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Class Information
Number: 438/303
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Utilizing gate sidewall structure
Description: Process having structure on the sidewall of the gate electrode or gate insulator which is utilized as the previously formed device feature.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618868 |
Method of manufacturing field effect transistors using sacrificial blocking layers |
Nov. 17, 2009 |
| 7615458 |
Activation of CMOS source/drain extensions by ultra-high temperature anneals |
Nov. 10, 2009 |
| 7611952 |
Method of manufacturing semiconductor device having side wall spacers |
Nov. 3, 2009 |
| 7605407 |
Composite stressors with variable element atomic concentrations in MOS devices |
Oct. 20, 2009 |
| 7605044 |
Method of manufacturing semiconductor device |
Oct. 20, 2009 |
| 7605043 |
Semiconductor device and manufacturing method for the same |
Oct. 20, 2009 |
| 7605030 |
Hafnium tantalum oxynitride high-k dielectric and metal gates |
Oct. 20, 2009 |
| 7602014 |
Superjunction power MOSFET |
Oct. 13, 2009 |
| 7601598 |
Reverse metal process for creating a metal silicide transistor gate structure |
Oct. 13, 2009 |
| 7595247 |
Halo-first ultra-thin SOI FET for superior short channel control |
Sep. 29, 2009 |
| 7585738 |
Method of forming a fully silicided semiconductor device with independent gate and source/drain doping and related device |
Sep. 8, 2009 |
| 7579250 |
Method for reducing hot carrier effect of MOS transistor |
Aug. 25, 2009 |
| 7579246 |
Semiconductor device manufacturing method including oblique ion implantation process and reticle pattern forming method |
Aug. 25, 2009 |
| 7575997 |
Method for forming contact hole of semiconductor device |
Aug. 18, 2009 |
| 7572720 |
Semiconductor device and method for fabricating the same |
Aug. 11, 2009 |
| 7572706 |
Source/drain stressor and method therefor |
Aug. 11, 2009 |
| 7572697 |
Method of manufacturing flash memory device |
Aug. 11, 2009 |
| 7572692 |
Complementary transistors having different source and drain extension spacing controlled by different spacer sizes |
Aug. 11, 2009 |
| 7569856 |
Semiconductor device and method for manufacturing the same |
Aug. 4, 2009 |
| 7569464 |
Method for manufacturing a semiconductor device having improved across chip implant uniformity |
Aug. 4, 2009 |
| 7569457 |
Method of fabricating semiconductor device |
Aug. 4, 2009 |
| 7566624 |
Method for the production of transistor structures with LDD |
Jul. 28, 2009 |
| 7560353 |
Methods of fabricating memory devices with memory cell transistors having gate sidewall spacers with different dielectric properties |
Jul. 14, 2009 |
| 7560326 |
Silicon/silcion germaninum/silicon body device with embedded carbon dopant |
Jul. 14, 2009 |
| 7553726 |
Method of fabricating nonvolatile memory device |
Jun. 30, 2009 |
| 7550357 |
Semiconductor device and fabricating method thereof |
Jun. 23, 2009 |
| 7544554 |
Methods of forming gatelines and transistor devices |
Jun. 9, 2009 |
| 7541216 |
Method of aligning deposited nanotubes onto an etched feature using a spacer |
Jun. 2, 2009 |
| 7537988 |
Differential offset spacer |
May. 26, 2009 |
| 7534706 |
Recessed poly extension T-gate |
May. 19, 2009 |
| 7534689 |
Stress enhanced MOS transistor and methods for its fabrication |
May. 19, 2009 |
| 7531435 |
Semiconductor device and manufacturing method of the same |
May. 12, 2009 |
| 7528067 |
MOSFET structure with multiple self-aligned silicide contacts |
May. 5, 2009 |
| 7528047 |
Self-aligned split gate memory cell and method of forming |
May. 5, 2009 |
| 7521740 |
Semiconductor device comprising extensions produced from material with a low melting point |
Apr. 21, 2009 |
| 7521316 |
Methods of forming gate structures for semiconductor devices |
Apr. 21, 2009 |
| 7521314 |
Method for selective removal of a layer |
Apr. 21, 2009 |
| 7517779 |
Recessed drain extensions in transistor device |
Apr. 14, 2009 |
| 7517767 |
Forming conductive stud for semiconductive devices |
Apr. 14, 2009 |
| 7517766 |
Method of removing a spacer, method of manufacturing a metal-oxide-semiconductor transistor device, and metal-oxide-semiconductor transistor device |
Apr. 14, 2009 |
| 7517745 |
Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof |
Apr. 14, 2009 |
| 7514331 |
Method of manufacturing gate sidewalls that avoids recessing |
Apr. 7, 2009 |
| 7510955 |
Method of fabricating multi-fin field effect transistor |
Mar. 31, 2009 |
| 7510923 |
Slim spacer implementation to improve drive current |
Mar. 31, 2009 |
| 7507626 |
Floating gate of flash memory device and method of forming the same |
Mar. 24, 2009 |
| 7504309 |
Pre-silicide spacer removal |
Mar. 17, 2009 |
| 7501317 |
Method of manufacturing semiconductor device |
Mar. 10, 2009 |
| 7494886 |
Uniaxial strain relaxation of biaxial-strained thin films using ion implantation |
Feb. 24, 2009 |
| 7488661 |
Device and method for improving interface adhesion in thin film structures |
Feb. 10, 2009 |
| 7485524 |
MOSFETs comprising source/drain regions with slanted upper surfaces, and method for fabricating the same |
Feb. 3, 2009 |
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