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Class Information
Number: 438/305
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Utilizing gate sidewall structure > Plural doping steps
Description: Process including multiple steps of introducing dopant species into the semiconductive regions of the substrate.


Patents under this class:

Patent Number Title Of Patent Date Issued
7618869 Manufacturing method for increasing product yield of memory devices suffering from source/drain junction leakage Nov. 17, 2009
7611951 Method of fabricating MOS transistor having epitaxial region Nov. 3, 2009
7608512 Integrated circuit structure with improved LDMOS design Oct. 27, 2009
7605045 Field effect transistors and methods for fabricating the same Oct. 20, 2009
7605038 Semiconductor device and manufacturing method thereof Oct. 20, 2009
7602014 Superjunction power MOSFET Oct. 13, 2009
7601635 Method of manufacturing a semiconductor device Oct. 13, 2009
7601599 Semiconductor device and method for manufacturing the same Oct. 13, 2009
7601598 Reverse metal process for creating a metal silicide transistor gate structure Oct. 13, 2009
7598147 Method of forming CMOS with Si:C source/drain by laser melting and recrystallization Oct. 6, 2009
7598146 Self-aligned gate and method Oct. 6, 2009
7585720 Dual stress liner device and method Sep. 8, 2009
7582520 Method of fabricating complementary metal-oxide-semiconductor transistor and metal-oxide-semiconductor transistor Sep. 1, 2009
7579246 Semiconductor device manufacturing method including oblique ion implantation process and reticle pattern forming method Aug. 25, 2009
7572706 Source/drain stressor and method therefor Aug. 11, 2009
7572697 Method of manufacturing flash memory device Aug. 11, 2009
7569444 Transistor and method for manufacturing thereof Aug. 4, 2009
7557022 Implantation of carbon and/or fluorine in NMOS fabrication Jul. 7, 2009
7544556 Process for forming CMOS devices using removable spacers Jun. 9, 2009
7544553 Integration scheme for fully silicided gate Jun. 9, 2009
7541210 Method for fabricating CMOS image sensor Jun. 2, 2009
7534707 MOS Transistors having inverted T-shaped gate electrodes and fabrication methods thereof May. 19, 2009
7524715 Memory cell transistor having different source/drain junction profiles connected to DC node and BC node and manufacturing method thereof Apr. 28, 2009
7524682 Method for monitoring temperature in thermal process Apr. 28, 2009
7514332 Semiconductor device and method for manufacturing the same Apr. 7, 2009
7510955 Method of fabricating multi-fin field effect transistor Mar. 31, 2009
7504309 Pre-silicide spacer removal Mar. 17, 2009
7504293 Fabrication method for semiconductor device Mar. 17, 2009
7501322 Methods of forming non-volatile memory devices having trenches Mar. 10, 2009
7494885 Disposable spacer process for field effect transistor fabrication Feb. 24, 2009
7491616 Method of manufacturing a semiconductor device including dopant introduction Feb. 17, 2009
7485905 Electrostatic discharge protection device Feb. 3, 2009
7485536 Abrupt junction formation by atomic layer epitaxy of in situ delta doped dopant diffusion barriers Feb. 3, 2009
7482212 Semiconductor device and manufacturing method thereof Jan. 27, 2009
7479434 Semiconductor device and method of manufacturing the same Jan. 20, 2009
7473608 N-channel MOSFETs comprising dual stressors, and methods for forming the same Jan. 6, 2009
7473607 Method of manufacturing a multi-workfunction gates for a CMOS circuit Jan. 6, 2009
7468305 Forming pocket and LDD regions using separate masks Dec. 23, 2008
7468303 Semiconductor device and manufacturing method thereof Dec. 23, 2008
7462539 Direct tunneling memory with separated transistor and tunnel areas Dec. 9, 2008
7456062 Method of forming a semiconductor device Nov. 25, 2008
7452780 Method of forming a stable transistor by dual source/drain implantation Nov. 18, 2008
7449386 Manufacturing method for semiconductor device to mitigate short channel effects Nov. 11, 2008
7446004 Method for reducing overlap capacitance in field effect transistors Nov. 4, 2008
7445979 Method of fabricating isolated semiconductor devices in epi-less substrate Nov. 4, 2008
7442602 Methods of fabricating phase change memory cells having a cell diode and a bottom electrode self-aligned with each other Oct. 28, 2008
7439123 Low resistance contact semiconductor device structure Oct. 21, 2008
7432168 Method for fabricating semiconductor device with thin gate spacer Oct. 7, 2008
7432146 Semiconductor device and manufacturing method thereof Oct. 7, 2008
7411245 Spacer barrier structure to prevent spacer voids and method for forming the same Aug. 12, 2008



 
 
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