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Class Information
Number: 438/307
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Plural doping steps > Using same conductivity-type dopant
Description: Process wherein the same conductivity-type electrically active dopant is introduced using plural doping steps.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608873 |
Buried-gated photodiode device and method for configuring and operating same |
Oct. 27, 2009 |
| 7598160 |
Method for manufacturing thin film semiconductor |
Oct. 6, 2009 |
| 7566615 |
Methods of fabricating scalable two transistor memory devices |
Jul. 28, 2009 |
| 7547606 |
Semiconductor device and method of manufacturing the same |
Jun. 16, 2009 |
| 7547956 |
Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same |
Jun. 16, 2009 |
| 7524715 |
Memory cell transistor having different source/drain junction profiles connected to DC node and BC node and manufacturing method thereof |
Apr. 28, 2009 |
| 7514307 |
Method of manufacturing a semiconductor apparatus |
Apr. 7, 2009 |
| 7501322 |
Methods of forming non-volatile memory devices having trenches |
Mar. 10, 2009 |
| 7485905 |
Electrostatic discharge protection device |
Feb. 3, 2009 |
| 7439563 |
High-breakdown-voltage semiconductor device |
Oct. 21, 2008 |
| 7402451 |
Optimized transistor for imager device |
Jul. 22, 2008 |
| 7399669 |
Semiconductor devices and methods for fabricating the same including forming an amorphous region in an interface between a device isolation layer and a source/drain diffusion layer |
Jul. 15, 2008 |
| RE40138 |
Method for improving hot carrier lifetime via a nitrogen implantation procedure performed before or after a Teos liner deposition |
Mar. 4, 2008 |
| 7329583 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Feb. 12, 2008 |
| 7294551 |
Semiconductor device and method for manufacturing the same |
Nov. 13, 2007 |
| 7276431 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Oct. 2, 2007 |
| 7220646 |
Integrated circuit structure with improved LDMOS design |
May. 22, 2007 |
| 7211482 |
Method of forming a memory cell having self-aligned contact regions |
May. 1, 2007 |
| 7208385 |
LDMOS transistor with enhanced termination region for high breakdown voltage with on-resistance |
Apr. 24, 2007 |
| 7202134 |
Method of forming transistors with ultra-short gate feature |
Apr. 10, 2007 |
| 7189623 |
Semiconductor processing method and field effect transistor |
Mar. 13, 2007 |
| 7176091 |
Drain-extended MOS transistors and methods for making the same |
Feb. 13, 2007 |
| 7172933 |
Recessed polysilicon gate structure for a strained silicon MOSFET device |
Feb. 6, 2007 |
| 7084039 |
Method of fabricating MOS transistor |
Aug. 1, 2006 |
| 7074658 |
Structure for an LDMOS transistor and fabrication method for thereof |
Jul. 11, 2006 |
| 7060580 |
Field effect transistor and method of fabricating the same |
Jun. 13, 2006 |
| 7060581 |
Method for manufacturing a semiconductor device |
Jun. 13, 2006 |
| 7041583 |
Method of removing features using an improved removal process in the fabrication of a semiconductor device |
May. 9, 2006 |
| 7030464 |
Semiconductor device and method of manufacturing the same |
Apr. 18, 2006 |
| 7022565 |
Method of fabricating a trench capacitor of a mixed mode integrated circuit |
Apr. 4, 2006 |
| 7022577 |
Method of forming ultra shallow junctions |
Apr. 4, 2006 |
| 7001818 |
MIS semiconductor device and manufacturing method thereof |
Feb. 21, 2006 |
| 6987052 |
Method for making enhanced substrate contact for a semiconductor device |
Jan. 17, 2006 |
| 6974730 |
Method for fabricating a recessed channel field effect transistor (FET) device |
Dec. 13, 2005 |
| 6936848 |
Dual gate layout for thin film transistor |
Aug. 30, 2005 |
| 6913980 |
Process method of source drain spacer engineering to improve transistor capacitance |
Jul. 5, 2005 |
| 6884688 |
Method for producing a MOS transistor and MOS transistor |
Apr. 26, 2005 |
| 6867106 |
Semiconductor device and method for fabricating the same |
Mar. 15, 2005 |
| 6858507 |
Graded LDD implant process for sub-half-micron MOS devices |
Feb. 22, 2005 |
| 6849516 |
Methods of forming drain/source extension structures of a field effect transistor using a doped high-k dielectric layer |
Feb. 1, 2005 |
| 6830978 |
Semiconductor device and manufacturing method for the same |
Dec. 14, 2004 |
| 6828204 |
Method and system for compensating for anneal non-uniformities |
Dec. 7, 2004 |
| 6818516 |
Selective high k dielectrics removal |
Nov. 16, 2004 |
| 6806155 |
Method and system for scaling nonvolatile memory cells |
Oct. 19, 2004 |
| 6803287 |
Method for forming a semiconductor device having contact wires of different sectional areas |
Oct. 12, 2004 |
| 6800536 |
Semiconductor device having an insulated gate and a fabrication process thereof |
Oct. 5, 2004 |
| 6773971 |
Method of manufacturing a semiconductor device having lightly-doped drain (LDD) regions |
Aug. 10, 2004 |
| 6764912 |
Passivation of nitride spacer |
Jul. 20, 2004 |
| 6762105 |
Short channel transistor fabrication method for semiconductor device |
Jul. 13, 2004 |
| 6750159 |
Semiconductor apparatus, manufacturing method therefor, solid state image device and manufacturing method therefor |
Jun. 15, 2004 |
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