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Class Information
Number: 438/302
Name: Semiconductor device manufacturing: process > Making field effect device having pair of active regions separated by gate structure by formation or alteration of semiconductive active regions > Having insulated gate (e.g., igfet, misfet, mosfet, etc.) > Self-aligned > Source or drain doping > Oblique implantation
Description: Process involving implanting ions other than perpendicularly with respect to the plane of the substrate.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7402451 |
Optimized transistor for imager device |
Jul. 22, 2008 |
| 7396713 |
Structure and method for forming asymmetrical overlap capacitance in field effect transistors |
Jul. 8, 2008 |
| 7393752 |
Semiconductor devices and method of fabrication |
Jul. 1, 2008 |
| 7378321 |
Method for patterning a semiconductor component |
May. 27, 2008 |
| 7378323 |
Silicide process utilizing pre-amorphization implant and second spacer |
May. 27, 2008 |
| 7374975 |
Method of fabricating a transistor |
May. 20, 2008 |
| 7351627 |
Method of manufacturing semiconductor device using gate-through ion implantation |
Apr. 1, 2008 |
| 7351637 |
Semiconductor transistors having reduced channel widths and methods of fabricating same |
Apr. 1, 2008 |
| 7348221 |
Process for manufacturing a semiconductor device, a semiconductor device and a high-frequency circuit |
Mar. 25, 2008 |
| 7345296 |
Nanotube transistor and rectifying devices |
Mar. 18, 2008 |
| 7335563 |
Rotated field effect transistors and method of manufacture |
Feb. 26, 2008 |
| 7309633 |
Semiconductor device including MOS field effect transistor having offset spacers or gate sidewall films on either side of gate electrode and method of manufacturing the same |
Dec. 18, 2007 |
| 7306998 |
Formation of abrupt junctions in devices by using silicide growth dopant snowplow effect |
Dec. 11, 2007 |
| 7300883 |
Method for patterning sub-lithographic features in semiconductor manufacturing |
Nov. 27, 2007 |
| 7300848 |
Semiconductor device having a recess gate for improved reliability |
Nov. 27, 2007 |
| 7297581 |
SRAM formation using shadow implantation |
Nov. 20, 2007 |
| 7291535 |
Method and apparatus for fabricating semiconductor device |
Nov. 6, 2007 |
| 7279380 |
Method of forming a chalcogenide memory cell having an ultrasmall cross-sectional area and a chalcogenide memory cell produced by the method |
Oct. 9, 2007 |
| 7276431 |
Method of fabricating isolated semiconductor devices in epi-less substrate |
Oct. 2, 2007 |
| 7274394 |
Solid state image pickup device and manufacturing method therefor |
Sep. 25, 2007 |
| 7268049 |
Structure and method for manufacturing MOSFET with super-steep retrograded island |
Sep. 11, 2007 |
| 7259060 |
Method for fabricating a semiconductor structure |
Aug. 21, 2007 |
| 7253072 |
Implant optimization scheme |
Aug. 7, 2007 |
| 7244655 |
Method of manufacturing semiconductor device capable of suppressing impurity concentration reduction in doped channel region arising from formation of gate insulating film |
Jul. 17, 2007 |
| 7238565 |
Methodology for recovery of hot carrier induced degradation in bipolar devices |
Jul. 3, 2007 |
| 7223663 |
MOS transistors and methods of manufacturing the same |
May. 29, 2007 |
| 7220645 |
Method of manufacturing semiconductor device |
May. 22, 2007 |
| 7217624 |
Non-volatile memory device with conductive sidewall spacer and method for fabricating the same |
May. 15, 2007 |
| 7208383 |
Method of manufacturing a semiconductor component |
Apr. 24, 2007 |
| 7195967 |
Nonvolatile semiconductor memory device and manufacturing method thereof |
Mar. 27, 2007 |
| 7195977 |
Method for fabricating a semiconductor device |
Mar. 27, 2007 |
| 7192836 |
Method and system for providing halo implant to a semiconductor device with minimal impact to the junction capacitance |
Mar. 20, 2007 |
| 7189623 |
Semiconductor processing method and field effect transistor |
Mar. 13, 2007 |
| 7183168 |
Method of manufacturing a semiconductor device having a silicide film |
Feb. 27, 2007 |
| 7176095 |
Bi-modal halo implantation |
Feb. 13, 2007 |
| 7169674 |
Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrier |
Jan. 30, 2007 |
| 7169676 |
Semiconductor devices and methods for forming the same including contacting gate to source |
Jan. 30, 2007 |
| 7160764 |
Laser annealing method and semiconductor device fabricating method |
Jan. 9, 2007 |
| 7160783 |
MOS transistor and method of manufacturing the same |
Jan. 9, 2007 |
| 7157779 |
Semiconductor device with triple surface impurity layers |
Jan. 2, 2007 |
| 7144781 |
Manufacturing method of a semiconductor device |
Dec. 5, 2006 |
| 7141852 |
Semiconductor device and fabricating method thereof |
Nov. 28, 2006 |
| 7138318 |
Method of fabricating body-tied SOI transistor having halo implant region underlying hammerhead portion of gate |
Nov. 21, 2006 |
| 7135374 |
MOS transistor and fabrication method thereof |
Nov. 14, 2006 |
| 7135373 |
Reduction of channel hot carrier effects in transistor devices |
Nov. 14, 2006 |
| 7132340 |
Application of post-pattern resist trim for reducing pocket-shadowing in SRAMs |
Nov. 7, 2006 |
| 7129140 |
Method of forming polysilicon gate structures with specific edge profiles for optimization of LDD offset spacing |
Oct. 31, 2006 |
| 7122862 |
Reduction of channel hot carrier effects in transistor devices |
Oct. 17, 2006 |
| 7118979 |
Method of manufacturing transistor having germanium implant region on the sidewalls of the polysilicon gate electrode |
Oct. 10, 2006 |
| 7109128 |
Semiconductor device and method of manufacturing the same |
Sep. 19, 2006 |
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