apr. 18, 2006 |
| 6973712 |
Lead plating method for GMR head manufacture |
Dec. 13, 2005 |
| 6949424 |
Single poly-emitter PNP using DWELL diffusion in a BiCMOS technology |
Sep. 27, 2005 |
| 6939773 |
Semiconductor devices and manufacturing methods thereof |
Sep. 6, 2005 |
| 6924216 |
Semiconductor device having improved doping profiles and method of improving the doping profiles of a semiconductor device |
Aug. 2, 2005 |
| 6921691 |
Transistor with dopant-bearing metal in source and drain |
Jul. 26, 2005 |
| 6919615 |
Semiconductor device for integrated injection logic cell and process for fabricating the same |
Jul. 19, 2005 |
| 6900105 |
Semiconductor device and method of manufacture |
May. 31, 2005 |
| 6893934 |
Bipolar transistor device having phosphorous |
May. 17, 2005 |
| 6884689 |
Fabrication of self-aligned bipolar transistor |
Apr. 26, 2005 |
| 6881639 |
Method of manufacturing semiconductor device |
Apr. 19, 2005 |
| 6878603 |
Process for manufacturing a DMOS transistor |
Apr. 12, 2005 |
| 6864144 |
Method of stabilizing resist material through ion implantation |
Mar. 8, 2005 |
| 6852603 |
Fabrication of abrupt ultra-shallow junctions |
Feb. 8, 2005 |
| 6849526 |
Method of improving device resistance |
Feb. 1, 2005 |
| 6838326 |
Semiconductor device, and method for manufacturing the same |
Jan. 4, 2005 |
| 6838350 |
Triply implanted complementary bipolar transistors |
Jan. 4, 2005 |
| 6833292 |
Reducing dopant losses during annealing processes |
Dec. 21, 2004 |
| 6825082 |
Ferroelectric memory device and method of forming the same |
Nov. 30, 2004 |
| 6812148 |
Preventing gate oxice thinning effect in a recess LOCOS process |
Nov. 2, 2004 |
| 6780725 |
METHOD FOR FORMING A SEMICONDUCTOR DEVICE INCLUDING FORMING VERTICAL NPN AND PNP TRANSISTORS BY EXPOSING THE EPITAXIAL LAYER, FORMING A MONOCRYSTAL LAYER AND ADJUSTING THE IMPURITY CONCENTRATI |
Aug. 24, 2004 |
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