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Class Information
Number: 438/305
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Utilizing gate sidewall structure > Plural doping steps
Description: Process including multiple steps of introducing dopant species into the semiconductive regions of the substrate.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709902 Sacrificial spacer approach for differential source/drain implantation spacers in transistors comprising a high-k metal gate electrode structure Apr. 29, 2014
8704229 Partial poly amorphization for channeling prevention Apr. 22, 2014
8703569 MOS transistor, manufacturing method thereof, and semiconductor device Apr. 22, 2014
8691644 Method of forming a CMOS device with a stressed-channel NMOS transistor and a strained-channel PMOS transistor Apr. 8, 2014
8679936 Manufacturing resistors with tightened resistivity distribution in semiconductor integrated circuits Mar. 25, 2014
8673712 Power transistor with high voltage counter implant Mar. 18, 2014
8669145 Method and structure for strained FinFET devices Mar. 11, 2014
8664125 Highly selective spacer etch process with reduced sidewall spacer slimming Mar. 4, 2014
8664073 Method for fabricating field-effect transistor Mar. 4, 2014
8658506 Method and apparatus for selectively improving integrated device performance Feb. 25, 2014
RE44720 Method of manufacturing a MOSFET structure Jan. 21, 2014
8633083 Apparatus and method for a metal oxide semiconductor field effect transistor with source side punch-through protection implant Jan. 21, 2014
8603882 Method for making dual silicide and germanide semiconductors Dec. 10, 2013
8592902 Semiconductor structure that reduces the effects of gate cross diffusion and method of forming the structure Nov. 26, 2013
8592268 Semiconductor structures using replacement gate and methods of manufacture Nov. 26, 2013
8586423 Silicon controlled rectifier with stress-enhanced adjustable trigger voltage Nov. 19, 2013
8574995 Source/drain doping method in 3D devices Nov. 5, 2013
8574993 Semiconductor device and method of manufacturing the same Nov. 5, 2013
8569837 MOS devices having elevated source/drain regions Oct. 29, 2013
8569136 Manufacturing method of semiconductor device Oct. 29, 2013
8563382 Semiconductor device Oct. 22, 2013
8552470 Self-powered integrated circuit with multi-junction photovoltaic cell Oct. 8, 2013
8551874 MOSFET gate and source/drain contact metallization Oct. 8, 2013
8551842 Method of manufacturing semiconductor device Oct. 8, 2013
8541277 Non-volatile memory device and method for fabricating the same Sep. 24, 2013
8541272 Method of manufacturing semiconductor device with offset sidewall structure Sep. 24, 2013
8536041 Method for fabricating transistor with high-K dielectric sidewall spacer Sep. 17, 2013
8535999 Stress memorization process improvement for improved technology performance Sep. 17, 2013
8519445 Poly profile engineering to modulate spacer induced stress for device enhancement Aug. 27, 2013
8518782 Semiconductor device including asymmetric lightly doped drain (LDD) region, related method and design structure Aug. 27, 2013
8518776 Methods for producing a tunnel field-effect transistor Aug. 27, 2013
8513738 ESD field-effect transistor and integrated diffusion resistor Aug. 20, 2013
8507351 Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation Aug. 13, 2013
8501571 Method of manufacturing semiconductor device having silicon carbide layers containing phosphorus Aug. 6, 2013
8501570 Method of manufacturing source/drain structures Aug. 6, 2013
8497180 Transistor with boot shaped source/drain regions Jul. 30, 2013
8476133 Method of manufacture and structure for a trench transistor having a heavy body region Jul. 2, 2013
8476131 Methods of forming a semiconductor device with recessed source/design regions, and a semiconductor device comprising same Jul. 2, 2013
8470656 Semiconductor device and method of manufacturing the same Jun. 25, 2013
8445939 Method of forming a semiconductor device and semiconductor device May. 21, 2013
8440519 Semiconductor structures using replacement gate and methods of manufacture May. 14, 2013
8440516 Method of forming a field effect transistor May. 14, 2013
8440514 Semiconductor device and method for manufacturing the same May. 14, 2013
8435862 Method of manufacturing semiconductor device May. 7, 2013
8435844 Semiconductor device manufacturing method May. 7, 2013
8415213 Method of manufacturing semiconductor device with offset sidewall structure Apr. 9, 2013
8409947 Method of manufacturing semiconductor device having stress creating layer Apr. 2, 2013
8404546 Source/drain carbon implant and RTA anneal, pre-SiGe deposition Mar. 26, 2013
8399953 Semiconductor device and method for manufacturing the same Mar. 19, 2013
8389371 Method of fabricating integrated circuit device, including removing at least a portion of a spacer Mar. 5, 2013











 
 
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