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Class Information
Number: 438/306
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Plural doping steps
Description: Process including multiple steps of introducing dopant species into the semiconductive regions of the substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618870 |
Non-uniformly doped high voltage drain-extended transistor and method of manufacture thereof |
Nov. 17, 2009 |
| 7608512 |
Integrated circuit structure with improved LDMOS design |
Oct. 27, 2009 |
| 7601600 |
Power semiconductor device and method for manufacturing the same |
Oct. 13, 2009 |
| 7585737 |
Method of manufacturing double diffused drains in semiconductor devices |
Sep. 8, 2009 |
| 7585739 |
Semiconductor device and method of fabricating the same |
Sep. 8, 2009 |
| 7582517 |
Method for making split dual gate field effect transistor |
Sep. 1, 2009 |
| 7579651 |
Semiconductor device |
Aug. 25, 2009 |
| 7573098 |
Transistors fabricated using a reduced cost CMOS process |
Aug. 11, 2009 |
| 7566934 |
Semiconductor device to suppress leak current at an end of an isolation film |
Jul. 28, 2009 |
| 7564056 |
Method for manufacturing a semiconductor device |
Jul. 21, 2009 |
| 7560324 |
Drain extended MOS transistors and methods for making the same |
Jul. 14, 2009 |
| 7553733 |
Isolated LDMOS IC technology |
Jun. 30, 2009 |
| 7544573 |
Semiconductor device including MOS field effect transistor having offset spacers or gate sidewall films on either side of gate electrode and method of manufacturing the same |
Jun. 9, 2009 |
| 7534667 |
Structure and method for fabrication of deep junction silicon-on-insulator transistors |
May. 19, 2009 |
| 7524715 |
Memory cell transistor having different source/drain junction profiles connected to DC node and BC node and manufacturing method thereof |
Apr. 28, 2009 |
| 7514329 |
Robust DEMOS transistors and method for making the same |
Apr. 7, 2009 |
| 7494885 |
Disposable spacer process for field effect transistor fabrication |
Feb. 24, 2009 |
| 7491616 |
Method of manufacturing a semiconductor device including dopant introduction |
Feb. 17, 2009 |
| 7488638 |
Method for fabricating a voltage-stable PMOSFET semiconductor structure |
Feb. 10, 2009 |
| 7485536 |
Abrupt junction formation by atomic layer epitaxy of in situ delta doped dopant diffusion barriers |
Feb. 3, 2009 |
| 7482218 |
Low-capacitance input/output and electrostatic discharge circuit for protecting an integrated circuit from electrostatic discharge |
Jan. 27, 2009 |
| 7470593 |
Method for manufacturing a cell transistor of a semiconductor memory device |
Dec. 30, 2008 |
| 7468303 |
Semiconductor device and manufacturing method thereof |
Dec. 23, 2008 |
| 7465637 |
Method for manufacturing semiconductor device |
Dec. 16, 2008 |
| 7449386 |
Manufacturing method for semiconductor device to mitigate short channel effects |
Nov. 11, 2008 |
| 7446008 |
Method for fabricating silicide layers for semiconductor device |
Nov. 4, 2008 |
| 7442613 |
Methods of forming an asymmetric field effect transistor |
Oct. 28, 2008 |
| 7435636 |
Fabrication of self-aligned gallium arsenide MOSFETs using damascene gate methods |
Oct. 14, 2008 |
| 7416950 |
MOS transistor forming method |
Aug. 26, 2008 |
| 7408222 |
Charge trapping device and method of producing the charge trapping device |
Aug. 5, 2008 |
| 7405117 |
Method of fabricating a lateral double-diffused MOSFET (LDMOS) transistor |
Jul. 29, 2008 |
| 7402451 |
Optimized transistor for imager device |
Jul. 22, 2008 |
| 7402485 |
Method of forming a semiconductor device |
Jul. 22, 2008 |
| 7396713 |
Structure and method for forming asymmetrical overlap capacitance in field effect transistors |
Jul. 8, 2008 |
| 7384844 |
Method of fabricating flash memory device |
Jun. 10, 2008 |
| 7361562 |
Method of manufacturing semiconductor device |
Apr. 22, 2008 |
| 7351622 |
Methods of forming semiconductor device |
Apr. 1, 2008 |
| 7348233 |
Methods for fabricating a CMOS device including silicide contacts |
Mar. 25, 2008 |
| 7344947 |
Methods of performance improvement of HVMOS devices |
Mar. 18, 2008 |
| 7338871 |
Method for fabricating semiconductor device |
Mar. 4, 2008 |
| RE40138 |
Method for improving hot carrier lifetime via a nitrogen implantation procedure performed before or after a Teos liner deposition |
Mar. 4, 2008 |
| 7335543 |
MOS device for high voltage operation and method of manufacture |
Feb. 26, 2008 |
| 7335563 |
Rotated field effect transistors and method of manufacture |
Feb. 26, 2008 |
| 7320921 |
Smart grading implant with diffusion retarding implant for making integrated circuit chips |
Jan. 22, 2008 |
| 7321151 |
Semiconductor device and method of fabricating the same |
Jan. 22, 2008 |
| 7315062 |
Semiconductor device, mask for impurity implantation, and method of fabricating the semiconductor device |
Jan. 1, 2008 |
| 7314803 |
Method for producing a semiconductor structure |
Jan. 1, 2008 |
| 7309633 |
Semiconductor device including MOS field effect transistor having offset spacers or gate sidewall films on either side of gate electrode and method of manufacturing the same |
Dec. 18, 2007 |
| 7309901 |
Field effect transistors (FETs) with multiple and/or staircase silicide |
Dec. 18, 2007 |
| 7303952 |
Method for fabricating doped polysilicon lines |
Dec. 4, 2007 |
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